Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Supply, Demand and Key Producers, 2026-2032
Description
The global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market size is expected to reach $ 5549 million by 2032, rising at a market growth of 5.1% CAGR during the forecast period (2026-2032).
PECVD is a deposition technology to deposit thin films using plasma technology. Compared to other deposition technologies such as PVD and Thermal CVD which are widely used for semiconductor device fabrication, PECVD can deposit thin films with high uniformity over the wafers at relatively low temperature (less than 350°C). Furthermore, this plasma deposition technology offers excellent material property control (refractive index, hardness and more) of thin films such as SiO2, SiNx, a-Si, SiON and DLC. In 2025, the global shipment volume of PECVD systems is expected to be approximately 13,000 units, with an average product price of approximately US$350,000 per unit.
The PECVD systems market is primarily driven by sustained demand for high-performance thin-film deposition capabilities within the electronics and photovoltaic sectors. In semiconductor manufacturing, as technology nodes shrink and packaging complexity increases, there is a growing reliance on low-temperature, high-uniformity film deposition processes for passivation, barrier, and dielectric layers, reinforcing the need for advanced plasma-enhanced deposition equipment. In the photovoltaic industry, production capacity for advanced cell technologies such as high-efficiency heterojunction (HJT) and passivated emitter rear contact (PERC) cells stimulates PECVD adoption due to their requirements for high-quality thin films. Growth in displays, sensors, and MEMS devices also expands the range of thin-film applications necessitating PECVD technology. Additionally, the global shift toward higher-value manufacturing and the push for automation and equipment reliability further encourage investment in high-throughput, stable PECVD systems, contributing to market growth.
The key players are Applied Materials, ASM International, Lam Research, Wonik IPS, Meyer Burger, Centrotherm, Tempress, Plasma-Therm, S.C New Energy Technology, Jusung Engineering, KLA-Tencor (Orbotech), ULVAC, Inc, Beijing NAURA, Shenyang Piotech, Oxford Instruments, SAMCO, CVD Equipment Corporation, Trion Technology, SENTECH Instruments, NANO-MASTER and so on. Some of the leading manufacturers such as Applied Materials, ASM International, Lam Research, Wonik IPS accounted for a market share of about 75% in 2025 due to high demand from end users and advancements in R&D. Asia Pacific dominated the industry. Based on type, the market has been further segregated into Parallel Plate Type PECVD Systems and Tube Type PECVD Systems. The Tube Type Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems segment accounted for the largest market share in 2025. The Semiconductor Industry and Solar Industry segment dominated the market in 2025.
This report studies the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems total production and demand, 2021-2032, (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems total production value, 2021-2032, (USD Million)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems domestic production, consumption, key domestic manufacturers and share
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Applied Materials, ASM International, Lam Research, Wonik IPS, Meyer Burger, Centrotherm, Tempress, Plasma-Therm, S.C New Energy Technology, Jusung Engineering, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (K US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Type:
Parallel Plate Type PECVD Systems
Tube Type PECVD Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Chamber Configuration:
Single-Chamber Systems
Multi-Chamber Cluster Systems
In-Line Systems
Roll-to-Roll Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Film Type:
Dielectric Film Deposition Systems
Passivation Film Deposition Systems
Barrier Film Deposition Systems
Functional and Optical Film Deposition Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Application:
Semiconductor Industry
Solar Industry
Other
Companies Profiled:
Applied Materials
ASM International
Lam Research
Wonik IPS
Meyer Burger
Centrotherm
Tempress
Plasma-Therm
S.C New Energy Technology
Jusung Engineering
KLA-Tencor (Orbotech)
ULVAC, Inc
Beijing NAURA
Shenyang Piotech
Oxford Instruments
SAMCO
CVD Equipment Corporation
Trion Technology
SENTECH Instruments
NANO-MASTER
Key Questions Answered:
1. How big is the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
2. What is the demand of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
3. What is the year over year growth of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
4. What is the production and production value of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
5. Who are the key producers in the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
6. What are the growth factors driving the market demand?
PECVD is a deposition technology to deposit thin films using plasma technology. Compared to other deposition technologies such as PVD and Thermal CVD which are widely used for semiconductor device fabrication, PECVD can deposit thin films with high uniformity over the wafers at relatively low temperature (less than 350°C). Furthermore, this plasma deposition technology offers excellent material property control (refractive index, hardness and more) of thin films such as SiO2, SiNx, a-Si, SiON and DLC. In 2025, the global shipment volume of PECVD systems is expected to be approximately 13,000 units, with an average product price of approximately US$350,000 per unit.
