Global High Purity Sputtering Target Material Market Research Report, Competitive, Technology and Forecast Analysis 2025-2032
Description
Market Overview
According to DIResearch's in-depth investigation and research, the global High Purity Sputtering Target Material market size will reach 2,948.21 Million USD in 2025 and is projected to reach 3,530.91 Million USD by 2032, with a CAGR of 2.61% (2025-2032). Notably, the China High Purity Sputtering Target Material market has changed rapidly in the past few years. By 2025, China's market size is expected to be Million USD, representing approximately % of the global market share.
Research Summary
High Purity Sputtering Target Material refers to a specialized form of material used in the process of sputter deposition, a key technique in thin film deposition for electronics and semiconductor manufacturing. These sputtering targets are meticulously manufactured and purified to achieve an exceptionally high level of material purity. The targets are typically made of metals, alloys, or compounds like oxides or nitrides, and their high purity, often exceeding 99.99%, is crucial for producing thin films with precise and reliable characteristics. The sputtering process involves bombarding the target material with ions in a vacuum, causing atoms to be ejected and deposited onto a substrate, forming a thin film. High Purity Sputtering Target Materials are essential for ensuring uniform and high-quality thin films in the production of semiconductors, solar cells, and other electronic devices where the material's purity directly influences the performance and reliability of the final products.
The major global suppliers of High Purity Sputtering Target Material include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, ULVAC, TOSOH, Luvata, Hitachi Metals, LT Metal, Sumitomo Chemical, Plansee SE, Fujian Acetron New Materials Co., Ltd, FURAYA Metals Co., Ltd, Luoyang Sifon Electronic Materials, Changzhou Sujing Electronic Material, GRIKIN Advanced Material Co., Ltd., Umicore, Advantec, Angstrom Sciences, etc. The global players competition landscape in this report is divided into three tiers. The first tier comprises global leading enterprises that command a substantial market share, hold a dominant industry position, possess strong competitiveness and influence, and generate significant revenue. The second tier includes companies with a notable market presence and reputation; these firms actively follow industry leaders in product, service, or technological innovation and maintain a moderate revenue scale. The third tier consists of smaller companies with limited market share and lower brand recognition, primarily focused on local markets and generating comparatively lower revenue.
This report studies the market size, price trends and future development prospects of High Purity Sputtering Target Material. Focus on analysing the market share, product portfolio, prices, sales, revenue and gross profit margin of global major suppliers, as well as the market status and trends of different product types and applications in the global High Purity Sputtering Target Material market. The report data covers historical data from 2020 to 2024, based year in 2025 and forecast data from 2026 to 2032.
The regions and countries in the report include US, Germany, Japan, China, France, UK, South Korea, Canada, Italy, Russia, Mexico, Brazil, India, Vietnam, Thailand, South Africa and other regions, covering the High Purity Sputtering Target Material market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of High Purity Sputtering Target Material industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.
The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.
Global Key Suppliers of High Purity Sputtering Target Material Include:
Linde
Mitsui Mining & Smelting
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Konfoong Materials International Co., Ltd
ULVAC
TOSOH
Luvata
Hitachi Metals
LT Metal
Sumitomo Chemical
Plansee SE
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
GRIKIN Advanced Material Co., Ltd.
Umicore
Advantec
Angstrom Sciences
High Purity Sputtering Target Material Product Segment Include:
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
High Purity Sputtering Target Material Product Application Include:
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others
Chapter Scope
Chapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trend
Chapter 2: Global High Purity Sputtering Target Material Industry PESTEL Analysis
Chapter 3: Global High Purity Sputtering Target Material Industry Porter's Five Forces Analysis
Chapter 4: Global High Purity Sputtering Target Material Major Regional Market Size (Revenue) and Forecast Analysis
Chapter 5: Global High Purity Sputtering Target Material Competitive Analysis of Key Suppliers (Revenue, Market Share, Regional Distribution and Industry Concentration)
Chapter 6: Global High Purity Sputtering Target Material Revenue and Forecast Analysis by Product Type
Chapter 7: Key Company Profiles (Product Portfolio, Revenue and Gross Margin)
Chapter 8: Industrial Chain Analysis, High Purity Sputtering Target Material Different Application Market Analysis (Revenue and Forecast) and Sales Channel Analysis
Chapter 9: Research Findings and Conclusion
Chapter 10: Methodology and Data Sources
According to DIResearch's in-depth investigation and research, the global High Purity Sputtering Target Material market size will reach 2,948.21 Million USD in 2025 and is projected to reach 3,530.91 Million USD by 2032, with a CAGR of 2.61% (2025-2032). Notably, the China High Purity Sputtering Target Material market has changed rapidly in the past few years. By 2025, China's market size is expected to be Million USD, representing approximately % of the global market share.
