Global Semiconductor Cleaning and Etching Gas Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031
Description
According to our (Global Info Research) latest study, the global Semiconductor Cleaning and Etching Gas market size was valued at US$ 1874 million in 2024 and is forecast to a readjusted size of USD 4445 million by 2031 with a CAGR of 7.4% during review period.
Semiconductor Cleaning Gas are gases utilized to remove various contaminants from the surface of semiconductor wafers. Contaminants can include organic substances, metal ions, particles, and residual substances from previous process steps. Cleaning gases work through physical or chemical actions to ensure the wafer surface is clean and suitable for subsequent manufacturing processes.
Common Types
Hydrogen Chloride (HCl): It is often used to remove metal impurities on the wafer surface. HCl can react with metal oxides to form soluble metal chlorides, which can then be easily washed away.
Ammonia (NH₃): Ammonia is commonly employed for cleaning organic contaminants. It can dissolve and remove organic substances through chemical reactions and hydrogen bonding interactions.
Oxygen (O₂): Oxygen is frequently used in plasma cleaning processes. In a plasma environment, oxygen can react with organic contaminants to form carbon dioxide and water, which are volatile and can be removed from the wafer surface.
Etching gases are gases that are used to selectively remove or etch specific materials from the semiconductor wafer surface to create precise patterns and structures. This is a crucial process in defining the various components and circuits on the semiconductor device.
Common Types
Chlorine-based Gases: Such as chlorine (Cl₂) and boron trichloride (BCl₃). They are often used for etching metals and silicon. For example, Cl₂ can react with silicon to form silicon tetrachloride (SiCl₄), which is a volatile compound and can be removed from the wafer surface, thereby achieving the etching of silicon.
Fluorine-based Gases: Such as fluorine (F₂), sulfur hexafluoride (SF₆), and nitrogen trifluoride (NF₃). Fluorine-based gases are widely used for etching silicon dioxide and silicon nitride. SF₆, for instance, can react with silicon dioxide in a plasma environment to form silicon tetrafluoride (SiF₄) and other volatile fluorides, enabling the precise removal of silicon dioxide layers.
Hydrogen Bromide (HBr): HBr is used for etching certain metal layers and silicon in some semiconductor processes. It can react with the target material to form volatile bromides, which are then removed from the surface.
The Semiconductor Industry Association (SIA) announced global semiconductor sales hit $627.6 billion in 2024, an increase of 19.1% compared to the 2023 total of $526.8 billion. Additionally, fourth-quarter sales of $170.9 billion were 17.1% more than the fourth quarter of 2023, and 3.0% higher than the third quarter of 2024. And global sales for the month of December 2024 were $57.0 billion, a decrease of 1.2% compared to the November 2024 total.
“The global semiconductor market experienced its highest-ever sales year in 2024, topping $600 billion in annual sales for the first time, and double-digit market growth is projected for 2025,” said John Neuffer, SIA president and CEO. “Semiconductors enable virtually all modern technologies – including medical devices, communications, defense applications, AI, advanced transportation, and countless others – and the long-term industry outlook is incredibly strong.”
Semiconductor cleaning and etching gases are special gases used in the semiconductor manufacturing process to clean semiconductor wafers and etch specific materials on them.In terms of semiconductor cleaning and etching gas production, Japan and South Korea are currently the world's largest high-end semiconductor cleaning and etching gas production regions, and export to many countries around the world. At the same time, with the development of industry, customers have put forward more quality requirements and higher technical indicators for Semiconductor Cleaning and Etching Gass as their key raw materials. Semiconductor Cleaning and Etching Gas companies should actively improve product quality to make their products attractive in the market.
The main semiconductor cleaning and etching gas manufacturers in the market include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, etc. Japanese and Korean companies have a large share in the high-end market, among which the top five companies in 2023 accounted for 49.44% of the revenue market share. With the rapid rise of China's semiconductor industry and the government's strong support for the semiconductor industry, Chinese companies will continue to increase their R&D investment, enhance their independent R&D capabilities, and develop a series of high-purity, high-performance cleaning and etching gases.
This report is a detailed and comprehensive analysis for global Semiconductor Cleaning and Etching Gas market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Semiconductor Cleaning and Etching Gas market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/Ton), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Semiconductor Cleaning and Etching Gas
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Semiconductor Cleaning and Etching Gas market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, Taiyo Nippon Sanso, Merck KGaA, Mitsui Chemical, Central Glass, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Semiconductor Cleaning and Etching Gas market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Fluoride Gas
Chloride Gas
Others
Market segment by Application
Semiconductor Cleaning
Semiconductor Etching
Major players covered
SK Materials
Kanto Denka Kogyo
Resonac
Linde Group
Peric
Hyosung
Taiyo Nippon Sanso
Merck KGaA
Mitsui Chemical
Central Glass
Haohua Chemical Science & Technology
Shandong FeiYuan
Messer Group
Air Liquide
Huate Gas
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Semiconductor Cleaning and Etching Gas product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Semiconductor Cleaning and Etching Gas, with price, sales quantity, revenue, and global market share of Semiconductor Cleaning and Etching Gas from 2020 to 2025.
Chapter 3, the Semiconductor Cleaning and Etching Gas competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Semiconductor Cleaning and Etching Gas breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Semiconductor Cleaning and Etching Gas market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Semiconductor Cleaning and Etching Gas.
Chapter 14 and 15, to describe Semiconductor Cleaning and Etching Gas sales channel, distributors, customers, research findings and conclusion.
