Global Nanoimprint Lithography System Market Outlook 2016-2021
Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.
The global nanoimprint lithography system market size is estimated to grow from USD 42.48 million in 2015 to USD 73.64 million by 2021, at an estimated CAGR of 9.51% between 2015 and 2021. With regards to this, key players of nanoimprint lithography system industry are expected to find potential opportunities in this market.
Worldwide, 115 units nanoimprint lithography system have been produced in the year 2015, while Europe attributes close to 48.70% of the world production, USA close to 25.22%, and China 10.43%. Research institute accounts for 32.23% of all nanoimprint lithography system consumption, compared to 20.51% for college & university and 20.05% for enterprise.
The global nanoimprint lithography system market report profiles some of the key technological developments in the recent times. It also profiles some of the leading players in the market and analyzes their key strategies. The competitive landscape section of the report provides a clear insight into the market share analysis of key industry players. The major players in the global nanoimprint lithography system market are EV Group, Canon, Suss Microtec, Nanonex, Obducat, SET Corporation, and IOE, CAS.
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