Global Mask Blanks Market 2026 by Manufacturers, Regions, Type and Application, Forecast to 2032
Description
According to our (Global Info Research) latest study, the global Mask Blanks market size was valued at US$ 3446 million in 2025 and is forecast to a readjusted size of US$ 5144 million by 2032 with a CAGR of 6.0% during review period.
Mask Blanks are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.
Global key players of Mask Blanks include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech and ULCOAT. The top five players hold a share over 90%. In terms of product, low reflectance chrome-film mask blanks are the largest segment, with a share about 66%. And in terms of application, the largest application is Semiconductor, with a share about 55%.
The main market drivers include the following:
1. Growing demand in the semiconductor industry
Expanding downstream applications
5G and AI-driven: Surges in demand for high-performance semiconductors in areas such as 5G base stations, AI chips, and automotive electronics are driving production growth for chips with process technology of 28nm and above.
Advanced process upgrades: Processes below 28nm (such as 7nm and 5nm) require mask substrates with precision down to the nanometer level, with synthetic quartz substrates becoming the preferred choice due to their high transmittance and low thermal expansion coefficient.
Accelerated domestic substitution: Domestic companies (such as Philihua and Luwei Optoelectronics) have broken through technological barriers, increasing the domestic production rate from less than 10% in 2018 to 30% in 2025, and projected to exceed 50% in 2027.
Independent third-party mask manufacturers are expanding their market share, and wafer fabs are increasing the proportion of outsourced manufacturing for mature processes (above 28nm) to 47.3%. 2. Display Panel Industry Upgrade
2.Large-Screen Trend
High-Generation Line Construction: The increase in panel production lines for Generation 8.6 and above (such as Generation 10.5) is driving demand for large photomask blanks, with substrate sizes expanding from 1m×1m in Generation 5 to 3m×3m in Generation 11.
Technological Iteration: New display technologies such as AMOLED/LTPO/LTPS require submicron precision for mask substrates, driving demand for high-end substrates.
3. Technological Advancement and Material Innovation
Advantages of Synthetic Quartz Substrates
Excellent Performance: High purity (impurity content <10ppb), low thermal expansion coefficient (<0.1ppm/°C), and transmittance (>90% at 200nm wavelength), making them suitable for DUV/EUV lithography.
Process Breakthrough: Domestic companies have reduced defect density from 15 defects per square inch to 5 defects per square inch, meeting the entry standard for Generation 5 lines. Coating Process Improvements
Molybdenum-silicon binary light shielding layer (OMOG): Shin-Etsu Chemical has developed an alternative to the traditional chromium layer, improving stability and etching performance, driving demand for high-end substrates.
EUV Technology Adaptation: Reflective mask substrates (such as those patented by Ken Kinoshita) are adapted for extreme ultraviolet lithography, becoming a key material for processes below 7nm.
4. Policy Support and Industry Chain Collaboration
National Policy Promotion
Localization Target: "Made in China 2025" and other policies clearly define increasing the localization rate of semiconductor materials, with a target of 50% by 2025.
Financial Support: Jiaxing Lien Semiconductor invested 3 billion yuan in the project, establishing a complete supply chain for photomask materials.
Industry Chain Integration
Vertical Integration: Luwei Optoelectronics has established full-generation mask production capacity from G2.5 to G11, and Philihua has achieved vertical integration from quartz sand to substrates.
Equipment Localization: Xinji Micro-Equipment has delivered 90nm node direct-write lithography equipment, reducing dependence on imported equipment.
5. Changing Market Competition Landscape
Breaking International Monopoly
Dominated by Japanese and Korean Companies: Shin-Etsu Chemical and Tosoh Quartz Crystal hold a 50% share of the high-end market, but domestic companies are gradually penetrating through technical certifications (e.g., Philihua's Tokyo Electron certification).
6. Cost and Supply Chain Factors
Raw Material Cost Optimization
Scale-up of Synthetic Quartz: Philihua's G8.5-generation substrate mass production has reduced unit costs, driving down prices for high-end substrates.
Equipment Localization: Domestic photolithography equipment (e.g., Core Micro's 90nm equipment) offers significant price advantages, improving mask blank production efficiency.
The core drivers of the Mask Blanks market include: escalating demand from the semiconductor and display panel industries, technological breakthroughs in high-end materials like synthetic quartz, localization policies and industry chain integration, and technological adaptation to emerging applications such as 5G/AI. In the future, with the widespread adoption of EUV technology and the improvement of domestic companies' technological capabilities, the market will exhibit a parallel trend of high-end production, localization, and scale.
This report is a detailed and comprehensive analysis for global Mask Blanks market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Mask Blanks market size and forecasts, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market size and forecasts by region and country, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market shares of main players, shipments in revenue ($ Million), sales quantity (K Sqm), and ASP (US$/Sq m), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Mask Blanks
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Mask Blanks market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech, ULCOAT, Telic, SKC, CST Co., Ltd., etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Mask Blanks market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Low Reflectance Chrome-film Mask Blanks
Attenuated Phase Shift Mask Blanks
Market segment by Application
Semiconductor
Flat Panel Display
Touch Industry
Circuit Board
Major players covered
Shin-Etsu MicroSi, Inc.
HOYA
AGC
S&S Tech
ULCOAT
Telic
SKC
CST Co., Ltd.
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Mask Blanks product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Mask Blanks, with price, sales quantity, revenue, and global market share of Mask Blanks from 2021 to 2026.
Chapter 3, the Mask Blanks competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Mask Blanks breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and Mask Blanks market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Mask Blanks.
Chapter 14 and 15, to describe Mask Blanks sales channel, distributors, customers, research findings and conclusion.
