Global High-k and CVD ALD Metal Precursor Market Growth 2025-2031

The global High-k and CVD ALD Metal Precursor market size is predicted to grow from US$ 621 million in 2025 to US$ 914 million in 2031; it is expected to grow at a CAGR of 6.6% from 2025 to 2031.

Precursors are the main raw materials for semiconductor thin film deposition processes, and are mainly used in vapor deposition (including PVD, CVD, and ALD) to form various thin film layers that meet the requirements of semiconductor manufacturing.Precursors can be divided into high-k precursors, low-k precursors, silicon oxide and silicon nitride precursors, metal and metal nitride precursors, etc.

High dielectric constant precursor (High-k): Mainly used in 45nm and below semiconductor manufacturing process, used in CVD and ALD deposition technology of memory and logic chips to form capacitive dielectric or gate dielectric in integrated circuits , to solve the problem of device scaling and leakage, which can reduce leakage to about 10 times that of traditional processes and greatly improve yield; it can also be applied to flexible OLED ALD processes to protect organic light-emitting materials from oxygen and water vapor, and improve overall performance and life. .

Metal and metal nitride precursors are mainly used for capacitor electrodes, gate transition layers, and isolation materials in storage and logic chips, which are conducive to the preparation of smaller capacitors; they can also be used as phase-change materials in phase-change memories, which can improve storage data. speed.

United States market for High-k and CVD ALD Metal Precursor is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

China market for High-k and CVD ALD Metal Precursor is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

Europe market for High-k and CVD ALD Metal Precursor is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

Global key High-k and CVD ALD Metal Precursor players cover Air Liquide, Merck, DNF, Nanmat Technology, Adeka Corporation, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.

LP Information, Inc. (LPI) ' newest research report, the “High-k and CVD ALD Metal Precursor Industry Forecast” looks at past sales and reviews total world High-k and CVD ALD Metal Precursor sales in 2024, providing a comprehensive analysis by region and market sector of projected High-k and CVD ALD Metal Precursor sales for 2025 through 2031. With High-k and CVD ALD Metal Precursor sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world High-k and CVD ALD Metal Precursor industry.

This Insight Report provides a comprehensive analysis of the global High-k and CVD ALD Metal Precursor landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on High-k and CVD ALD Metal Precursor portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global High-k and CVD ALD Metal Precursor market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for High-k and CVD ALD Metal Precursor and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global High-k and CVD ALD Metal Precursor.

This report presents a comprehensive overview, market shares, and growth opportunities of High-k and CVD ALD Metal Precursor market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:
High-k Precursor
Metal Precursor

Segmentation by Application:
Gates Manufacturing
Capacitors Manufacturing
Electrodes Manufacturing
Interconnects Manufacturing
Others

This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Air Liquide
Merck
DNF
Nanmat Technology
Adeka Corporation
Entegris, Inc.
Strem (Ascensus Specialties)
Tri Chemical Laboratories
UP Chemical (Yoke Technology)
City Chemical
Soulbrain
Hansol Chemical

Key Questions Addressed in this Report

What is the 10-year outlook for the global High-k and CVD ALD Metal Precursor market?

What factors are driving High-k and CVD ALD Metal Precursor market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do High-k and CVD ALD Metal Precursor market opportunities vary by end market size?

How does High-k and CVD ALD Metal Precursor break out by Type, by Application?

Please note: The report will take approximately 2 business days to prepare and deliver.