Global EUV Mask Blanks Supply, Demand and Key Producers, 2026-2032
Description
The global EUV Mask Blanks market size is expected to reach $ 1529 million by 2032, rising at a market growth of 11.9% CAGR during the forecast period (2026-2032).
EUV mask blanks are a low-thermal expansion glass substrate with various kinds of optical coating films on its surface. The EUV mask blank consists of 40 to 50 or more alternating layers of silicon and molybdenum on the substrate. Although only Hoya and AGC are currently on the market with commercial delivery capabilities, we also included research samples or low-volume products for use, based on the real situation of the technology in this market.
The global key manufacturers of EUV Mask Blanks include AGC Inc and Hoya, etc, top 2 manufacturers hold a share approximately 93%. AGC Inc is the world's largest EUV Mask Blanks manufacturer, with a market share of more than 59%.APAC is the largest market with a share of 73%. In terms of applications, Semiconductor is the largest downstream segment, with a market share of about 90%.
The EUV mask blank market is primarily driven by the following factors:
1. Technological upgrades and process node reductions in the semiconductor industry
1.1 EUV technology becomes the only solution for advanced processes
Technical necessity: As semiconductor manufacturing advances toward 7nm, 5nm, and higher-level processes, extreme ultraviolet (EUV) lithography becomes the only viable solution. As a key material for EUV lithography, demand for EUV mask blanks is directly driven by the expansion of advanced process capacity.
1.2 Process node reduction drives demand
Application expansion: EUV technology is not only used in logic chips (such as CPUs and GPUs), but also in memory chips such as DRAM, further driving demand for EUV mask blanks.
Manufacturer dynamics: TSMC, Samsung, Intel, and other manufacturers continue to expand EUV production capacity. For example, TSMC plans to increase the number of EUV production lines to over 50 by 2024.
2. Surging market demand and capacity expansion
2.1 Driven by end-market demand
Emerging technology drivers: 5G, AI, autonomous driving, the Internet of Things, and other emerging technologies are driving a surge in demand for high-performance chips, driving semiconductor manufacturers to adopt more advanced process technologies. Data Support: The global semiconductor market is expected to reach $626 billion in 2024, with EUV-related chips accounting for over 40%.
2.2 Manufacturer Capacity Expansion Plans
AGC Expansion Case: AGC plans to double its EUV photomask blank production capacity by 2024 to meet the production expansion needs of manufacturers such as TSMC and Samsung.
Samsung Supply Chain Diversification: To reduce its reliance on Japanese suppliers, Samsung is actively introducing Korean suppliers (such as S&S Tech) to diversify its supply chain.
3. Supply Chain Security and Regional Competition
3.1 Supplier Concentration and Geopolitical Impacts
Market Concentration: The global EUV mask blanks market is dominated by a few companies, such as AGC and Hoya, with the top two holding over 90% of the market share.
Geopolitical Risk: Japanese companies dominate the EUV mask blanks market, leading manufacturers in other countries to seek supply chain diversification to mitigate geopolitical risks. 3.2 Regional Market Competition
North America and Japan Dominate the Market: North America and Japan hold approximately 70% of the global EUV mask blank market, with Japanese companies (such as Hoya) leading the technology.
The Rise of the Chinese Market: China is gradually increasing its share of the EUV mask blank market through policy support and R&D by local companies. For example, institutions such as the Institute of Microelectronics of the Chinese Academy of Sciences have achieved breakthroughs in materials science.
4. Technological Barriers and R&D Investment
4.1 Materials Science and Process Challenges
Multi-layer Film Structure: EUV mask blanks require a multi-layer film structure (such as a Mo/Si reflective layer), a low thermal expansion substrate (LTEM), and a high-absorptivity material (such as TaN), posing a very high technical barrier.
Defect Control Requirements: EUV lithography has an extremely low tolerance for mask defects, requiring manufacturers to improve yield through precision manufacturing and inspection technologies (such as ABI systems). 4.2 R&D Investment and Technological Innovation
AGC Technological Breakthrough: By integrating glass materials, processing, and coating technologies, AGC has become the world's only EUV mask blank manufacturer capable of providing comprehensive EUV mask blanking solutions, from glass materials to coatings.
Industry Collaboration and Standardization: Organizations such as the Semiconductor Industry Association (SEMI) are promoting the development of EUV mask blank standards, facilitating technical specifications and market access.
