Global Semiconductor Cleaning and Etching Gas Supply, Demand and Key Producers, 2026-2032
Description
The global Semiconductor Cleaning and Etching Gas market size is expected to reach $ 4747 million by 2032, rising at a market growth of 7.4% CAGR during the forecast period (2026-2032).
Semiconductor Cleaning Gas are gases utilized to remove various contaminants from the surface of semiconductor wafers. Contaminants can include organic substances, metal ions, particles, and residual substances from previous process steps. Cleaning gases work through physical or chemical actions to ensure the wafer surface is clean and suitable for subsequent manufacturing processes.
Common Types
Hydrogen Chloride (HCl): It is often used to remove metal impurities on the wafer surface. HCl can react with metal oxides to form soluble metal chlorides, which can then be easily washed away.
Ammonia (NH₃): Ammonia is commonly employed for cleaning organic contaminants. It can dissolve and remove organic substances through chemical reactions and hydrogen bonding interactions.
Oxygen (O₂): Oxygen is frequently used in plasma cleaning processes. In a plasma environment, oxygen can react with organic contaminants to form carbon dioxide and water, which are volatile and can be removed from the wafer surface.
Etching gases are gases that are used to selectively remove or etch specific materials from the semiconductor wafer surface to create precise patterns and structures. This is a crucial process in defining the various components and circuits on the semiconductor device.
Common Types
Chlorine-based Gases: Such as chlorine (Cl₂) and boron trichloride (BCl₃). They are often used for etching metals and silicon. For example, Cl₂ can react with silicon to form silicon tetrachloride (SiCl₄), which is a volatile compound and can be removed from the wafer surface, thereby achieving the etching of silicon.
Fluorine-based Gases: Such as fluorine (F₂), sulfur hexafluoride (SF₆), and nitrogen trifluoride (NF₃). Fluorine-based gases are widely used for etching silicon dioxide and silicon nitride. SF₆, for instance, can react with silicon dioxide in a plasma environment to form silicon tetrafluoride (SiF₄) and other volatile fluorides, enabling the precise removal of silicon dioxide layers.
Hydrogen Bromide (HBr): HBr is used for etching certain metal layers and silicon in some semiconductor processes. It can react with the target material to form volatile bromides, which are then removed from the surface.
The Semiconductor Industry Association (SIA) announced global semiconductor sales hit $627.6 billion in 2024, an increase of 19.1% compared to the 2023 total of $526.8 billion. Additionally, fourth-quarter sales of $170.9 billion were 17.1% more than the fourth quarter of 2023, and 3.0% higher than the third quarter of 2024. And global sales for the month of December 2024 were $57.0 billion, a decrease of 1.2% compared to the November 2024 total.
“The global semiconductor market experienced its highest-ever sales year in 2024, topping $600 billion in annual sales for the first time, and double-digit market growth is projected for 2025,” said John Neuffer, SIA president and CEO. “Semiconductors enable virtually all modern technologies – including medical devices, communications, defense applications, AI, advanced transportation, and countless others – and the long-term industry outlook is incredibly strong.”
Semiconductor cleaning and etching gases are special gases used in the semiconductor manufacturing process to clean semiconductor wafers and etch specific materials on them.In terms of semiconductor cleaning and etching gas production, Japan and South Korea are currently the world's largest high-end semiconductor cleaning and etching gas production regions, and export to many countries around the world. At the same time, with the development of industry, customers have put forward more quality requirements and higher technical indicators for Semiconductor Cleaning and Etching Gass as their key raw materials. Semiconductor Cleaning and Etching Gas companies should actively improve product quality to make their products attractive in the market.
The main semiconductor cleaning and etching gas manufacturers in the market include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, etc. Japanese and Korean companies have a large share in the high-end market, among which the top five companies in 2023 accounted for 49.44% of the revenue market share. With the rapid rise of China's semiconductor industry and the government's strong support for the semiconductor industry, Chinese companies will continue to increase their R&D investment, enhance their independent R&D capabilities, and develop a series of high-purity, high-performance cleaning and etching gases.
