Global Multi-beam Mask Writer Supply, Demand and Key Producers, 2026-2032
Description
The global Multi-beam Mask Writer market size is expected to reach $ 2339 million by 2032, rising at a market growth of 11.6% CAGR during the forecast period (2026-2032).
Mask writers are devices that use irradiation by electron beams to draw a fine electronic circuit pattern onto a template (the mask), which has been formed by a silica glass substrate with photosensitive resin. Single-beam mask writers write data to the mask by concentrating the single electron beam on a single position over an electromagnetic field and then deflecting the beam to the position to be irradiated by the polarizer. Large circuit patterns can be created by repeating beam deflection and then moving the stage upon which the substrate is mounted. Using thousands of tiny beamlets, multi-beam mask writers can pattern or write advanced masks at a faster rate compared to VSB-based tools. With chip miniaturization making device designs more complex and requiring the use of more masks, multibeam systems are coming into demand.
Global key players of Multi-beam Mask Writer include IMS Nanofabrication, NuFlare Technology. China is the largest market, and has a share about 46%, followed by North America and South Korea with share 22% and 16%, separately. In terms of product type, 7nm and Above is the largest segment, accounting for a share of 63%. In terms of application, Wafer Manufacturer is the largest field with a share about 86 percent.
This report studies the global Multi-beam Mask Writer production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Multi-beam Mask Writer and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Multi-beam Mask Writer that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Multi-beam Mask Writer total production and demand, 2021-2032, (Units)
Global Multi-beam Mask Writer total production value, 2021-2032, (USD Million)
Global Multi-beam Mask Writer production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global Multi-beam Mask Writer consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: Multi-beam Mask Writer domestic production, consumption, key domestic manufacturers and share
Global Multi-beam Mask Writer production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global Multi-beam Mask Writer production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global Multi-beam Mask Writer production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global Multi-beam Mask Writer market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include IMS Nanofabrication, NuFlare Technology, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Multi-beam Mask Writer market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (M US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Multi-beam Mask Writer Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Multi-beam Mask Writer Market, Segmentation by Type:
7nm and Above
5nm
3nm and Below
Global Multi-beam Mask Writer Market, Segmentation by Application:
Wafer Manufacturer
EUV Mask Manufacturer
Companies Profiled:
IMS Nanofabrication
NuFlare Technology
Key Questions Answered:
1. How big is the global Multi-beam Mask Writer market?
2. What is the demand of the global Multi-beam Mask Writer market?
3. What is the year over year growth of the global Multi-beam Mask Writer market?
4. What is the production and production value of the global Multi-beam Mask Writer market?
5. Who are the key producers in the global Multi-beam Mask Writer market?
6. What are the growth factors driving the market demand?
Mask writers are devices that use irradiation by electron beams to draw a fine electronic circuit pattern onto a template (the mask), which has been formed by a silica glass substrate with photosensitive resin. Single-beam mask writers write data to the mask by concentrating the single electron beam on a single position over an electromagnetic field and then deflecting the beam to the position to be irradiated by the polarizer. Large circuit patterns can be created by repeating beam deflection and then moving the stage upon which the substrate is mounted. Using thousands of tiny beamlets, multi-beam mask writers can pattern or write advanced masks at a faster rate compared to VSB-based tools. With chip miniaturization making device designs more complex and requiring the use of more masks, multibeam systems are coming into demand.
Global key players of Multi-beam Mask Writer include IMS Nanofabrication, NuFlare Technology. China is the largest market, and has a share about 46%, followed by North America and South Korea with share 22% and 16%, separately. In terms of product type, 7nm and Above is the largest segment, accounting for a share of 63%. In terms of application, Wafer Manufacturer is the largest field with a share about 86 percent.
This report studies the global Multi-beam Mask Writer production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Multi-beam Mask Writer and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Multi-beam Mask Writer that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Multi-beam Mask Writer total production and demand, 2021-2032, (Units)
Global Multi-beam Mask Writer total production value, 2021-2032, (USD Million)
Global Multi-beam Mask Writer production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global Multi-beam Mask Writer consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: Multi-beam Mask Writer domestic production, consumption, key domestic manufacturers and share
Global Multi-beam Mask Writer production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global Multi-beam Mask Writer production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global Multi-beam Mask Writer production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global Multi-beam Mask Writer market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include IMS Nanofabrication, NuFlare Technology, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Multi-beam Mask Writer market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (M US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Multi-beam Mask Writer Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Multi-beam Mask Writer Market, Segmentation by Type:
7nm and Above
5nm
3nm and Below
Global Multi-beam Mask Writer Market, Segmentation by Application:
Wafer Manufacturer
EUV Mask Manufacturer
Companies Profiled:
IMS Nanofabrication
NuFlare Technology
Key Questions Answered:
1. How big is the global Multi-beam Mask Writer market?
2. What is the demand of the global Multi-beam Mask Writer market?
3. What is the year over year growth of the global Multi-beam Mask Writer market?
4. What is the production and production value of the global Multi-beam Mask Writer market?
5. Who are the key producers in the global Multi-beam Mask Writer market?
6. What are the growth factors driving the market demand?
Table of Contents
93 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Application
- 7 Company Profiles
- 8 Industry Chain Analysis
- 9 Research Findings and Conclusion
- 10 Appendix
Pricing
Currency Rates
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