Mask Blanks are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate. And they are coated by photosensitive resist materials which sensitive for electron or laser beam and resist for etching process to make circuit patterns.
Global key players of Mask Blanks include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech and ULCOAT. The top five players hold a share over 90%. In terms of product, low reflectance chrome-film mask blanks are the largest segment, with a share about 66%. And in terms of application, the largest application is Semiconductor, with a share about 55%.
The main market drivers include the following:
1. Growing demand in the semiconductor industry
Expanding downstream applications
5G and AI-driven: Surges in demand for high-performance semiconductors in areas such as 5G base stations, AI chips, and automotive electronics are driving production growth for chips with process technology of 28nm and above.
Advanced process upgrades: Processes below 28nm (such as 7nm and 5nm) require mask substrates with precision down to the nanometer level, with synthetic quartz substrates becoming the preferred choice due to their high transmittance and low thermal expansion coefficient.
Accelerated domestic substitution: Domestic companies (such as Philihua and Luwei Optoelectronics) have broken through technological barriers, increasing the domestic production rate from less than 10% in 2018 to 30% in 2025, and projected to exceed 50% in 2027.
Independent third-party mask manufacturers are expanding their market share, and wafer fabs are increasing the proportion of outsourced manufacturing for mature processes (above 28nm) to 47.3%. 2. Display Panel Industry Upgrade
2.Large-Screen Trend
High-Generation Line Construction: The increase in panel production lines for Generation 8.6 and above (such as Generation 10.5) is driving demand for large photomask blanks, with substrate sizes expanding from 1m×1m in Generation 5 to 3m×3m in Generation 11.
Technological Iteration: New display technologies such as AMOLED/LTPO/LTPS require submicron precision for mask substrates, driving demand for high-end substrates.
3. Technological Advancement and Material Innovation
Advantages of Synthetic Quartz Substrates
Excellent Performance: High purity (impurity content <10ppb), low thermal expansion coefficient (<0.1ppm/°C), and transmittance (>90% at 200nm wavelength), making them suitable for DUV/EUV lithography.
Process Breakthrough: Domestic companies have reduced defect density from 15 defects per square inch to 5 defects per square inch, meeting the entry standard for Generation 5 lines. Coating Process Improvements
Molybdenum-silicon binary light shielding layer (OMOG): Shin-Etsu Chemical has developed an alternative to the traditional chromium layer, improving stability and etching performance, driving demand for high-end substrates.
EUV Technology Adaptation: Reflective mask substrates (such as those patented by Ken Kinoshita) are adapted for extreme ultraviolet lithography, becoming a key material for processes below 7nm.
4. Policy Support and Industry Chain Collaboration
National Policy Promotion
Localization Target: "Made in China 2025" and other policies clearly define increasing the localization rate of semiconductor materials, with a target of 50% by 2025.
Financial Support: Jiaxing Lien Semiconductor invested 3 billion yuan in the project, establishing a complete supply chain for photomask materials.
Industry Chain Integration
Vertical Integration: Luwei Optoelectronics has established full-generation mask production capacity from G2.5 to G11, and Philihua has achieved vertical integration from quartz sand to substrates.
Equipment Localization: Xinji Micro-Equipment has delivered 90nm node direct-write lithography equipment, reducing dependence on imported equipment.
5. Changing Market Competition Landscape
Breaking International Monopoly
Dominated by Japanese and Korean Companies: Shin-Etsu Chemical and Tosoh Quartz Crystal hold a 50% share of the high-end market, but domestic companies are gradually penetrating through technical certifications (e.g., Philihua's Tokyo Electron certification).
6. Cost and Supply Chain Factors
Raw Material Cost Optimization
Scale-up of Synthetic Quartz: Philihua's G8.5-generation substrate mass production has reduced unit costs, driving down prices for high-end substrates.
Equipment Localization: Domestic photolithography equipment (e.g., Core Micro's 90nm equipment) offers significant price advantages, improving mask blank production efficiency.
The core drivers of the Mask Blanks market include: escalating demand from the semiconductor and display panel industries, technological breakthroughs in high-end materials like synthetic quartz, localization policies and industry chain integration, and technological adaptation to emerging applications such as 5G/AI. In the future, with the widespread adoption of EUV technology and the improvement of domestic companies' technological capabilities, the market will exhibit a parallel trend of high-end production, localization, and scale.
This report is a detailed and comprehensive analysis for global Mask Blanks market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Mask Blanks market size and forecasts, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market size and forecasts by region and country, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (K Sqm), and average selling prices (US$/Sq m), 2021-2032
Global Mask Blanks market shares of main players, shipments in revenue ($ Million), sales quantity (K Sqm), and ASP (US$/Sq m), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Mask Blanks
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Mask Blanks market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Shin-Etsu MicroSi, Inc., HOYA, AGC, S&S Tech, ULCOAT, Telic, SKC, CST Co., Ltd., etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Mask Blanks market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Low Reflectance Chrome-film Mask Blanks
Attenuated Phase Shift Mask Blanks
Market segment by Application
Semiconductor
Flat Panel Display
Touch Industry
Circuit Board
Major players covered
Shin-Etsu MicroSi, Inc.
HOYA
AGC
S&S Tech
ULCOAT
Telic
SKC
CST Co., Ltd.
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Mask Blanks product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Mask Blanks, with price, sales quantity, revenue, and global market share of Mask Blanks from 2021 to 2026.
Chapter 3, the Mask Blanks competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Mask Blanks breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and Mask Blanks market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Mask Blanks.
Chapter 14 and 15, to describe Mask Blanks sales channel, distributors, customers, research findings and conclusion.
Table of Contents
96 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: Mask Blanks by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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