5. Policy Support and Industry Ecosystem
5.1 Government Subsidies and Special Funds
China's Policy Support: China's 14th Five-Year Plan lists semiconductors as a key industry, supporting EUV-related material research and development through special funds, such as subsidies for companies like SMIC and Yangtze Memory Technologies.
US and EU Policies: Both the US CHIPS Act and the EU CHIPS Act prioritize EUV technology development, providing tax incentives and financial support.
5.2 Industry Ecosystem and Partnerships
Manufacturer-Equipment Vendor Collaboration: EUV mask blank manufacturers are working closely with lithography equipment manufacturers such as ASML to optimize material and equipment compatibility. Academic Involvement: Universities and research institutions (such as Stanford University and the University of Tokyo) are conducting cutting-edge research in EUV materials science, driving technological breakthroughs.
6. Cost and Yield Pressure
6.1 High Cost Challenge and Scale Effects
Price Difference: EUV mask blanks are significantly more expensive than traditional photomasks, and manufacturers need to reduce unit costs through scale effects.
Data Support: The unit price of EUV mask blanks is approximately 5-10 times that of traditional photomasks, but this can be reduced to less than 3 times through production expansion.
6.2 Need for Yield Improvement
Process Optimization: To address issues such as hydrogen-induced blistering defects and surface particle contamination, manufacturers must continuously invest in R&D to improve yield and lifetime.
Advances in Inspection Technology: Advanced inspection technologies such as ABI systems are used to monitor mask quality in real time to ensure yield meets standards.
The growth of the EUV mask blank market is primarily driven by factors such as semiconductor industry technology upgrades, advanced process capacity expansion, supply chain security needs, technological barriers and R&D investment, policy support, and cost pressures. In the future, with the further popularization of EUV technology and the continued reduction of process nodes, market demand will continue to grow. At the same time, technological competition and supply chain integration will become key. Manufacturers need to seize market opportunities and meet challenges through technological innovation, capacity expansion, and supply chain diversification.
This report studies the global EUV Mask Blanks production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for EUV Mask Blanks and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of EUV Mask Blanks that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global EUV Mask Blanks total production and demand, 2021-2032, (Sq m)
Global EUV Mask Blanks total production value, 2021-2032, (USD Million)
Global EUV Mask Blanks production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Sq m), (based on production site)
Global EUV Mask Blanks consumption by region & country, CAGR, 2021-2032 & (Sq m)
U.S. VS China: EUV Mask Blanks domestic production, consumption, key domestic manufacturers and share
Global EUV Mask Blanks production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Sq m)
Global EUV Mask Blanks production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Sq m)
Global EUV Mask Blanks production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Sq m)
This report profiles key players in the global EUV Mask Blanks market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Hoya, AGC Inc, S&S Tech, Applied Materials, Photronics Inc, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World EUV Mask Blanks market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Sq m) and average price (K US$/Sq m) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global EUV Mask Blanks Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global EUV Mask Blanks Market, Segmentation by Type:
Type 1
Type 2
Global EUV Mask Blanks Market, Segmentation by Application:
Semiconductor
IC (integrated circuit)
Others
Companies Profiled:
Hoya
AGC Inc
S&S Tech
Applied Materials
Photronics Inc
Key Questions Answered:
1. How big is the global EUV Mask Blanks market?
2. What is the demand of the global EUV Mask Blanks market?
3. What is the year over year growth of the global EUV Mask Blanks market?
4. What is the production and production value of the global EUV Mask Blanks market?
5. Who are the key producers in the global EUV Mask Blanks market?
6. What are the growth factors driving the market demand?
EUV mask blanks are a low-thermal expansion glass substrate with various kinds of optical coating films on its surface. The EUV mask blank consists of 40 to 50 or more alternating layers of silicon and molybdenum on the substrate. Although only Hoya and AGC are currently on the market with commercial delivery capabilities, we also included research samples or low-volume products for use, based on the real situation of the technology in this market.
The global key manufacturers of EUV Mask Blanks include AGC Inc and Hoya, etc, top 2 manufacturers hold a share approximately 93%. AGC Inc is the world's largest EUV Mask Blanks manufacturer, with a market share of more than 59%.APAC is the largest market with a share of 73%. In terms of applications, Semiconductor is the largest downstream segment, with a market share of about 90%.
