Global CMP Tungsten Polishing Fluid Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031
Description
According to our (Global Info Research) latest study, the global CMP Tungsten Polishing Fluid market size was valued at US$ 603 million in 2024 and is forecast to a readjusted size of USD 994 million by 2031 with a CAGR of 7.5% during review period.
CMP tungsten polishing fluid is an abrasive solution that helps to remove micron/nanometer scale material from the surface in the chip polishing process and to achieve a high level of flatness on the wafer surface to allow the next process to proceed.
This report studies the tungsten CMP slurries, used for Tungsten Bulk CMP and Tungsten Buff CMP. The tungsten CMP slurries are widely used in memory devices manufacturing.
According to our research, the global memory chip market size in 2023 is about 92 billion US dollars, a year-on-year decrease of 31%. Currently the memory device manufacturing is dominated by memory IDMs, but foundries also occupies an important position. Key Memory IDMs includes Samsung, SK Hynix, Micron, Kioxia, Winbond, Nanya Technology, Macronix, Giantec Semiconductor, etc.
The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM). According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global IC CMP slurry.
This report is a detailed and comprehensive analysis for global CMP Tungsten Polishing Fluid market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Abrasive Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global CMP Tungsten Polishing Fluid market size and forecasts, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market size and forecasts, by Abrasive Type and by Application, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market shares of main players, shipments in revenue ($ Million), sales quantity (Ton), and ASP (US$/Kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for CMP Tungsten Polishing Fluid
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global CMP Tungsten Polishing Fluid market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Fujifilm, DuPont, Merck KGaA (Versum Materials), KC Tech, Dongjin Semichem, Anjimirco Shanghai, Samsung SDI, JSR Corporation, Vibrantz (Ferro), Hubei Dinglong, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
CMP Tungsten Polishing Fluid market is split by Abrasive Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Abrasive Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Abrasive Type
Fumed Silica
High Purity Colloidal Silica
Market segment by Application
DRAM
3D NAND
Logic IC
Others
Major players covered
Fujifilm
DuPont
Merck KGaA (Versum Materials)
KC Tech
Dongjin Semichem
Anjimirco Shanghai
Samsung SDI
JSR Corporation
Vibrantz (Ferro)
Hubei Dinglong
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe CMP Tungsten Polishing Fluid product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of CMP Tungsten Polishing Fluid, with price, sales quantity, revenue, and global market share of CMP Tungsten Polishing Fluid from 2020 to 2025.
Chapter 3, the CMP Tungsten Polishing Fluid competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the CMP Tungsten Polishing Fluid breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Abrasive Type and by Application, with sales market share and growth rate by Abrasive Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and CMP Tungsten Polishing Fluid market forecast, by regions, by Abrasive Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of CMP Tungsten Polishing Fluid.
Chapter 14 and 15, to describe CMP Tungsten Polishing Fluid sales channel, distributors, customers, research findings and conclusion.
CMP tungsten polishing fluid is an abrasive solution that helps to remove micron/nanometer scale material from the surface in the chip polishing process and to achieve a high level of flatness on the wafer surface to allow the next process to proceed.
This report studies the tungsten CMP slurries, used for Tungsten Bulk CMP and Tungsten Buff CMP. The tungsten CMP slurries are widely used in memory devices manufacturing.
According to our research, the global memory chip market size in 2023 is about 92 billion US dollars, a year-on-year decrease of 31%. Currently the memory device manufacturing is dominated by memory IDMs, but foundries also occupies an important position. Key Memory IDMs includes Samsung, SK Hynix, Micron, Kioxia, Winbond, Nanya Technology, Macronix, Giantec Semiconductor, etc.
The global market for semiconductor was estimated at US$ 526.8 billion in the year 2023, is projected to US$ 780.7 billion by 2030. IC Manufacturing is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as computer processors, microcontrollers, and memory chips (such as NAND flash and DRAM). According to our research, the global semiconductor manufacturing (wafer fabrication) market is projected to grow from US$ 251.7 billion in 2023 to US$ 506.5 billion by 2030, at a Compound Annual Growth Rate (CAGR) of 40.49% during the forecast period. This will drive rapid growth of global IC CMP slurry.
This report is a detailed and comprehensive analysis for global CMP Tungsten Polishing Fluid market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Abrasive Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global CMP Tungsten Polishing Fluid market size and forecasts, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market size and forecasts, by Abrasive Type and by Application, in consumption value ($ Million), sales quantity (Ton), and average selling prices (US$/Kg), 2020-2031
Global CMP Tungsten Polishing Fluid market shares of main players, shipments in revenue ($ Million), sales quantity (Ton), and ASP (US$/Kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for CMP Tungsten Polishing Fluid
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global CMP Tungsten Polishing Fluid market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Fujifilm, DuPont, Merck KGaA (Versum Materials), KC Tech, Dongjin Semichem, Anjimirco Shanghai, Samsung SDI, JSR Corporation, Vibrantz (Ferro), Hubei Dinglong, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
CMP Tungsten Polishing Fluid market is split by Abrasive Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Abrasive Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Abrasive Type
Fumed Silica
High Purity Colloidal Silica
Market segment by Application
DRAM
3D NAND
Logic IC
Others
Major players covered
Fujifilm
DuPont
Merck KGaA (Versum Materials)
KC Tech
Dongjin Semichem
Anjimirco Shanghai
Samsung SDI
JSR Corporation
Vibrantz (Ferro)
Hubei Dinglong
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe CMP Tungsten Polishing Fluid product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of CMP Tungsten Polishing Fluid, with price, sales quantity, revenue, and global market share of CMP Tungsten Polishing Fluid from 2020 to 2025.
Chapter 3, the CMP Tungsten Polishing Fluid competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the CMP Tungsten Polishing Fluid breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Abrasive Type and by Application, with sales market share and growth rate by Abrasive Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and CMP Tungsten Polishing Fluid market forecast, by regions, by Abrasive Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of CMP Tungsten Polishing Fluid.
Chapter 14 and 15, to describe CMP Tungsten Polishing Fluid sales channel, distributors, customers, research findings and conclusion.
Table of Contents
89 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: CMP Tungsten Polishing Fluid by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Abrasive Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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