The global Optical Proximity Correction (OPC) Software market size is predicted to grow from US$ 577 million in 2025 to US$ 1504 million in 2031; it is expected to grow at a CAGR of 17.3% from 2025 to 2031.
Photolithographic contact correction (OPC) software is a tool used in the semiconductor manufacturing process. It is mainly used to correct photolithographic patterns to solve problems such as chip size deviation and shape distortion caused by the limitation of photolithography process. Photolithography is an important step in semiconductor manufacturing used to transfer pattern patterns from chip designs onto silicon wafers. However, due to limitations of optical phenomena and physical effects, the photolithography process can cause some deviations in shape and size. These deviations may affect the chip's performance and functionality. OPC software automatically performs pattern correction and optimization by analyzing lithographic patterns and optical effects. It can fine-tune and optimize chip designs based on specific lithography process parameters and device characteristics. The goal of the revision is to achieve more accurate, stable and consistent chip manufacturing.
The wafer industry is expanding due to ongoing developments in semiconductor technology, such as the shift to smaller process nodes (for example, from 14nm to 7nm and beyond). As a result, producers can create more compact, potent, and energy-efficient chips. For features such as autonomous driving, electrification, and connection, the car industry is becoming increasingly dependent on cutting-edge electronics. More sophisticated semiconductor wafers are needed for this. One primary driver is the widespread use of electronic devices in various sectors, including consumer electronics, automotive, healthcare, and telecommunications. Manufacturing the integrated circuits (ICs) utilized in these devices is intimately related to the demand for semiconductor wafers. More potent and energy-efficient chips are needed due to the growth in data centers and cloud computing services. The need for cutting-edge semiconductor wafers has consequently increased. Evolving industry trends, such as Industry 4.0, smart manufacturing, green electronic component manufacturing, digitization, and wide-scale adoption of IoT-connected devices offer lucrative growth opportunities in the EDA software market. The integrated AI-driven engine assists chip manufacturers in minimizing production costs without compromising the silicon quality and boosts engineering productivity, supporting the OPC software market growth.
LPI (LP Information)' newest research report, the “Optical Proximity Correction (OPC) Software Industry Forecast” looks at past sales and reviews total world Optical Proximity Correction (OPC) Software sales in 2024, providing a comprehensive analysis by region and market sector of projected Optical Proximity Correction (OPC) Software sales for 2025 through 2031. With Optical Proximity Correction (OPC) Software sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world Optical Proximity Correction (OPC) Software industry.
This Insight Report provides a comprehensive analysis of the global Optical Proximity Correction (OPC) Software landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyses the strategies of leading global companies with a focus on Optical Proximity Correction (OPC) Software portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global Optical Proximity Correction (OPC) Software market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for Optical Proximity Correction (OPC) Software and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global Optical Proximity Correction (OPC) Software.
This report presents a comprehensive overview, market shares, and growth opportunities of Optical Proximity Correction (OPC) Software market by product type, application, key players and key regions and countries.
Segmentation by Type:
Rule-Based
Model-Based
Segmentation by Application:
Foundries
IDMs
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analyzing the company's coverage, product portfolio, its market penetration.
ASML
Shenzhen Guoweixin Technology
Siemens
Synopsys
Wuhan Yuwei Optical Software
Moyan Computational Science
Please note: The report will take approximately 2 business days to prepare and deliver.
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