The EUV mask blank market is primarily driven by the following factors:
1. Technological upgrades and process node reductions in the semiconductor industry
1.1 EUV technology becomes the only solution for advanced processes
Technical necessity: As semiconductor manufacturing advances toward 7nm, 5nm, and higher-level processes, extreme ultraviolet (EUV) lithography becomes the only viable solution. As a key material for EUV lithography, demand for EUV mask blanks is directly driven by the expansion of advanced process capacity.
1.2 Process node reduction drives demand
Application expansion: EUV technology is not only used in logic chips (such as CPUs and GPUs), but also in memory chips such as DRAM, further driving demand for EUV mask blanks.
Manufacturer dynamics: TSMC, Samsung, Intel, and other manufacturers continue to expand EUV production capacity. For example, TSMC plans to increase the number of EUV production lines to over 50 by 2024.
2. Surging market demand and capacity expansion
2.1 Driven by end-market demand
Emerging technology drivers: 5G, AI, autonomous driving, the Internet of Things, and other emerging technologies are driving a surge in demand for high-performance chips, driving semiconductor manufacturers to adopt more advanced process technologies. Data Support: The global semiconductor market is expected to reach $626 billion in 2024, with EUV-related chips accounting for over 40%.
2.2 Manufacturer Capacity Expansion Plans
AGC Expansion Case: AGC plans to double its EUV photomask blank production capacity by 2024 to meet the production expansion needs of manufacturers such as TSMC and Samsung.
Samsung Supply Chain Diversification: To reduce its reliance on Japanese suppliers, Samsung is actively introducing Korean suppliers (such as S&S Tech) to diversify its supply chain.
3. Supply Chain Security and Regional Competition
3.1 Supplier Concentration and Geopolitical Impacts
Market Concentration: The global EUV mask blanks market is dominated by a few companies, such as AGC and Hoya, with the top two holding over 90% of the market share.
Geopolitical Risk: Japanese companies dominate the EUV mask blanks market, leading manufacturers in other countries to seek supply chain diversification to mitigate geopolitical risks. 3.2 Regional Market Competition
North America and Japan Dominate the Market: North America and Japan hold approximately 70% of the global EUV mask blank market, with Japanese companies (such as Hoya) leading the technology.
The Rise of the Chinese Market: China is gradually increasing its share of the EUV mask blank market through policy support and R&D by local companies. For example, institutions such as the Institute of Microelectronics of the Chinese Academy of Sciences have achieved breakthroughs in materials science.
4. Technological Barriers and R&D Investment
4.1 Materials Science and Process Challenges
Multi-layer Film Structure: EUV mask blanks require a multi-layer film structure (such as a Mo/Si reflective layer), a low thermal expansion substrate (LTEM), and a high-absorptivity material (such as TaN), posing a very high technical barrier.
Defect Control Requirements: EUV lithography has an extremely low tolerance for mask defects, requiring manufacturers to improve yield through precision manufacturing and inspection technologies (such as ABI systems). 4.2 R&D Investment and Technological Innovation
AGC Technological Breakthrough: By integrating glass materials, processing, and coating technologies, AGC has become the world's only EUV mask blank manufacturer capable of providing comprehensive EUV mask blanking solutions, from glass materials to coatings.
Industry Collaboration and Standardization: Organizations such as the Semiconductor Industry Association (SEMI) are promoting the development of EUV mask blank standards, facilitating technical specifications and market access.
5. Policy Support and Industry Ecosystem
5.1 Government Subsidies and Special Funds
China's Policy Support: China's 14th Five-Year Plan lists semiconductors as a key industry, supporting EUV-related material research and development through special funds, such as subsidies for companies like SMIC and Yangtze Memory Technologies.
US and EU Policies: Both the US CHIPS Act and the EU CHIPS Act prioritize EUV technology development, providing tax incentives and financial support.
5.2 Industry Ecosystem and Partnerships
Manufacturer-Equipment Vendor Collaboration: EUV mask blank manufacturers are working closely with lithography equipment manufacturers such as ASML to optimize material and equipment compatibility. Academic Involvement: Universities and research institutions (such as Stanford University and the University of Tokyo) are conducting cutting-edge research in EUV materials science, driving technological breakthroughs.
