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Global High Purity Tungsten Sputtering Targets Supply, Demand and Key Producers, 2026-2032

Publisher GlobalInfoResearch
Published Jan 16, 2026
Length 108 Pages
SKU # GFSH20743865

Description

The global High Purity Tungsten Sputtering Targets market size is expected to reach $ 110 million by 2032, rising at a market growth of 5.0% CAGR during the forecast period (2026-2032).

High purity tungsten sputtering targets are made from high-quality tungsten material that is purified to remove impurities and contaminants. The purity level of these targets is typically 99.99% or higher, ensuring the deposition of clean and defect-free films. Purity of 4N (purity≥99.99%) and above is our statistical range.

They are usually made in the form of disc, rectangle, or rotary targets, with a uniform and smooth surface for efficient sputtering. High purity tungsten sputtering targets are used in the manufacturing of various thin films and coatings in industries such as electronics, solar cells, and optics. Tungsten is a dense and hard metal with a high melting point, making it ideal for sputtering applications. High purity tungsten sputtering targets play a crucial role in the production of advanced thin film technologies, enabling the development of high-performance electronic devices, solar cells, and optical coatings.

Global key players of High Purity Tungsten Sputtering Targets include JX Metals Corporation, Tosoh, Honeywell, ULVAC and Linde (Praxair), etc. The top five players hold a share over 90%. Asia-Pacific is the largest market, has a share about 85%. In terms of product type, 12 inch is the largest segment, occupied for a share of 85%, and in terms of application, Memory Chip has a share about 90 percent.

This report studies the global High Purity Tungsten Sputtering Targets production, demand, key manufacturers, and key regions.

This report is a detailed and comprehensive analysis of the world market for High Purity Tungsten Sputtering Targets and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of High Purity Tungsten Sputtering Targets that contribute to its increasing demand across many markets.

Highlights and key features of the study

Global High Purity Tungsten Sputtering Targets total production and demand, 2021-2032, (Pieces)

Global High Purity Tungsten Sputtering Targets total production value, 2021-2032, (USD Million)

Global High Purity Tungsten Sputtering Targets production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Pieces), (based on production site)

Global High Purity Tungsten Sputtering Targets consumption by region & country, CAGR, 2021-2032 & (Pieces)

U.S. VS China: High Purity Tungsten Sputtering Targets domestic production, consumption, key domestic manufacturers and share

Global High Purity Tungsten Sputtering Targets production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Pieces)

Global High Purity Tungsten Sputtering Targets production by Size, production, value, CAGR, 2021-2032, (USD Million) & (Pieces)

Global High Purity Tungsten Sputtering Targets production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Pieces)

This report profiles key players in the global High Purity Tungsten Sputtering Targets market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include JX Metals Corporation, Tosoh, Honeywell, Linde (Praxair), ULVAC, Materion, Umicore Materials, Konfoong Materials International Co., Ltd, GRIKIN Advanced Material Co., Ltd., etc.

This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.

Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World High Purity Tungsten Sputtering Targets market

Detailed Segmentation:

Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Pieces) and average price (US$/Piece) by manufacturer, by Size, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.

Global High Purity Tungsten Sputtering Targets Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World

Global High Purity Tungsten Sputtering Targets Market, Segmentation by Size:
12 Inch
8 Inch

Global High Purity Tungsten Sputtering Targets Market, Segmentation by Application:
Memory Chip
Others

Companies Profiled:
JX Metals Corporation
Tosoh
Honeywell
Linde (Praxair)
ULVAC
Materion
Umicore Materials
Konfoong Materials International Co., Ltd
GRIKIN Advanced Material Co., Ltd.

Key Questions Answered:

1. How big is the global High Purity Tungsten Sputtering Targets market?

2. What is the demand of the global High Purity Tungsten Sputtering Targets market?

3. What is the year over year growth of the global High Purity Tungsten Sputtering Targets market?

4. What is the production and production value of the global High Purity Tungsten Sputtering Targets market?

5. Who are the key producers in the global High Purity Tungsten Sputtering Targets market?

6. What are the growth factors driving the market demand?

Table of Contents

108 Pages
1 Supply Summary
2 Demand Summary
3 World Manufacturers Competitive Analysis
4 United States VS China VS Rest of the World
5 Market Analysis by Size
6 Market Analysis by Application
7 Company Profiles
8 Industry Chain Analysis
9 Research Findings and Conclusion
10 Appendix
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