Global EUV Mask Defect Inspection Equipment Supply, Demand and Key Producers, 2026-2032
Description
The global EUV Mask Defect Inspection Equipment market size is expected to reach $ 4334 million by 2032, rising at a market growth of 12.2% CAGR during the forecast period (2026-2032).
Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.
EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.
At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.
In the semiconductor lithography process, corresponding light sources need to be used for different masks. Different mask applications vary greatly, and can be generally divided into binary masks, phase-shift masks and EUV masks. EUV Mask is a new type of mask designed specifically for EUV (extreme ultraviolet) lithography technology. Given the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). This type of mask is widely used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
At present, mask detection technology is mainly optical detection and SEM detection. Among them, the optical inspection companies are mainly Lasertec and KLA, while SEM inspection is Advantest. From the perspective of downstream applications, as long as the mask uses Pellicle, EUV Mask inspection equipment is required (in other words, as long as there is an EUV lithography machine, EUV inspection equipment must be used), but at present, not all EUV Masks of downstream terminal manufacturers will be used with Pellicle.
In DUV lithography or optical Mask technology, Pellicle plays a key role. The Mask inspection tool operates at an exposure wavelength of 193nm, and inspection is performed through this layer of film. For the wafer fab, this is a direct and efficient process. However, in extreme ultraviolet (EUV) lithography technology, the manufacturing process of the Mask needs to be carried out in a dedicated Mask workshop. At this point, the inspection of the Mask becomes more complicated because it requires a high-resolution system. In the wafer fab environment, the ideal situation is to use a layer of Pellicle to protect the Mask from particle contamination, while allowing the inspection system to work through this layer of Pellicle. If there are no defects, you can proceed; if defects are detected, you need to remove the pellicle and send the Mask to the Mask workshop for cleaning.
EUV Mask defect detection equipment is mainly used in Mask Shop and Fab. The Fab includes the mask production line and the wafer manufacturing production line. For the Fab, there are two main reasons for using EUV Mask defect detection equipment. First, once the pellicle is attached to the Mask, other types of equipment (such as electron beam or DUV equipment) except EUV detection equipment are difficult to achieve high-sensitivity detection effects. This is because the presence of pellicles interferes with the detection capabilities of these devices, making it difficult for them to accurately identify tiny defects. Secondly, EUV detection equipment has higher detection accuracy and can detect defects and particles that traditional DUV Mask detection methods cannot capture. Mask Shop has always had a relatively large share, reaching about 61% in 2023. However, with the acceleration of commercialization of smaller advanced process nodes, it is expected that the share of Fab will reach 42% by 2030.
At present, the EUV Mask defect detection equipment market is mainly monopolized by KLA and Lasertec. EUV Mask defect detection equipment is a high-precision and advanced equipment with a long delivery time. For example, Lasertec's delivery time is two years. In the next few years, the two leading companies will still maintain a monopoly in the EUV Mask defect detection market.
This report studies the global EUV Mask Defect Inspection Equipment production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for EUV Mask Defect Inspection Equipment and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of EUV Mask Defect Inspection Equipment that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global EUV Mask Defect Inspection Equipment total production and demand, 2021-2032, (Units)
Global EUV Mask Defect Inspection Equipment total production value, 2021-2032, (USD Million)
Global EUV Mask Defect Inspection Equipment production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global EUV Mask Defect Inspection Equipment consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: EUV Mask Defect Inspection Equipment domestic production, consumption, key domestic manufacturers and share
Global EUV Mask Defect Inspection Equipment production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global EUV Mask Defect Inspection Equipment production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global EUV Mask Defect Inspection Equipment production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global EUV Mask Defect Inspection Equipment market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Lasertec, KLA-Tencor, Advantest, Applied Materials, NuFlare, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World EUV Mask Defect Inspection Equipment market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (K US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global EUV Mask Defect Inspection Equipment Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global EUV Mask Defect Inspection Equipment Market, Segmentation by Type:
5-7nm Process
3nm and Below Process
Global EUV Mask Defect Inspection Equipment Market, Segmentation by Application:
Mask Shop
Fab
Companies Profiled:
Lasertec
KLA-Tencor
Advantest
Applied Materials
NuFlare
Key Questions Answered:
1. How big is the global EUV Mask Defect Inspection Equipment market?
2. What is the demand of the global EUV Mask Defect Inspection Equipment market?
3. What is the year over year growth of the global EUV Mask Defect Inspection Equipment market?
4. What is the production and production value of the global EUV Mask Defect Inspection Equipment market?
5. Who are the key producers in the global EUV Mask Defect Inspection Equipment market?
6. What are the growth factors driving the market demand?
Mask, also known as Photomask or Reticle, is a graphic master used in the lithography process commonly used in microelectronics processing technology. As a carrier of graphic information, Mask transfers the graphic to the base material through the exposure process, thereby realizing the transfer of the graphic.
Mask defect detection is a key link in the semiconductor lithography process, which aims to check the Mask and identify and repair the defects on it. As a critical component in the lithography process, Mask is responsible for accurately transferring the circuit pattern to the wafer, and its quality is directly related to the accuracy of the wafer pattern and the performance of the final device. There are various types of defects, including particle contamination, pattern breakage, bridging problems, and defects in the mask material itself.