Semiconductor Cleaning Gas are gases utilized to remove various contaminants from the surface of semiconductor wafers. Contaminants can include organic substances, metal ions, particles, and residual substances from previous process steps. Cleaning gases work through physical or chemical actions to ensure the wafer surface is clean and suitable for subsequent manufacturing processes.
Common Types
Hydrogen Chloride (HCl): It is often used to remove metal impurities on the wafer surface. HCl can react with metal oxides to form soluble metal chlorides, which can then be easily washed away.
Ammonia (NH₃): Ammonia is commonly employed for cleaning organic contaminants. It can dissolve and remove organic substances through chemical reactions and hydrogen bonding interactions.
Oxygen (O₂): Oxygen is frequently used in plasma cleaning processes. In a plasma environment, oxygen can react with organic contaminants to form carbon dioxide and water, which are volatile and can be removed from the wafer surface.
Etching gases are gases that are used to selectively remove or etch specific materials from the semiconductor wafer surface to create precise patterns and structures. This is a crucial process in defining the various components and circuits on the semiconductor device.
Common Types
Chlorine-based Gases: Such as chlorine (Cl₂) and boron trichloride (BCl₃). They are often used for etching metals and silicon. For example, Cl₂ can react with silicon to form silicon tetrachloride (SiCl₄), which is a volatile compound and can be removed from the wafer surface, thereby achieving the etching of silicon.
Fluorine-based Gases: Such as fluorine (F₂), sulfur hexafluoride (SF₆), and nitrogen trifluoride (NF₃). Fluorine-based gases are widely used for etching silicon dioxide and silicon nitride. SF₆, for instance, can react with silicon dioxide in a plasma environment to form silicon tetrafluoride (SiF₄) and other volatile fluorides, enabling the precise removal of silicon dioxide layers.
Hydrogen Bromide (HBr): HBr is used for etching certain metal layers and silicon in some semiconductor processes. It can react with the target material to form volatile bromides, which are then removed from the surface.
The Semiconductor Industry Association (SIA) announced global semiconductor sales hit $627.6 billion in 2024, an increase of 19.1% compared to the 2023 total of $526.8 billion. Additionally, fourth-quarter sales of $170.9 billion were 17.1% more than the fourth quarter of 2023, and 3.0% higher than the third quarter of 2024. And global sales for the month of December 2024 were $57.0 billion, a decrease of 1.2% compared to the November 2024 total.
“The global semiconductor market experienced its highest-ever sales year in 2024, topping $600 billion in annual sales for the first time, and double-digit market growth is projected for 2025,” said John Neuffer, SIA president and CEO. “Semiconductors enable virtually all modern technologies – including medical devices, communications, defense applications, AI, advanced transportation, and countless others – and the long-term industry outlook is incredibly strong.”
Semiconductor cleaning and etching gases are special gases used in the semiconductor manufacturing process to clean semiconductor wafers and etch specific materials on them.In terms of semiconductor cleaning and etching gas production, Japan and South Korea are currently the world's largest high-end semiconductor cleaning and etching gas production regions, and export to many countries around the world. At the same time, with the development of industry, customers have put forward more quality requirements and higher technical indicators for Semiconductor Cleaning and Etching Gass as their key raw materials. Semiconductor Cleaning and Etching Gas companies should actively improve product quality to make their products attractive in the market.
The main semiconductor cleaning and etching gas manufacturers in the market include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, etc. Japanese and Korean companies have a large share in the high-end market, among which the top five companies in 2023 accounted for 49.44% of the revenue market share. With the rapid rise of China's semiconductor industry and the government's strong support for the semiconductor industry, Chinese companies will continue to increase their R&D investment, enhance their independent R&D capabilities, and develop a series of high-purity, high-performance cleaning and etching gases.
This report is a detailed and comprehensive analysis for global Semiconductor Cleaning and Etching Gas market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Semiconductor Cleaning and Etching Gas market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Ton), 2020-2031
Global Semiconductor Cleaning and Etching Gas market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/Ton), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Semiconductor Cleaning and Etching Gas
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Semiconductor Cleaning and Etching Gas market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include SK Materials, Kanto Denka Kogyo, Resonac, Linde Group, Peric, Hyosung, Taiyo Nippon Sanso, Merck KGaA, Mitsui Chemical, Central Glass, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Semiconductor Cleaning and Etching Gas market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Fluoride Gas
Chloride Gas
Others
Market segment by Application
Semiconductor Cleaning
Semiconductor Etching
Major players covered
SK Materials
Kanto Denka Kogyo
Resonac
Linde Group
Peric
Hyosung
Taiyo Nippon Sanso
Merck KGaA
Mitsui Chemical
Central Glass
Haohua Chemical Science & Technology
Shandong FeiYuan
Messer Group
Air Liquide
Huate Gas
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Semiconductor Cleaning and Etching Gas product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Semiconductor Cleaning and Etching Gas, with price, sales quantity, revenue, and global market share of Semiconductor Cleaning and Etching Gas from 2020 to 2025.
Chapter 3, the Semiconductor Cleaning and Etching Gas competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Semiconductor Cleaning and Etching Gas breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Semiconductor Cleaning and Etching Gas market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Semiconductor Cleaning and Etching Gas.
Chapter 14 and 15, to describe Semiconductor Cleaning and Etching Gas sales channel, distributors, customers, research findings and conclusion.
Table of Contents
122 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: Semiconductor Cleaning and Etching Gas by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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