EUV Photoresists - Global Industry Market Analysis Report 2020-2031

EUV photoresists are photosensitive materials designed for extreme ultraviolet lithography (EUVL), which is used to transfer tiny patterns to wafers in semiconductor manufacturing. EUV lithography uses extreme ultraviolet light with a wavelength of 13.5 nanometers, which can achieve feature sizes less than 7 nanometers and is one of the most advanced technologies in chip manufacturing today. Photoresists play a key role in this process, accurately copying the pattern on the mask to the substrate through the exposure and development process.

The working principle of EUV photoresists is based on their absorption and chemical reaction to EUV light. When EUV photons are irradiated on photoresists, the photon energy (about 92 electron volts) excites molecules or atoms in the material, triggering photochemical reactions (such as photoacid generation or cross-linking), thereby changing the solubility of the photoresist. According to the type of reaction, photoresists can be divided into positive (exposed areas are dissolved) and negative (exposed areas are retained). Mainstream EUV photoresists include chemically amplified photoresists (CAR), inorganic photoresists (such as metal oxides), and molecular glass photoresists. Each type has its own advantages and disadvantages in sensitivity, resolution, and line edge roughness (LER).

From a performance perspective, EUV photoresists need to meet the requirements of high sensitivity (low exposure dose), high resolution (supporting features as small as 2-3 nanometers), and low LER to adapt to chip manufacturing at advanced nodes. Chemically amplified photoresists currently dominate due to their mature technology and high sensitivity, but their stochasticity problems lead to increased defects. Inorganic photoresists (such as zinc or tin-based metal oxides) have attracted much attention in recent years due to their high absorption rate and etching resistance, especially for high-resolution requirements. Molecular glass photoresists offer potential low roughness advantages with smaller molecular sizes, but sensitivity still needs to be optimized. This trilemma (resolution-sensitivity-roughness trade-off) is the focus of current research and development.

In terms of the market, the demand for EUV photoresist has grown rapidly with the popularization of EUV lithography technology, especially in the manufacturing of logic chips (such as nodes below 5 nanometers) and memory chips. The Asia-Pacific region, especially Japan, South Korea and Taiwan, is the main consumer market due to its high concentration of semiconductor manufacturing.

In general, EUV photoresist is a key material to promote the advancement of semiconductor technology. Despite technical challenges such as random defects and high costs, its development prospects continue to be optimistic due to the demand for miniaturization.

Report Scope

This report aims to deliver a thorough analysis of the global market for EUV Photoresists, offering both quantitative and qualitative insights to assist readers in formulating business growth strategies, evaluating the competitive landscape, understanding their current market position, and making well-informed decisions regarding EUV Photoresists.

The report is enriched with qualitative evaluations, including market drivers, challenges, Porter’s Five Forces, regulatory frameworks, consumer preferences, and ESG (Environmental, Social, and Governance) factors.

The report provides detailed classification of EUV Photoresists, such as type, etc.; detailed examples of EUV Photoresists applications, such as application one, etc., and provides comprehensive historical (2020-2025) and forecast (2026-2031) market size data.

The report provides detailed classification of EUV Photoresists, such as EUV (Chemical), EUV (Non-Chemical), etc.; detailed examples of EUV Photoresists applications, such as Logic IC, Memory, Other, etc., and provides comprehensive historical (2020-2025) and forecast (2026-2031) market size data.

The report covers key global regions—North America, Europe, Asia-Pacific, Latin America, and the Middle East & Africa—providing granular, country-specific insights for major markets such as the United States, China, Germany, and Brazil.

The report deeply explores the competitive landscape of EUV Photoresists products, details the sales, revenue, and regional layout of some of the world's leading manufacturers, and provides in-depth company profiles and contact details.

The report contains a comprehensive industry chain analysis covering raw materials, downstream customers and sales channels.

Core Chapters

Chapter One: Introduces the study scope of this report, market status, market drivers, challenges, porters five forces analysis, regulatory policy, consumer preference, market attractiveness and ESG analysis.
Chapter Two: market segments by Type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter Three: EUV Photoresists market sales and revenue in regional level and country level. It provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and production of each country in the world.
Chapter Four: Provides the analysis of various market segments by Application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter Five: Detailed analysis of EUV Photoresists manufacturers competitive landscape, price, sales, revenue, market share, footprint, merger, and acquisition information, etc.
Chapter Six: Provides profiles of leading manufacturers, introducing the basic situation of the main companies in the market in detail, including product sales, revenue, price, gross margin, product introduction.
Chapter Seven: Analysis of industrial chain, key raw materials, customers and sales channel.
Chapter Eight: Key Takeaways and Final Conclusions
Chapter Nine: Methodology and Sources. Show more