This report studies the global Semiconductor Cleaning and Etching Gas production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Semiconductor Cleaning and Etching Gas and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Semiconductor Cleaning and Etching Gas that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Semiconductor Cleaning and Etching Gas total production and demand, 2021-2032, (Tons)
Global Semiconductor Cleaning and Etching Gas total production value, 2021-2032, (USD Million)
Global Semiconductor Cleaning and Etching Gas production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Tons), (based on production site)
Global Semiconductor Cleaning and Etching Gas consumption by region & country, CAGR, 2021-2032 & (Tons)
U.S. VS China: Semiconductor Cleaning and Etching Gas domestic production, consumption, key domestic manufacturers and share
Global Semiconductor Cleaning and Etching Gas production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Tons)
Global Semiconductor Cleaning and Etching Gas production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Tons)
Global Semiconductor Cleaning and Etching Gas production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Tons)
This report profiles key players in the global Semiconductor Cleaning and Etching Gas market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, Taiyo Nippon Sanso, Merck KGaA, Mitsui Chemical, Central Glass, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Semiconductor Cleaning and Etching Gas market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Tons) and average price (US$/Ton) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Semiconductor Cleaning and Etching Gas Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Semiconductor Cleaning and Etching Gas Market, Segmentation by Type:
Fluoride Gas
Chloride Gas
Others
Global Semiconductor Cleaning and Etching Gas Market, Segmentation by Application:
Semiconductor Cleaning
Semiconductor Etching
Companies Profiled:
SK Materials
Kanto Denka Kogyo
Resonac
Linde Group
Peric
Hyosung
Taiyo Nippon Sanso
Merck KGaA
Mitsui Chemical
Central Glass
Haohua Chemical Science & Technology
Shandong FeiYuan
Messer Group
Air Liquide
Huate Gas
Key Questions Answered:
1. How big is the global Semiconductor Cleaning and Etching Gas market?
2. What is the demand of the global Semiconductor Cleaning and Etching Gas market?
3. What is the year over year growth of the global Semiconductor Cleaning and Etching Gas market?
4. What is the production and production value of the global Semiconductor Cleaning and Etching Gas market?
5. Who are the key producers in the global Semiconductor Cleaning and Etching Gas market?
6. What are the growth factors driving the market demand?
Semiconductor Cleaning Gas are gases utilized to remove various contaminants from the surface of semiconductor wafers. Contaminants can include organic substances, metal ions, particles, and residual substances from previous process steps. Cleaning gases work through physical or chemical actions to ensure the wafer surface is clean and suitable for subsequent manufacturing processes.
Common Types
Hydrogen Chloride (HCl): It is often used to remove metal impurities on the wafer surface. HCl can react with metal oxides to form soluble metal chlorides, which can then be easily washed away.
Ammonia (NH₃): Ammonia is commonly employed for cleaning organic contaminants. It can dissolve and remove organic substances through chemical reactions and hydrogen bonding interactions.
Oxygen (O₂): Oxygen is frequently used in plasma cleaning processes. In a plasma environment, oxygen can react with organic contaminants to form carbon dioxide and water, which are volatile and can be removed from the wafer surface.
Etching gases are gases that are used to selectively remove or etch specific materials from the semiconductor wafer surface to create precise patterns and structures. This is a crucial process in defining the various components and circuits on the semiconductor device.
Common Types
Chlorine-based Gases: Such as chlorine (Cl₂) and boron trichloride (BCl₃). They are often used for etching metals and silicon. For example, Cl₂ can react with silicon to form silicon tetrachloride (SiCl₄), which is a volatile compound and can be removed from the wafer surface, thereby achieving the etching of silicon.
Fluorine-based Gases: Such as fluorine (F₂), sulfur hexafluoride (SF₆), and nitrogen trifluoride (NF₃). Fluorine-based gases are widely used for etching silicon dioxide and silicon nitride. SF₆, for instance, can react with silicon dioxide in a plasma environment to form silicon tetrafluoride (SiF₄) and other volatile fluorides, enabling the precise removal of silicon dioxide layers.
Hydrogen Bromide (HBr): HBr is used for etching certain metal layers and silicon in some semiconductor processes. It can react with the target material to form volatile bromides, which are then removed from the surface.