6. Cost and Yield Pressure
6.1 High Cost Challenge and Scale Effects
Price Difference: EUV mask blanks are significantly more expensive than traditional photomasks, and manufacturers need to reduce unit costs through scale effects.
Data Support: The unit price of EUV mask blanks is approximately 5-10 times that of traditional photomasks, but this can be reduced to less than 3 times through production expansion.
6.2 Need for Yield Improvement
Process Optimization: To address issues such as hydrogen-induced blistering defects and surface particle contamination, manufacturers must continuously invest in R&D to improve yield and lifetime.
Advances in Inspection Technology: Advanced inspection technologies such as ABI systems are used to monitor mask quality in real time to ensure yield meets standards.
The growth of the EUV mask blank market is primarily driven by factors such as semiconductor industry technology upgrades, advanced process capacity expansion, supply chain security needs, technological barriers and R&D investment, policy support, and cost pressures. In the future, with the further popularization of EUV technology and the continued reduction of process nodes, market demand will continue to grow. At the same time, technological competition and supply chain integration will become key. Manufacturers need to seize market opportunities and meet challenges through technological innovation, capacity expansion, and supply chain diversification.
This report studies the global EUV Mask Blanks production, demand, key manufacturers, and key regions.
This report is a detailed and comprehensive analysis of the world market for EUV Mask Blanks and provides market size (US$ million) and Year-over-Year (YoY) Growth, considering 2025 as the base year. This report explores demand trends and competition, as well as details the characteristics of EUV Mask Blanks that contribute to its increasing demand across many markets.
Highlights and key features of the study
Global EUV Mask Blanks total production and demand, 2021-2032, (Sq m)
Global EUV Mask Blanks total production value, 2021-2032, (USD Million)
Global EUV Mask Blanks production by region & country, production, value, CAGR, 2021-2032, (USD Million) & (Sq m), (based on production site)
Global EUV Mask Blanks consumption by region & country, CAGR, 2021-2032 & (Sq m)
U.S. VS China: EUV Mask Blanks domestic production, consumption, key domestic manufacturers and share
Global EUV Mask Blanks production by manufacturer, production, price, value and market share 2021-2026, (USD Million) & (Sq m)
Global EUV Mask Blanks production by Type, production, value, CAGR, 2021-2032, (USD Million) & (Sq m)
Global EUV Mask Blanks production by Application, production, value, CAGR, 2021-2032, (USD Million) & (Sq m)
This report profiles key players in the global EUV Mask Blanks market based on the following parameters - company overview, production, value, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Hoya, AGC Inc, S&S Tech, Applied Materials, Photronics Inc, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Stakeholders would have ease in decision-making through various strategy matrices used in analyzing the World EUV Mask Blanks market
Detailed Segmentation:
Each section contains quantitative market data including market by value (US$ Millions), volume (production, consumption) & (Sq m) and average price (K US$/Sq m) by manufacturer, by Type, and by Application. Data is given for the years 2021-2032 by year with 2025 as the base year, 2026 as the estimate year, and 2027-2032 as the forecast year.
Global EUV Mask Blanks Market, By Region:
United States
China
Europe
Japan
South Korea
ASEAN
India
Rest of World
Global EUV Mask Blanks Market, Segmentation by Type:
Type 1
Type 2
Global EUV Mask Blanks Market, Segmentation by Application:
Semiconductor
IC (integrated circuit)
Others
Companies Profiled:
Hoya
AGC Inc
S&S Tech
Applied Materials
Photronics Inc
Key Questions Answered:
1. How big is the global EUV Mask Blanks market?
2. What is the demand of the global EUV Mask Blanks market?
3. What is the year over year growth of the global EUV Mask Blanks market?
4. What is the production and production value of the global EUV Mask Blanks market?
5. Who are the key producers in the global EUV Mask Blanks market?
6. What are the growth factors driving the market demand?
Table of Contents
95 Pages
- 1 Supply Summary
- 2 Demand Summary
- 3 World Manufacturers Competitive Analysis
- 4 United States VS China VS Rest of the World
- 5 Market Analysis by Type
- 6 Market Analysis by Application
- 7 Company Profiles
- 8 Industry Chain Analysis
- 9 Research Findings and Conclusion
- 10 Appendix
Pricing
Currency Rates
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