Research Summary
High Purity Sputtering Target Material refers to a specialized form of material used in the process of sputter deposition, a key technique in thin film deposition for electronics and semiconductor manufacturing. These sputtering targets are meticulously manufactured and purified to achieve an exceptionally high level of material purity. The targets are typically made of metals, alloys, or compounds like oxides or nitrides, and their high purity, often exceeding 99.99%, is crucial for producing thin films with precise and reliable characteristics. The sputtering process involves bombarding the target material with ions in a vacuum, causing atoms to be ejected and deposited onto a substrate, forming a thin film. High Purity Sputtering Target Materials are essential for ensuring uniform and high-quality thin films in the production of semiconductors, solar cells, and other electronic devices where the material's purity directly influences the performance and reliability of the final products.
The major global suppliers of High Purity Sputtering Target Material include Linde, Mitsui Mining & Smelting, JX Nippon Mining & Metals Corporation, Materion, Honeywell, Konfoong Materials International Co., Ltd, ULVAC, TOSOH, Luvata, Hitachi Metals, LT Metal, Sumitomo Chemical, Plansee SE, Fujian Acetron New Materials Co., Ltd, FURAYA Metals Co., Ltd, Luoyang Sifon Electronic Materials, Changzhou Sujing Electronic Material, GRIKIN Advanced Material Co., Ltd., Umicore, Advantec, Angstrom Sciences, etc. The global players competition landscape in this report is divided into three tiers. The first tier comprises global leading enterprises that command a substantial market share, hold a dominant industry position, possess strong competitiveness and influence, and generate significant revenue. The second tier includes companies with a notable market presence and reputation; these firms actively follow industry leaders in product, service, or technological innovation and maintain a moderate revenue scale. The third tier consists of smaller companies with limited market share and lower brand recognition, primarily focused on local markets and generating comparatively lower revenue.
This report studies the market size, price trends and future development prospects of High Purity Sputtering Target Material. Focus on analysing the market share, product portfolio, prices, sales, revenue and gross profit margin of global major suppliers, as well as the market status and trends of different product types and applications in the global High Purity Sputtering Target Material market. The report data covers historical data from 2020 to 2024, based year in 2025 and forecast data from 2026 to 2032.
The regions and countries in the report include US, Germany, Japan, China, France, UK, South Korea, Canada, Italy, Russia, Mexico, Brazil, India, Vietnam, Thailand, South Africa and other regions, covering the High Purity Sputtering Target Material market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of High Purity Sputtering Target Material industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.
The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.
Global Key Suppliers of High Purity Sputtering Target Material Include:
Linde
Mitsui Mining & Smelting
JX Nippon Mining & Metals Corporation
Materion
Honeywell
Konfoong Materials International Co., Ltd
ULVAC
TOSOH
Luvata
Hitachi Metals
LT Metal
Sumitomo Chemical
Plansee SE
Fujian Acetron New Materials Co., Ltd
FURAYA Metals Co., Ltd
Luoyang Sifon Electronic Materials
Changzhou Sujing Electronic Material
GRIKIN Advanced Material Co., Ltd.
