Global Photomask Pellicle Supply, Demand and Key Producers, 2026-2032
Description
The global Photomask Pellicle market size is expected to reach $ 1627 million by 2032, rising at a market growth of 7.6% CAGR during the forecast period (2026-2032).
The pellicle is a part of the photomask. As a covering, the pellicle is suspended above the photomask to form a physical barrier. Even if particles fall on it, they will not touch the mask itself. The pellicle can effectively prevent mask contamination and plays a vital role in improving production efficiency and chip quality.
A pellicle is a thin membrane stretched over an aluminum frame and glued to the photomask to protect it from contaminants, such as particles. Even if particles sit on the membrane, they are not printed on the wafer/ flat panel displays because they are out of focus during the exposure from the lithography process.
The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.
Global key Photomask Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.
From the perspective of downstream fields, the semiconductor field occupies a dominant position, accounting for about 74.17% in 2023. In semiconductor manufacturing, the role of this Pellicle is far more than simple physical protection. It can also effectively reduce the diffraction effect in the lithography process and improve the imaging quality. Especially in extreme ultraviolet lithography (EUVL) technology, due to the extremely short wavelength of the light source (about 13.5nm), the traditional penetrating mask can no longer be used. At this time, the reflective mask and its Pellicle have become the key technology.
It is worth noting that with the continuous advancement of chip manufacturing technology, the requirements for the mask Pellicle are getting higher and higher. For example, in advanced processes of 7nm and below, the size of the pattern on the mask may be only tens of nanometers, which puts extremely stringent requirements on the uniformity and defect control of the Pellicle.
Globally, Asia (especially China, Taiwan, and South Korea) dominates the mask protective film market. China is playing an increasingly important role in the world. As China develops in the field of semiconductor manufacturing, the demand for mask protective films in the region is also increasing.
This report studies the global Photomask Pellicle production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Photomask Pellicle and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Photomask Pellicle that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Photomask Pellicle total production and demand, 2021-2032, (K Sqm)
Global Photomask Pellicle total production value, 2021-2032, (USD Million)
Global Photomask Pellicle production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm), (based on production site)
Global Photomask Pellicle consumption by region & country, CAGR, 2021-2032 & (K Sqm)
U.S. VS China: Photomask Pellicle domestic production, consumption, key domestic manufacturers and share
Global Photomask Pellicle production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (K Sqm)
Global Photomask Pellicle production by Type, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm)
Global Photomask Pellicle production by Application, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm)
This report profiles key players in the global Photomask Pellicle market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography Inc (MLI), S&S Tech, 印科微(INKO), NEPCO, Canatu, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Photomask Pellicle market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (K Sqm) and average price (US$/Sqm) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Photomask Pellicle Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Photomask Pellicle Market, Segmentation by Type:
Hard Photomask Pellicle
Soft Photomask Pellicle
Global Photomask Pellicle Market, Segmentation by Application:
Semiconductors
Flat Panel Display
Others
Companies Profiled:
Mitsui Chemicals
Shin-Etsu
FINE SEMITECH
Micro Lithography Inc (MLI)
S&S Tech
印科微(INKO)
NEPCO
Canatu
Key Questions Answered:
1. How big is the global Photomask Pellicle market?
2. What is the demand of the global Photomask Pellicle market?
3. What is the year over year growth of the global Photomask Pellicle market?
4. What is the production and production value of the global Photomask Pellicle market?
5. Who are the key producers in the global Photomask Pellicle market?
6. What are the growth factors driving the market demand?
The pellicle is a part of the photomask. As a covering, the pellicle is suspended above the photomask to form a physical barrier. Even if particles fall on it, they will not touch the mask itself. The pellicle can effectively prevent mask contamination and plays a vital role in improving production efficiency and chip quality.
A pellicle is a thin membrane stretched over an aluminum frame and glued to the photomask to protect it from contaminants, such as particles. Even if particles sit on the membrane, they are not printed on the wafer/ flat panel displays because they are out of focus during the exposure from the lithography process.
The process of preparing this Pellicle is also full of scientific and technological content. Usually, precise vacuum coating technology such as physical vapor deposition (PVD) or chemical vapor deposition (CVD) is used to form a uniform and dense film on the surface of the mask. This process requires precise control of parameters such as temperature, pressure and gas flow to ensure the quality and performance of the film.
Global key Photomask Pellicle players cover Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography, Inc., S&S Tech and INKO, etc. In terms of revenue, the global 3 largest companies occupied for a share nearly 85.67% in 2023.
From the perspective of downstream fields, the semiconductor field occupies a dominant position, accounting for about 74.17% in 2023. In semiconductor manufacturing, the role of this Pellicle is far more than simple physical protection. It can also effectively reduce the diffraction effect in the lithography process and improve the imaging quality. Especially in extreme ultraviolet lithography (EUVL) technology, due to the extremely short wavelength of the light source (about 13.5nm), the traditional penetrating mask can no longer be used. At this time, the reflective mask and its Pellicle have become the key technology.
It is worth noting that with the continuous advancement of chip manufacturing technology, the requirements for the mask Pellicle are getting higher and higher. For example, in advanced processes of 7nm and below, the size of the pattern on the mask may be only tens of nanometers, which puts extremely stringent requirements on the uniformity and defect control of the Pellicle.
Globally, Asia (especially China, Taiwan, and South Korea) dominates the mask protective film market. China is playing an increasingly important role in the world. As China develops in the field of semiconductor manufacturing, the demand for mask protective films in the region is also increasing.
This report studies the global Photomask Pellicle production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for Photomask Pellicle and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of Photomask Pellicle that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global Photomask Pellicle total production and demand, 2021-2032, (K Sqm)
Global Photomask Pellicle total production value, 2021-2032, (USD Million)
Global Photomask Pellicle production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm), (based on production site)
Global Photomask Pellicle consumption by region & country, CAGR, 2021-2032 & (K Sqm)
U.S. VS China: Photomask Pellicle domestic production, consumption, key domestic manufacturers and share
Global Photomask Pellicle production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (K Sqm)
Global Photomask Pellicle production by Type, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm)
Global Photomask Pellicle production by Application, production, value, CAGR, 2021-2032, (USD Million) & (K Sqm)
This report profiles key players in the global Photomask Pellicle market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Mitsui Chemicals, Shin-Etsu, FINE SEMITECH, Micro Lithography Inc (MLI), S&S Tech, 印科微(INKO), NEPCO, Canatu, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World Photomask Pellicle market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (K Sqm) and average price (US$/Sqm) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global Photomask Pellicle Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global Photomask Pellicle Market, Segmentation by Type:
Hard Photomask Pellicle
Soft Photomask Pellicle
Global Photomask Pellicle Market, Segmentation by Application:
Semiconductors
Flat Panel Display
Others
Companies Profiled:
Mitsui Chemicals
Shin-Etsu
FINE SEMITECH
Micro Lithography Inc (MLI)
S&S Tech
印科微(INKO)
NEPCO
Canatu
Key Questions Answered:
1. How big is the global Photomask Pellicle market?
2. What is the demand of the global Photomask Pellicle market?
3. What is the year over year growth of the global Photomask Pellicle market?
4. What is the production and production value of the global Photomask Pellicle market?
5. Who are the key producers in the global Photomask Pellicle market?
6. What are the growth factors driving the market demand?
Table of Contents
98 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Application
- 7 Company Profiles
- 8 Industry Chain Analysis
- 9 Research Findings and Conclusion
- 10 Appendix
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