Global Ultra-high Purity Sputtering Target Market Growth 2025-2031
Description
The global Ultra-high Purity Sputtering Target market size is predicted to grow from US$ million in 2025 to US$ million in 2031; it is expected to grow at a CAGR of %from 2025 to 2031.
sputtering targets are a physical vapor deposition mechanism—an old process, but with many uses in modern technology and manufacturing. The process starts by feeding a substrate (or other item to be coated) into a vacuum chamber containing two magnets. After introducing a controlled gas (such as argon) into the chamber, powerful magnets pull atoms from the substrate.
United States market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
China market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Europe market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Global key Ultra-high Purity Sputtering Target players cover Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.
LP Information, Inc. (LPI) ' newest research report, the “Ultra-high Purity Sputtering Target Industry Forecast” looks at past sales and reviews total world Ultra-high Purity Sputtering Target sales in 2024, providing a comprehensive analysis by region and market sector of projected Ultra-high Purity Sputtering Target sales for 2025 through 2031. With Ultra-high Purity Sputtering Target sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Ultra-high Purity Sputtering Target industry.
This Insight Report provides a comprehensive analysis of the global Ultra-high Purity Sputtering Target landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Ultra-high Purity Sputtering Target portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Ultra-high Purity Sputtering Target market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Ultra-high Purity Sputtering Target and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Ultra-high Purity Sputtering Target.
This report presents a comprehensive overview, market shares, and growth opportunities of Ultra-high Purity Sputtering Target market by product type, application, key manufacturers and key regions and countries.
Segmentation by Type:
Metal Target
Alloy Target
Segmentation by Application:
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
Key Questions Addressed in this Report
What is the 10-year outlook for the global Ultra-high Purity Sputtering Target market?
What factors are driving Ultra-high Purity Sputtering Target market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do Ultra-high Purity Sputtering Target market opportunities vary by end market size?
How does Ultra-high Purity Sputtering Target break out by Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
sputtering targets are a physical vapor deposition mechanism—an old process, but with many uses in modern technology and manufacturing. The process starts by feeding a substrate (or other item to be coated) into a vacuum chamber containing two magnets. After introducing a controlled gas (such as argon) into the chamber, powerful magnets pull atoms from the substrate.
United States market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
China market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Europe market for Ultra-high Purity Sputtering Target is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Global key Ultra-high Purity Sputtering Target players cover Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.
LP Information, Inc. (LPI) ' newest research report, the “Ultra-high Purity Sputtering Target Industry Forecast” looks at past sales and reviews total world Ultra-high Purity Sputtering Target sales in 2024, providing a comprehensive analysis by region and market sector of projected Ultra-high Purity Sputtering Target sales for 2025 through 2031. With Ultra-high Purity Sputtering Target sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Ultra-high Purity Sputtering Target industry.
This Insight Report provides a comprehensive analysis of the global Ultra-high Purity Sputtering Target landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Ultra-high Purity Sputtering Target portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Ultra-high Purity Sputtering Target market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Ultra-high Purity Sputtering Target and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Ultra-high Purity Sputtering Target.
This report presents a comprehensive overview, market shares, and growth opportunities of Ultra-high Purity Sputtering Target market by product type, application, key manufacturers and key regions and countries.
Segmentation by Type:
Metal Target
Alloy Target
Segmentation by Application:
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products
Key Questions Addressed in this Report
What is the 10-year outlook for the global Ultra-high Purity Sputtering Target market?
What factors are driving Ultra-high Purity Sputtering Target market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do Ultra-high Purity Sputtering Target market opportunities vary by end market size?
How does Ultra-high Purity Sputtering Target break out by Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
Table of Contents
156 Pages
- *This is a tentative TOC and the final deliverable is subject to change.*
- 1 Scope of the Report
- 2 Executive Summary
- 3 Global by Company
- 4 World Historic Review for Ultra-high Purity Sputtering Target by Geographic Region
- 5 Americas
- 6 APAC
- 7 Europe
- 8 Middle East & Africa
- 9 Market Drivers, Challenges and Trends
- 10 Manufacturing Cost Structure Analysis
- 11 Marketing, Distributors and Customer
- 12 World Forecast Review for Ultra-high Purity Sputtering Target by Geographic Region
- 13 Key Players Analysis
- 14 Research Findings and Conclusion
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