Global EUV Light Sources Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031
Description
According to our (Global Info Research) latest study, the global EUV Light Sources market size was valued at US$ 221 million in 2024 and is forecast to a readjusted size of USD 386 million by 2031 with a CAGR of 8.4% during review period.
EUV light source is the core component of EUV lithography machine and is also used in EUV mask inspection equipment. EUV light source refers to extreme ultraviolet light with a wavelength of 10 to 14 nanometers, and the specific commonly used wavelength is 13.5 nanometers.The EUV (extreme ultraviolet) light source system consists of three core units: light generation, light collection, and spectrum purification and homogenization. The key components of the system include high-performance CO2 lasers as light sources, multi-layer coated mirrors, load devices, high-efficiency light collectors, precision masks, and projection optical systems (using Xe or Sn to form plasma). In this process, the plasma effectively purifies the energy spectrum through the multiple reflection mechanism of the multi-layer film mirror, and finally produces EUV light with a wavelength of 13.5nm.
The mainstream EUV light source suppliers are mainly Cymer, Gigaphoton, etc. Ushio's EUV light source is used in Lasertec's ACTIS mask defect detection equipment. In the semiconductor lithography process, corresponding light sources are required for different masks. The applications of different masks vary greatly, and can be generally divided into binary masks, phase-shift masks, and EUV masks. EUV masks are new masks designed specifically for EUV (extreme ultraviolet) lithography technology. In view of the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). EUV is mainly used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
This report is a detailed and comprehensive analysis for global EUV Light Sources market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global EUV Light Sources market size and forecasts, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market shares of main players, shipments in revenue ($ Million), sales quantity (Units), and ASP (US$/Unit), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for EUV Light Sources
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global EUV Light Sources market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Cymer, Gigaphoton, Ushio, ISTEQ BV, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
EUV Light Sources market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Low Power
High Power
Market segment by Application
Equipment Factory
Fab
Major players covered
Cymer
Gigaphoton
Ushio
ISTEQ BV
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe EUV Light Sources product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of EUV Light Sources, with price, sales quantity, revenue, and global market share of EUV Light Sources from 2020 to 2025.
Chapter 3, the EUV Light Sources competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the EUV Light Sources breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and EUV Light Sources market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of EUV Light Sources.
Chapter 14 and 15, to describe EUV Light Sources sales channel, distributors, customers, research findings and conclusion.
EUV light source is the core component of EUV lithography machine and is also used in EUV mask inspection equipment. EUV light source refers to extreme ultraviolet light with a wavelength of 10 to 14 nanometers, and the specific commonly used wavelength is 13.5 nanometers.The EUV (extreme ultraviolet) light source system consists of three core units: light generation, light collection, and spectrum purification and homogenization. The key components of the system include high-performance CO2 lasers as light sources, multi-layer coated mirrors, load devices, high-efficiency light collectors, precision masks, and projection optical systems (using Xe or Sn to form plasma). In this process, the plasma effectively purifies the energy spectrum through the multiple reflection mechanism of the multi-layer film mirror, and finally produces EUV light with a wavelength of 13.5nm.
The mainstream EUV light source suppliers are mainly Cymer, Gigaphoton, etc. Ushio's EUV light source is used in Lasertec's ACTIS mask defect detection equipment. In the semiconductor lithography process, corresponding light sources are required for different masks. The applications of different masks vary greatly, and can be generally divided into binary masks, phase-shift masks, and EUV masks. EUV masks are new masks designed specifically for EUV (extreme ultraviolet) lithography technology. In view of the extremely short wavelength of EUV and its easy absorption by a variety of materials, traditional refractive elements such as lenses cannot be used. Instead, according to the Bragg law, the reflection of the light beam is achieved through a multi-layer (ML) structure (unlike EUV, DUV uses transmitted light). EUV is mainly used in 7nm, 5nm, 3nm and 2nm (TSMC plans to mass produce in 2025) high-end manufacturing processes.
This report is a detailed and comprehensive analysis for global EUV Light Sources market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global EUV Light Sources market size and forecasts, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Units), and average selling prices (US$/Unit), 2020-2031
Global EUV Light Sources market shares of main players, shipments in revenue ($ Million), sales quantity (Units), and ASP (US$/Unit), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for EUV Light Sources
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global EUV Light Sources market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Cymer, Gigaphoton, Ushio, ISTEQ BV, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
EUV Light Sources market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Low Power
High Power
Market segment by Application
Equipment Factory
Fab
Major players covered
Cymer
Gigaphoton
Ushio
ISTEQ BV
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe EUV Light Sources product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of EUV Light Sources, with price, sales quantity, revenue, and global market share of EUV Light Sources from 2020 to 2025.
Chapter 3, the EUV Light Sources competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the EUV Light Sources breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and EUV Light Sources market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of EUV Light Sources.
Chapter 14 and 15, to describe EUV Light Sources sales channel, distributors, customers, research findings and conclusion.
Table of Contents
84 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: EUV Light Sources by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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