Global CMP Polyurethane Polishing Pad Market Growth 2025-2031

The global CMP Polyurethane Polishing Pad market size is predicted to grow from US$ 359 million in 2025 to US$ 544 million in 2031; it is expected to grow at a CAGR of 7.2% from 2025 to 2031.

The main component of the polyurethane polishing pad is foam-cured polyurethane. Its surface has many micropores, which can absorb polishing fluid and collect processing removal materials, which is beneficial to improving polishing uniformity and polishing efficiency. Polyurethane polishing pads are generally used for rough polishing. Polyurethane polishing pad is a subdivision product of CMP polishing pad. The leading companies in the global CMP polishing pad market are mainly DuPont, Entegris, Hubei Dinglong, Fujibo, IVT Technologies and SK enpulse. Among them, the share of the top three companies has reached 80%, and the market is highly concentrated.

LP Information, Inc. (LPI) ' newest research report, the “CMP Polyurethane Polishing Pad Industry Forecast” looks at past sales and reviews total world CMP Polyurethane Polishing Pad sales in 2024, providing a comprehensive analysis by region and market sector of projected CMP Polyurethane Polishing Pad sales for 2025 through 2031. With CMP Polyurethane Polishing Pad sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world CMP Polyurethane Polishing Pad industry.

This Insight Report provides a comprehensive analysis of the global CMP Polyurethane Polishing Pad landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on CMP Polyurethane Polishing Pad portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global CMP Polyurethane Polishing Pad market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for CMP Polyurethane Polishing Pad and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global CMP Polyurethane Polishing Pad.

This report presents a comprehensive overview, market shares, and growth opportunities of CMP Polyurethane Polishing Pad market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:
Soft Pad
Hard Pad

Segmentation by Application:
8 Inch Wafer
12 Inch Wafer
Others

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
DuPont
CMC Materials
Fujibo Holdings
JSR Corporation
3M
SKC
KC Technology
IVT Technologies
Universal Photonics
Hubei Dinglong
Topco Scientific
ZZLONGDA

Key Questions Addressed in this Report

What is the 10-year outlook for the global CMP Polyurethane Polishing Pad market?

What factors are driving CMP Polyurethane Polishing Pad market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do CMP Polyurethane Polishing Pad market opportunities vary by end market size?

How does CMP Polyurethane Polishing Pad break out by Type, by Application?

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