The Semiconductor Industry Association (SIA) announced global semiconductor sales hit $627.6 billion in 2024, an increase of 19.1% compared to the 2023 total of $526.8 billion. Additionally, fourth-quarter sales of $170.9 billion were 17.1% more than the fourth quarter of 2023, and 3.0% higher than the third quarter of 2024. And global sales for the month of December 2024 were $57.0 billion, a decrease of 1.2% compared to the November 2024 total.
“The global semiconductor market experienced its highest-ever sales year in 2024, topping $600 billion in annual sales for the first time, and double-digit market growth is projected for 2025,” said John Neuffer, SIA president and CEO. “Semiconductors enable virtually all modern technologies – including medical devices, communications, defense applications, AI, advanced transportation, and countless others – and the long-term industry outlook is incredibly strong.”
Semiconductor cleaning and etching gases are special gases used in the semiconductor manufacturing process to clean semiconductor wafers and etch specific materials on them.In terms of semiconductor cleaning and etching gas production, Japan and South Korea are currently the world's largest high-end semiconductor cleaning and etching gas production regions, and export to many countries around the world. At the same time, with the development of industry, customers have put forward more quality requirements and higher technical indicators for Semiconductor Cleaning and Etching Gass as their key raw materials. Semiconductor Cleaning and Etching Gas companies should actively improve product quality to make their products attractive in the market.
The main semiconductor cleaning and etching gas manufacturers in the market include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, etc. Japanese and Korean companies have a large share in the high-end market, among which the top five companies in 2023 accounted for 49.44% of the revenue market share. With the rapid rise of China's semiconductor industry and the government's strong support for the semiconductor industry, Chinese companies will continue to increase their R&D investment, enhance their independent R&D capabilities, and develop a series of high-purity, high-performance cleaning and etching gases.
This report studies the global Semiconductor Cleaning and Etching Gas production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Semiconductor Cleaning and Etching Gas and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Semiconductor Cleaning and Etching Gas that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Semiconductor Cleaning and Etching Gas total production and demand, 2021-2032, (Tons)
Global Semiconductor Cleaning and Etching Gas total production value, 2021-2032, (USD Million)
Global Semiconductor Cleaning and Etching Gas production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Tons), (based on production site)
Global Semiconductor Cleaning and Etching Gas consumption by region & country, CAGR, 2021-2032 & (Tons)
U.S. VS China: Semiconductor Cleaning and Etching Gas domestic production, consumption, key domestic manufacturers and share
Global Semiconductor Cleaning and Etching Gas production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Tons)
Global Semiconductor Cleaning and Etching Gas production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Tons)
Global Semiconductor Cleaning and Etching Gas production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Tons)
This report profiles key players in the global Semiconductor Cleaning and Etching Gas market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, Taiyo Nippon Sanso, Merck KGaA, Mitsui Chemical, Central Glass, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Semiconductor Cleaning and Etching Gas market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Tons) and average price (US$/Ton) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Semiconductor Cleaning and Etching Gas Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Semiconductor Cleaning and Etching Gas Market, Segmentation by Type:
Fluoride Gas
Chloride Gas
Others
Global Semiconductor Cleaning and Etching Gas Market, Segmentation by Application:
Semiconductor Cleaning
Semiconductor Etching
Companies Profiled:
SK Materials
Kanto Denka Kogyo
Resonac
Linde Group
Peric
Hyosung
Taiyo Nippon Sanso
Merck KGaA
Mitsui Chemical
Central Glass
Haohua Chemical Science & Technology
Shandong FeiYuan
Messer Group
Air Liquide
Huate Gas
Key Questions Answered:
1. How big is the global Semiconductor Cleaning and Etching Gas market?
2. What is the demand of the global Semiconductor Cleaning and Etching Gas market?
3. What is the year over year growth of the global Semiconductor Cleaning and Etching Gas market?
4. What is the production and production value of the global Semiconductor Cleaning and Etching Gas market?
5. Who are the key producers in the global Semiconductor Cleaning and Etching Gas market?
6. What are the growth factors driving the market demand?
Table of Contents
116 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Application
- 7 Company Profiles
- 8 Industry Chain Analysis
- 9 Research Findings and Conclusion
- 10 Appendix
Pricing
Currency Rates
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