Global Photoinitiator for Photoresist Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031
Description
According to our (Global Info Research) latest study, the global Photoinitiator for Photoresist market size was valued at US$ 147 million in 2024 and is forecast to a readjusted size of USD 216 million by 2031 with a CAGR of 5.7% during review period.
Photoresist (PR) is a chemical that changes properties when exposed to certain wavelengths of light to form desired patterns of coating on substrate surfaces. PR serves as key material for the photolithography of semiconductor circuits in the manufacturing process.
This report studies the Photoinitiator for Photoresist, include Photo Acid Generator (PAG) and Photo Acid Compound (PAC).
The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM). According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global semiconductor Photoresists. The global Photoresist Raw Materials market is dominated by few companies from Japan, USA, Europe and South Korea.
This report is a detailed and comprehensive analysis for global Photoinitiator for Photoresist market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Photoinitiator for Photoresist market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/Kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Photoinitiator for Photoresist
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Photoinitiator for Photoresist market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Midori Kagaku, FUJIFILM Wako Pure Chemical Corporation, Toyo Gosei Co., Ltd, Adeka, IGM Resins B.V., Heraeus Epurio, Miwon Commercial Co., Ltd., Daito Chemix Corporation, CGP Materials, ENF Technology, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Photoinitiator for Photoresist market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Photo Acid Generator (PAG)
Photo Acid Compound (PAC)
Market segment by Application
EUV Photoresist
ArF Photoresist
KrF Photoresist
g/i-Line Photoresist
Major players covered
Midori Kagaku
FUJIFILM Wako Pure Chemical Corporation
Toyo Gosei Co., Ltd
Adeka
IGM Resins B.V.
Heraeus Epurio
Miwon Commercial Co., Ltd.
Daito Chemix Corporation
CGP Materials
ENF Technology
NC Chem
TAKOMA TECHNOLOGY CORPORATION
Xuzhou B & C Chemical
Changzhou Tronly New Electronic Materials
Tianjin Jiuri New Material
Suzhou Weimas
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Photoinitiator for Photoresist product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Photoinitiator for Photoresist, with price, sales quantity, revenue, and global market share of Photoinitiator for Photoresist from 2020 to 2025.
Chapter 3, the Photoinitiator for Photoresist competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Photoinitiator for Photoresist breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Photoinitiator for Photoresist market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Photoinitiator for Photoresist.
Chapter 14 and 15, to describe Photoinitiator for Photoresist sales channel, distributors, customers, research findings and conclusion.
Photoresist (PR) is a chemical that changes properties when exposed to certain wavelengths of light to form desired patterns of coating on substrate surfaces. PR serves as key material for the photolithography of semiconductor circuits in the manufacturing process.
This report studies the Photoinitiator for Photoresist, include Photo Acid Generator (PAG) and Photo Acid Compound (PAC).
The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM). According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global semiconductor Photoresists. The global Photoresist Raw Materials market is dominated by few companies from Japan, USA, Europe and South Korea.
This report is a detailed and comprehensive analysis for global Photoinitiator for Photoresist market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Photoinitiator for Photoresist market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/Kg), 2020-2031
Global Photoinitiator for Photoresist market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/Kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Photoinitiator for Photoresist
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Photoinitiator for Photoresist market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Midori Kagaku, FUJIFILM Wako Pure Chemical Corporation, Toyo Gosei Co., Ltd, Adeka, IGM Resins B.V., Heraeus Epurio, Miwon Commercial Co., Ltd., Daito Chemix Corporation, CGP Materials, ENF Technology, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Photoinitiator for Photoresist market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Photo Acid Generator (PAG)
Photo Acid Compound (PAC)
Market segment by Application
EUV Photoresist
ArF Photoresist
KrF Photoresist
g/i-Line Photoresist
Major players covered
Midori Kagaku
FUJIFILM Wako Pure Chemical Corporation
Toyo Gosei Co., Ltd
Adeka
IGM Resins B.V.
Heraeus Epurio
Miwon Commercial Co., Ltd.
Daito Chemix Corporation
CGP Materials
ENF Technology
NC Chem
TAKOMA TECHNOLOGY CORPORATION
Xuzhou B & C Chemical
Changzhou Tronly New Electronic Materials
Tianjin Jiuri New Material
Suzhou Weimas
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Photoinitiator for Photoresist product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Photoinitiator for Photoresist, with price, sales quantity, revenue, and global market share of Photoinitiator for Photoresist from 2020 to 2025.
Chapter 3, the Photoinitiator for Photoresist competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Photoinitiator for Photoresist breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Photoinitiator for Photoresist market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Photoinitiator for Photoresist.
Chapter 14 and 15, to describe Photoinitiator for Photoresist sales channel, distributors, customers, research findings and conclusion.
Table of Contents
140 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: Photoinitiator for Photoresist by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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