The PECVD systems market is primarily driven by sustained demand for high-performance thin-film deposition capabilities within the electronics and photovoltaic sectors. In semiconductor manufacturing, as technology nodes shrink and packaging complexity increases, there is a growing reliance on low-temperature, high-uniformity film deposition processes for passivation, barrier, and dielectric layers, reinforcing the need for advanced plasma-enhanced deposition equipment. In the photovoltaic industry, production capacity for advanced cell technologies such as high-efficiency heterojunction (HJT) and passivated emitter rear contact (PERC) cells stimulates PECVD adoption due to their requirements for high-quality thin films. Growth in displays, sensors, and MEMS devices also expands the range of thin-film applications necessitating PECVD technology. Additionally, the global shift toward higher-value manufacturing and the push for automation and equipment reliability further encourage investment in high-throughput, stable PECVD systems, contributing to market growth.
The key players are Applied Materials, ASM International, Lam Research, Wonik IPS, Meyer Burger, Centrotherm, Tempress, Plasma-Therm, S.C New Energy Technology, Jusung Engineering, KLA-Tencor (Orbotech), ULVAC, Inc, Beijing NAURA, Shenyang Piotech, Oxford Instruments, SAMCO, CVD Equipment Corporation, Trion Technology, SENTECH Instruments, NANO-MASTER and so on. Some of the leading manufacturers such as Applied Materials, ASM International, Lam Research, Wonik IPS accounted for a market share of about 75% in 2025 due to high demand from end users and advancements in R&D. Asia Pacific dominated the industry. Based on type, the market has been further segregated into Parallel Plate Type PECVD Systems and Tube Type PECVD Systems. The Tube Type Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems segment accounted for the largest market share in 2025. The Semiconductor Industry and Solar Industry segment dominated the market in 2025.
This report studies the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems total production and demand, 2021-2032, (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems total production value, 2021-2032, (USD Million)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems domestic production, consumption, key domestic manufacturers and share
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Applied Materials, ASM International, Lam Research, Wonik IPS, Meyer Burger, Centrotherm, Tempress, Plasma-Therm, S.C New Energy Technology, Jusung Engineering, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (K US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Type:
Parallel Plate Type PECVD Systems
Tube Type PECVD Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Chamber Configuration:
Single-Chamber Systems
Multi-Chamber Cluster Systems
In-Line Systems
Roll-to-Roll Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Film Type:
Dielectric Film Deposition Systems
Passivation Film Deposition Systems
Barrier Film Deposition Systems
Functional and Optical Film Deposition Systems
Global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems Market, Segmentation by Application:
Semiconductor Industry
Solar Industry
Other
Companies Profiled:
Applied Materials
ASM International
Lam Research
Wonik IPS
Meyer Burger
Centrotherm
Tempress
Plasma-Therm
S.C New Energy Technology
Jusung Engineering
KLA-Tencor (Orbotech)
ULVAC, Inc
Beijing NAURA
Shenyang Piotech
Oxford Instruments
SAMCO
CVD Equipment Corporation
Trion Technology
SENTECH Instruments
NANO-MASTER
Key Questions Answered:
1. How big is the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
2. What is the demand of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
3. What is the year over year growth of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
4. What is the production and production value of the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
5. Who are the key producers in the global Plasma Enhanced Chemical Vapor Deposition (PECVD) Systems market?
6. What are the growth factors driving the market demand?
Table of Contents
155 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Chamber Configuration
- 7 Market Analysis by Film Type
- 8 Market Analysis by Application
- 9 Company Profiles
- 10 Industry Chain Analysis
- 11 Research Findings and Conclusion
- 12 Appendix
Pricing
Currency Rates
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