Umicore
Advantec
Angstrom Sciences
High Purity Sputtering Target Material Product Segment Include:
Metal Sputtering Target Material
Alloy Sputtering Target Material
Non-metal Sputtering Target Material
High Purity Sputtering Target Material Product Application Include:
Semiconductor
Solar Energy
Flat Panel Display
HDD
Others
Chapter Scope
Chapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trend
Chapter 2: Global High Purity Sputtering Target Material Industry PESTEL Analysis
Chapter 3: Global High Purity Sputtering Target Material Industry Porter's Five Forces Analysis
Chapter 4: Global High Purity Sputtering Target Material Major Regional Market Size (Revenue) and Forecast Analysis
Chapter 5: Global High Purity Sputtering Target Material Competitive Analysis of Key Suppliers (Revenue, Market Share, Regional Distribution and Industry Concentration)
Chapter 6: Global High Purity Sputtering Target Material Revenue and Forecast Analysis by Product Type
Chapter 7: Key Company Profiles (Product Portfolio, Revenue and Gross Margin)
Chapter 8: Industrial Chain Analysis, High Purity Sputtering Target Material Different Application Market Analysis (Revenue and Forecast) and Sales Channel Analysis
Chapter 9: Research Findings and Conclusion
Chapter 10: Methodology and Data Sources
Table of Contents
165 Pages
- 1 High Purity Sputtering Target Material Market Overview
- 1.1 Product Definition and Statistical Scope
- 1.2 High Purity Sputtering Target Material Product by Type
- 1.2.1 Metal Sputtering Target Material
- 1.2.2 Alloy Sputtering Target Material
- 1.2.3 Non-metal Sputtering Target Material
- 1.3 High Purity Sputtering Target Material Product by Application
- 1.3.1 Semiconductor
- 1.3.2 Solar Energy
- 1.3.3 Flat Panel Display
- 1.3.4 HDD
- 1.3.5 Others
- 1.4 Global High Purity Sputtering Target Material Market Size Analysis (2020-2032)
- 1.5 High Purity Sputtering Target Material Market Development Status and Trends
- 1.5.1 High Purity Sputtering Target Material Industry Development Status Analysis
- 1.5.2 High Purity Sputtering Target Material Industry Development Trends Analysis
- 2 High Purity Sputtering Target Material Market PESTEL Analysis
- 2.1 Political Factors Analysis
- 2.2 Economic Factors Analysis
- 2.3 Social Factors Analysis
- 2.4 Technological Factors Analysis
- 2.5 Environmental Factors Analysis
- 2.6 Legal Factors Analysis
- 3 High Purity Sputtering Target Material Market Porter's Five Forces Analysis
- 3.1 Competitive Rivalry
- 3.2 Threat of New Entrants
- 3.3 Bargaining Power of Suppliers
- 3.4 Bargaining Power of Buyers
- 3.5 Threat of Substitutes
- 4 Global High Purity Sputtering Target Material Market Analysis by Country
- 4.1 Global High Purity Sputtering Target Material Market Size Analysis by Country: 2024 VS 2025 VS 2032
- 4.1.1 Global High Purity Sputtering Target Material Revenue Analysis by Country (2020-2025)
- 4.1.2 Global High Purity Sputtering Target Material Revenue Forecast Analysis by Country (2026-2032)
- 4.2 United States High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.3 Germany High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.4 Japan High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.5 China High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.6 France High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.7 U.K. High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.8 South Korea High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.9 Canada High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.10 Italy High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.11 Russia High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.12 Mexico High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.13 Brazil High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.14 India High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.15 Vietnam High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.16 Thailand High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 4.17 South Africa High Purity Sputtering Target Material Market Revenue and Growth Rate (2020-2032)
- 5 Competition by Suppliers
- 5.1 Global High Purity Sputtering Target Material Market Revenue by Key Suppliers (2021-2025)
- 5.2 High Purity Sputtering Target Material Competitive Landscape Analysis and Market Dynamic
- 5.2.1 High Purity Sputtering Target Material Competitive Landscape Analysis
- 5.2.2 Global Key Suppliers Headquarter and Key Area Sales
- 5.2.3 Market Dynamic
- 6 High Purity Sputtering Target Material Market Analysis by Type
- 6.1 Global High Purity Sputtering Target Material Market Size Analysis by Type: 2024 & 2025 & 2032
- 6.2 Global High Purity Sputtering Target Material Revenue and Forecast Analysis by Type (2020-2032)
- 7 Key Companies Analysis
- 7.1 Linde
- 7.1.1 Linde Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.1.2 Linde High Purity Sputtering Target Material Product Portfolio
- 7.1.3 Linde High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.2 Mitsui Mining & Smelting
- 7.2.1 Mitsui Mining & Smelting Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.2.2 Mitsui Mining & Smelting High Purity Sputtering Target Material Product Portfolio
- 7.2.3 Mitsui Mining & Smelting High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.3 JX Nippon Mining & Metals Corporation
- 7.3.1 JX Nippon Mining & Metals Corporation Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.3.2 JX Nippon Mining & Metals Corporation High Purity Sputtering Target Material Product Portfolio
- 7.3.3 JX Nippon Mining & Metals Corporation High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.4 Materion
