Global CMP Polishing Liquid Abrasive Particles Market Growth 2025-2031
Description
The global CMP Polishing Liquid Abrasive Particles market size is predicted to grow from US$ 447 million in 2025 to US$ 708 million in 2031; it is expected to grow at a CAGR of 8.0% from 2025 to 2031.
The impact of the latest U.S. tariff measures and the corresponding policy responses from countries worldwide on market competitiveness, regional economic performance, and supply chain configurations will be comprehensively evaluated in this report.
In the semiconductor industry, Chemical Mechanical Planarization (CMP) is a crucial process used to achieve flatness and smoothness on semiconductor wafers by removing material from their surfaces. CMP polishing liquid abrasive particles are integral components in CMP slurries, responsible for abrading the wafer surface in a controlled manner to achieve the desired planarity and surface quality.
United States market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
China market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Europe market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Global key CMP Polishing Liquid Abrasive Particles players cover Nissan Chemical, Nouryon, FUSO, Solvay, Fujimi, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.
LP Information, Inc. (LPI) ' newest research report, the “CMP Polishing Liquid Abrasive Particles Industry Forecast” looks at past sales and reviews total world CMP Polishing Liquid Abrasive Particles sales in 2024, providing a comprehensive analysis by region and market sector of projected CMP Polishing Liquid Abrasive Particles sales for 2025 through 2031. With CMP Polishing Liquid Abrasive Particles sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world CMP Polishing Liquid Abrasive Particles industry.
This Insight Report provides a comprehensive analysis of the global CMP Polishing Liquid Abrasive Particles landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on CMP Polishing Liquid Abrasive Particles portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global CMP Polishing Liquid Abrasive Particles market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for CMP Polishing Liquid Abrasive Particles and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global CMP Polishing Liquid Abrasive Particles.
This report presents a comprehensive overview, market shares, and growth opportunities of CMP Polishing Liquid Abrasive Particles market by product type, application, key manufacturers and key regions and countries.
Segmentation by Type:
Silica Sol Abrasive Particles
Alumina Abrasive Particles
Cerium Oxide Abrasive Particles
Others
Segmentation by Application:
Semiconductor Manufacturing
Optical Device Manufacturing
Others
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Nissan Chemical
Nouryon
FUSO
Solvay
Fujimi
Xinanna Electronic Technology
Hubei Dinglong Holding
Juxin Semiconductor Materials
Key Questions Addressed in this Report
What is the 10-year outlook for the global CMP Polishing Liquid Abrasive Particles market?
What factors are driving CMP Polishing Liquid Abrasive Particles market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do CMP Polishing Liquid Abrasive Particles market opportunities vary by end market size?
How does CMP Polishing Liquid Abrasive Particles break out by Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
The impact of the latest U.S. tariff measures and the corresponding policy responses from countries worldwide on market competitiveness, regional economic performance, and supply chain configurations will be comprehensively evaluated in this report.
In the semiconductor industry, Chemical Mechanical Planarization (CMP) is a crucial process used to achieve flatness and smoothness on semiconductor wafers by removing material from their surfaces. CMP polishing liquid abrasive particles are integral components in CMP slurries, responsible for abrading the wafer surface in a controlled manner to achieve the desired planarity and surface quality.
United States market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
China market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Europe market for CMP Polishing Liquid Abrasive Particles is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.
Global key CMP Polishing Liquid Abrasive Particles players cover Nissan Chemical, Nouryon, FUSO, Solvay, Fujimi, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.
LP Information, Inc. (LPI) ' newest research report, the “CMP Polishing Liquid Abrasive Particles Industry Forecast” looks at past sales and reviews total world CMP Polishing Liquid Abrasive Particles sales in 2024, providing a comprehensive analysis by region and market sector of projected CMP Polishing Liquid Abrasive Particles sales for 2025 through 2031. With CMP Polishing Liquid Abrasive Particles sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world CMP Polishing Liquid Abrasive Particles industry.
This Insight Report provides a comprehensive analysis of the global CMP Polishing Liquid Abrasive Particles landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on CMP Polishing Liquid Abrasive Particles portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms’ unique position in an accelerating global CMP Polishing Liquid Abrasive Particles market.
This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for CMP Polishing Liquid Abrasive Particles and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global CMP Polishing Liquid Abrasive Particles.
This report presents a comprehensive overview, market shares, and growth opportunities of CMP Polishing Liquid Abrasive Particles market by product type, application, key manufacturers and key regions and countries.
Segmentation by Type:
Silica Sol Abrasive Particles
Alumina Abrasive Particles
Cerium Oxide Abrasive Particles
Others
Segmentation by Application:
Semiconductor Manufacturing
Optical Device Manufacturing
Others
This report also splits the market by region:
Americas
United States
Canada
Mexico
Brazil
APAC
China
Japan
Korea
Southeast Asia
India
Australia
Europe
Germany
France
UK
Italy
Russia
Middle East & Africa
Egypt
South Africa
Israel
Turkey
GCC Countries
The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the company's coverage, product portfolio, its market penetration.
Nissan Chemical
Nouryon
FUSO
Solvay
Fujimi
Xinanna Electronic Technology
Hubei Dinglong Holding
Juxin Semiconductor Materials
Key Questions Addressed in this Report
What is the 10-year outlook for the global CMP Polishing Liquid Abrasive Particles market?
What factors are driving CMP Polishing Liquid Abrasive Particles market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do CMP Polishing Liquid Abrasive Particles market opportunities vary by end market size?
How does CMP Polishing Liquid Abrasive Particles break out by Type, by Application?
Please note: The report will take approximately 2 business days to prepare and deliver.
Table of Contents
105 Pages
- *This is a tentative TOC and the final deliverable is subject to change.*
- 1 Scope of the Report
- 2 Executive Summary
- 3 Global by Company
- 4 World Historic Review for CMP Polishing Liquid Abrasive Particles by Geographic Region
- 5 Americas
- 6 APAC
- 7 Europe
- 8 Middle East & Africa
- 9 Market Drivers, Challenges and Trends
- 10 Manufacturing Cost Structure Analysis
- 11 Marketing, Distributors and Customer
- 12 World Forecast Review for CMP Polishing Liquid Abrasive Particles by Geographic Region
- 13 Key Players Analysis
- 14 Research Findings and Conclusion
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