Global Overlay Measurement System Market Growth 2025-2031

The global Overlay Measurement System market size is predicted to grow from US$ 656 million in 2025 to US$ 937 million in 2031; it is expected to grow at a CAGR of 6.1% from 2025 to 2031.

According to the different types of inspection, semiconductor quality control equipment can be divided into inspection equipment and metrology equipment.

Semiconductor inspection runs through the entire semiconductor process, that is, the front-end and back-end. Semiconductor inspection includes optical inspection, electron beam inspection and X-ray measurement. It mainly detects whether there are abnormal quality conditions on the surface of the wafer or in the circuit structure, such as scratches/scratches, particle contamination, graphic errors and other defects. Different inspection technologies have obvious differences, mainly reflected in accuracy, speed and inspection purposes.

Semiconductor Metrology refers not only to the measurement behavior itself, but also to the measurement made by considering errors and accuracy, as well as the performance and mechanism of the measuring equipment. If the measurement result is not within the given specification range, the manufacturing equipment cannot continue to operate as designed.

According to different application scenarios, semiconductor inspection can be mainly divided into Optical Critical Dimension OCD, Film Metrology, Overlay Metrology, Mask/Reticle Inspection, Non-patterned Wafer Inspection, Patterned Wafer Inspection and Review SEM.

Overlay error refers to the deviation of the plane distance between the centers of two-layer graphic structures. As the number of integrated circuit layers continues to increase, multiple patterning and multiple exposure lithography processes are becoming increasingly common, which makes the overlay accuracy between the circuit patterns formed in each step critical. Excessive overlay error can cause the circuit pattern to be misaligned, which in turn causes the entire circuit to fail and be scrapped. Therefore, the measurement of overlay error is usually indispensable after each lithography step. In order to ensure the precise alignment and placement of circuit patterns at different levels and the same level, Overlay Metrology System is widely used.

Overlay measurement system terminals are mainly used in wafer fabs and packaging plants. They are divided into front-end and back-end packaging and testing. Currently, overlay measurement systems are mainly used in front-end wafer manufacturing, of which 12-inch wafers account for more than 70%. Globally, overlay measurement system companies are mainly concentrated in the United States, Europe, Israel, Japan, China, South Korea and other regions/countries. The core companies are mainly KLA, AMAT, Onto, AUROS, Hitachi, etc., and the top 3 companies have a share of more than 48%.

LP Information, Inc. (LPI) ' newest research report, the “Overlay Measurement System Industry Forecast” looks at past sales and reviews total world Overlay Measurement System sales in 2024, providing a comprehensive analysis by region and market sector of projected Overlay Measurement System sales for 2025 through 2031. With Overlay Measurement System sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Overlay Measurement System industry.

This Insight Report provides a comprehensive analysis of the global Overlay Measurement System landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on Overlay Measurement System portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Overlay Measurement System market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Overlay Measurement System and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Overlay Measurement System.

This report presents a comprehensive overview, market shares, and growth opportunities of Overlay Measurement System market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:
IBO
DBO
SEM-OL

Segmentation by Application:
8 Inch Overlay
12 Inch Overlay
Package Overlay

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
KLA Corporation
AMAT
Camtek
Nikon
Hitachi
Toray
Onto Innovation
EV Group
ASML
AUROS Technology
Tokyo Aircraft Instrument
Skyverse Technology
CHOTEST TECHNOLOGY
Shanghai Yuweitk
Shenzhen Angstrom Excellence
Beijing Megarobo
Advanced Spectral Technology
MueTec
Chroma ATE Inc
Hangzhou Changchuan Technology
Favite
TZTEK Technology
Hangzhou Nano-science Instrument
MZ Optoelectronic Technology (Shanghai) Co.,Ltd
Shanghai Purechip

Key Questions Addressed in this Report

What is the 10-year outlook for the global Overlay Measurement System market?

What factors are driving Overlay Measurement System market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do Overlay Measurement System market opportunities vary by end market size?

How does Overlay Measurement System break out by Type, by Application?

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