EUV Mask defect detection equipment is a special equipment that plays an important role in the high-end semiconductor process technology. Given the high precision required by EUV lithography technology, even the smallest defect on the Mask may significantly affect the quality of the circuit pattern on the wafer, and thus adversely affect the performance and yield of the chip. Therefore, the use of special detection equipment to strictly inspect the EUV Mask is an indispensable key link to ensure the quality of semiconductor manufacturing.
At present, optical detection is the mainstream in semiconductor detection technology. The types of semiconductor optical detection include pattern, non-pattern and mask detection. Among them, pattern defect detection is divided into bright field and dark field detection. Both are analyzed through optical signals. The difference is that the bright field is a vertically reflected light signal, while the dark field is a scattered light signal.
In the semiconductor lithography process, corresponding light sources need to be used for different masks. Different mask applications vary greatly, and can be generally divided into binary masks, phase-shift masks and EUV masks. EUV Mask is a new type of mask designed specifically for EUV (extreme ultraviolet) lithography technology. Given the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). This type of mask is widely used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
At present, mask detection technology is mainly optical detection and SEM detection. Among them, the optical inspection companies are mainly Lasertec and KLA, while SEM inspection is Advantest. From the perspective of downstream applications, as long as the mask uses Pellicle, EUV Mask inspection equipment is required (in other words, as long as there is an EUV lithography machine, EUV inspection equipment must be used), but at present, not all EUV Masks of downstream terminal manufacturers will be used with Pellicle.
In DUV lithography or optical Mask technology, Pellicle plays a key role. The Mask inspection tool operates at an exposure wavelength of 193nm, and inspection is performed through this layer of film. For the wafer fab, this is a direct and efficient process. However, in extreme ultraviolet (EUV) lithography technology, the manufacturing process of the Mask needs to be carried out in a dedicated Mask workshop. At this point, the inspection of the Mask becomes more complicated because it requires a high-resolution system. In the wafer fab environment, the ideal situation is to use a layer of Pellicle to protect the Mask from particle contamination, while allowing the inspection system to work through this layer of Pellicle. If there are no defects, you can proceed; if defects are detected, you need to remove the pellicle and send the Mask to the Mask workshop for cleaning.
EUV Mask defect detection equipment is mainly used in Mask Shop and Fab. The Fab includes the mask production line and the wafer manufacturing production line. For the Fab, there are two main reasons for using EUV Mask defect detection equipment. First, once the pellicle is attached to the Mask, other types of equipment (such as electron beam or DUV equipment) except EUV detection equipment are difficult to achieve high-sensitivity detection effects. This is because the presence of pellicles interferes with the detection capabilities of these devices, making it difficult for them to accurately identify tiny defects. Secondly, EUV detection equipment has higher detection accuracy and can detect defects and particles that traditional DUV Mask detection methods cannot capture. Mask Shop has always had a relatively large share, reaching about 61% in 2023. However, with the acceleration of commercialization of smaller advanced process nodes, it is expected that the share of Fab will reach 42% by 2030.
At present, the EUV Mask defect detection equipment market is mainly monopolized by KLA and Lasertec. EUV Mask defect detection equipment is a high-precision and advanced equipment with a long delivery time. For example, Lasertec's delivery time is two years. In the next few years, the two leading companies will still maintain a monopoly in the EUV Mask defect detection market.
This report studies the global EUV Mask Defect Inspection Equipment production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for EUV Mask Defect Inspection Equipment and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of EUV Mask Defect Inspection Equipment that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global EUV Mask Defect Inspection Equipment total production and demand, 2021-2032, (Units)
Global EUV Mask Defect Inspection Equipment total production value, 2021-2032, (USD Million)
Global EUV Mask Defect Inspection Equipment production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Units), (based on production site)
Global EUV Mask Defect Inspection Equipment consumption by region & country, CAGR, 2021-2032 & (Units)
U.S. VS China: EUV Mask Defect Inspection Equipment domestic production, consumption, key domestic manufacturers and share
Global EUV Mask Defect Inspection Equipment production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Units)
Global EUV Mask Defect Inspection Equipment production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Units)
Global EUV Mask Defect Inspection Equipment production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Units)
This report profiles key players in the global EUV Mask Defect Inspection Equipment market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Lasertec, KLA-Tencor, Advantest, Applied Materials, NuFlare, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World EUV Mask Defect Inspection Equipment market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Units) and average price (K US$/Unit) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global EUV Mask Defect Inspection Equipment Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global EUV Mask Defect Inspection Equipment Market, Segmentation by Type:
5-7nm Process
3nm and Below Process
Global EUV Mask Defect Inspection Equipment Market, Segmentation by Application:
Mask Shop
Fab
Companies Profiled:
Lasertec
KLA-Tencor
Advantest
Applied Materials
NuFlare
Key Questions Answered:
1. How big is the global EUV Mask Defect Inspection Equipment market?
2. What is the demand of the global EUV Mask Defect Inspection Equipment market?
3. What is the year over year growth of the global EUV Mask Defect Inspection Equipment market?
4. What is the production and production value of the global EUV Mask Defect Inspection Equipment market?
5. Who are the key producers in the global EUV Mask Defect Inspection Equipment market?
6. What are the growth factors driving the market demand?
Table of Contents
91 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Application
- 7 Company Profiles
- 8 Industry Chain Analysis
- 9 Research Findings and Conclusion
- 10 Appendix
Pricing
Currency Rates
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