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Global Nanoimprint Lithography System Market Outlook 2016-2021

Global Nanoimprint Lithography System Market Outlook 2016-2021

Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.

The global nanoimprint lithography system market size is estimated to grow from USD 42.48 million in 2015 to USD 73.64 million by 2021, at an estimated CAGR of 9.51% between 2015 and 2021. With regards to this, key players of nanoimprint lithography system industry are expected to find potential opportunities in this market.

Worldwide, 115 units nanoimprint lithography system have been produced in the year 2015, while Europe attributes close to 48.70% of the world production, USA close to 25.22%, and China 10.43%. Research institute accounts for 32.23% of all nanoimprint lithography system consumption, compared to 20.51% for college & university and 20.05% for enterprise.

The global nanoimprint lithography system market report profiles some of the key technological developments in the recent times. It also profiles some of the leading players in the market and analyzes their key strategies. The competitive landscape section of the report provides a clear insight into the market share analysis of key industry players. The major players in the global nanoimprint lithography system market are EV Group, Canon, Suss Microtec, Nanonex, Obducat, SET Corporation, and IOE, CAS.

1. Scope of Report
1.1 Research Methodology
1.2 Markets Covered
1.3 Geographic Scope
1.4 Years Considered for the Study
1.5 Key Findings of Nanoimprint Lithography System Industry
2. Introduction
2.1 Nanoimprint Lithography
2.1.1 Hot Embossing Lithography (HEL)
2.1.2 UV-based Nanoimprint Lithography (UV-NIL)
2.1.3 Soft Lithography
2.2 Application
2.3 Crucial Process Benefits & Issues
2.3.1 Benefits
2.3.2 Concerns
2.4 Industry Chain Structure
3. Development and Trends
3.1 Key Manufacturing Technologies
3.2 Issues and Trends
4. Cost Structure
4.1 Bill of Materials (BOM)
4.2 Labor Costs
4.3 Manufacturing Costs
5. Worldwide Key Vendors
5.1 EV Group (Austria)
5.2 Obducat (Sweden)
5.3 Cannon (Japan)
5.4 Nanonex (USA)
5.5 SET Corporation (France)
5.6 Molecular Imprints (USA)
5.7 Suss Microtec (Germany)
5.8 IOE, CAS (China)
6. Market Overview
6.1 Global Market Size 2011-2016
6.2 Chinese Market Size 2011-2016
7. Market Status
7.1 Market Key Vendors Competition Status
7.2 Regional Market Competition Status
8. Consumption Pattern
8.1 Regional Consumption
8.2 Global Consumption by Application
8.3 Chinese Consumption by Application
9. Market Forecast
9.1 Market Size Forecast
9.2 Regional Consumption Forecast
9.3 Global Consumption Forecast
10 Market Dynamics
10.1 Policies and Events
11 Macroeconomic and Investment Feasibility
11.1 Macroeconomic Environment Analysis
11.1.2 China Macroeconomic Analysis
11.2 Macroeconomic Environment Development Trends
11.2.1 Global Macroeconomic Outlook
11.2.2 China Macroeconomic Outlook
11.3 Key Strategies
11.4 Feasibility of Nanoimprint Lithography System New Project Investment in China
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