- 7.4.1 Materion Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.4.2 Materion High Purity Sputtering Target Material Product Portfolio
- 7.4.3 Materion High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.5 Honeywell
- 7.5.1 Honeywell Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.5.2 Honeywell High Purity Sputtering Target Material Product Portfolio
- 7.5.3 Honeywell High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.6 Konfoong Materials International Co., Ltd
- 7.6.1 Konfoong Materials International Co., Ltd Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.6.2 Konfoong Materials International Co., Ltd High Purity Sputtering Target Material Product Portfolio
- 7.6.3 Konfoong Materials International Co., Ltd High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.7 ULVAC
- 7.7.1 ULVAC Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.7.2 ULVAC High Purity Sputtering Target Material Product Portfolio
- 7.7.3 ULVAC High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.8 TOSOH
- 7.8.1 TOSOH Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.8.2 TOSOH High Purity Sputtering Target Material Product Portfolio
- 7.8.3 TOSOH High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.9 Luvata
- 7.9.1 Luvata Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.9.2 Luvata High Purity Sputtering Target Material Product Portfolio
- 7.9.3 Luvata High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.10 Hitachi Metals
- 7.10.1 Hitachi Metals Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.10.2 Hitachi Metals High Purity Sputtering Target Material Product Portfolio
- 7.10.3 Hitachi Metals High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.11 LT Metal
- 7.11.1 LT Metal Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.11.2 LT Metal High Purity Sputtering Target Material Product Portfolio
- 7.11.3 LT Metal High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.12 Sumitomo Chemical
- 7.12.1 Sumitomo Chemical Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.12.2 Sumitomo Chemical High Purity Sputtering Target Material Product Portfolio
- 7.12.3 Sumitomo Chemical High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.13 Plansee SE
- 7.13.1 Plansee SE Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.13.2 Plansee SE High Purity Sputtering Target Material Product Portfolio
- 7.13.3 Plansee SE High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.14 Fujian Acetron New Materials Co., Ltd
- 7.14.1 Fujian Acetron New Materials Co., Ltd Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.14.2 Fujian Acetron New Materials Co., Ltd High Purity Sputtering Target Material Product Portfolio
- 7.14.3 Fujian Acetron New Materials Co., Ltd High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.15 FURAYA Metals Co., Ltd
- 7.15.1 FURAYA Metals Co., Ltd Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.15.2 FURAYA Metals Co., Ltd High Purity Sputtering Target Material Product Portfolio
- 7.15.3 FURAYA Metals Co., Ltd High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.16 Luoyang Sifon Electronic Materials
- 7.16.1 Luoyang Sifon Electronic Materials Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.16.2 Luoyang Sifon Electronic Materials High Purity Sputtering Target Material Product Portfolio
- 7.16.3 Luoyang Sifon Electronic Materials High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.17 Changzhou Sujing Electronic Material
- 7.17.1 Changzhou Sujing Electronic Material Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.17.2 Changzhou Sujing Electronic Material High Purity Sputtering Target Material Product Portfolio
- 7.17.3 Changzhou Sujing Electronic Material High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.18 GRIKIN Advanced Material Co., Ltd.
- 7.18.1 GRIKIN Advanced Material Co., Ltd. Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.18.2 GRIKIN Advanced Material Co., Ltd. High Purity Sputtering Target Material Product Portfolio
- 7.18.3 GRIKIN Advanced Material Co., Ltd. High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.19 Umicore
- 7.19.1 Umicore Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.19.2 Umicore High Purity Sputtering Target Material Product Portfolio
- 7.19.3 Umicore High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.20 Advantec
- 7.20.1 Advantec Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.20.2 Advantec High Purity Sputtering Target Material Product Portfolio
- 7.20.3 Advantec High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 7.21 Angstrom Sciences
- 7.21.1 Angstrom Sciences Basic Company Profile (Employees, Areas Service, Competitors and Contact Information)
- 7.21.2 Angstrom Sciences High Purity Sputtering Target Material Product Portfolio
- 7.21.3 Angstrom Sciences High Purity Sputtering Target Material Market Data Analysis (Revenue, Gross Margin and Market Share) (2021-2025)
- 8 Industry Chain Analysis
- 8.1 High Purity Sputtering Target Material Industry Chain Analysis
- 8.2 High Purity Sputtering Target Material Product Downstream Application Analysis
- 8.2.1 Global High Purity Sputtering Target Material Market Size and Growth Rate (CAGR) by Application: 2024 & 2025 & 2032
- 8.2.2 Global High Purity Sputtering Target Material Revenue and Forecast by Application (2020-2032)
- 8.3 High Purity Sputtering Target Material Typical Downstream Customers
- 8.4 High Purity Sputtering Target Material Sales Channel Analysis
- 9 Research Findings and Conclusion
- 10 Methodology and Data Source
- 10.1 Methodology/Research Approach
- 10.2 Research Scope
- 10.3 Benchmarks and Assumptions
- 10.4 Date Source
- 10.4.1 Primary Sources
- 10.4.2 Secondary Sources
- 10.5 Data Cross Validation
- 10.6 Disclaimer
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