Global Sputtering Target Material Supply, Demand and Key Producers, 2026-2032

The global Sputtering Target Material market size is expected to reach $ 9002 million by 2032, rising at a market growth of 7.2% CAGR during the forecast period (2026-2032).

Sputtering is the process of forming a thin film when the object is attached to the target substrate by the sputtering and scattering, and the sputtering target is the material for high-speed particle bombardment. This report studies the sputtering target material market.

Global Sputtering Target Material key players include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting etc. Global top five manufacturers hold a share over 40%.

North America is the largest market, with a share over 35%, followed by Europe and Japan, both have a share over 40% percent.

In terms of product, Metal Target is the largest segment, with a share over 60%. And in terms of application, the largest application is Semiconductor followed by Others Flat Panel Display.

This report studies the global Sputtering Target Material production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for Sputtering Target Material and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Sputtering Target Material that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global Sputtering Target Material total production and demand, 2021-2032, (Ksqm)

Global Sputtering Target Material total production value, 2021-2032, (USD Million)

Global Sputtering Target Material production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Ksqm), (based on production site)

Global Sputtering Target Material consumption by region & country, CAGR, 2021-2032 & (Ksqm)

U.S. VS China: Sputtering Target Material domestic production, consumption, key domestic manufacturers and share

Global Sputtering Target Material production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Ksqm)

Global Sputtering Target Material production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Ksqm)

Global Sputtering Target Material production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Ksqm)

This report profiles key players in the global Sputtering Target Material market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Mitsui Mining & Smelting, Hitachi Metals, Honeywell, Sumitomo Chemical, ULVAC, GRIKIN Advanced Material Co., Ltd., etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Sputtering Target Material market

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Ksqm) and average price (USD/sqm) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.

Global Sputtering Target Material Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global Sputtering Target Material Market, Segmentation by Type:
Metal Target
Alloy Target
Ceramic Compound Target

Global Sputtering Target Material Market, Segmentation by Application:
Semiconductor
Solar Energy
LCD Flat Panel Display
Others Flat Panel Display

Companies Profiled:
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Mitsui Mining & Smelting
Hitachi Metals
Honeywell
Sumitomo Chemical
ULVAC
GRIKIN Advanced Material Co., Ltd.
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials Co., Ltd
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
FURAYA Metals Co., Ltd
Advantec
Angstrom Sciences
Umicore Thin Film Products

Key Questions Answered:

1. How big is the global Sputtering Target Material market?

2. What is the demand of the global Sputtering Target Material market?

3. What is the year over year growth of the global Sputtering Target Material market?

4. What is the production and production value of the global Sputtering Target Material market?

5. Who are the key producers in the global Sputtering Target Material market?

6. What are the growth factors driving the market demand? Show more