Global Active Oxide Polishing Suspensions Market 2025 by Manufacturers, Regions, Type and Application, Forecast to 2031
Description
According to our (Global Info Research) latest study, the global Active Oxide Polishing Suspensions market size was valued at US$ 180 million in 2024 and is forecast to a readjusted size of USD 233 million by 2031 with a CAGR of 3.1% during review period.
Active oxide polishing suspensions, also known as Chemical Mechanical Polishing (CMP) slurries, are crucial in semiconductor manufacturing. They are complex mixtures containing abrasive nanoparticles (like silica, alumina, or ceria), oxidizing agents, and other chemical additives in a liquid medium. These suspensions are used to planarize and polish semiconductor wafers, removing unwanted material and creating a smooth, defect-free surface for subsequent processing steps. The "active" component refers to the chemical reactions that occur between the slurry and the wafer surface, enhancing the polishing process.
The active oxide polishing suspensions (CMP slurries) industry is driven by the relentless miniaturization of semiconductor devices and the increasing complexity of integrated circuits. Key trends include the development of new abrasive materials with smaller particle sizes and narrower size distributions to achieve higher precision and lower defect rates. There's a strong focus on formulating slurries with improved selectivity, meaning they remove specific materials at a controlled rate while minimizing removal of other materials. This is crucial for advanced manufacturing processes like shallow trench isolation (STI) and copper interconnect fabrication. The industry is also moving towards more environmentally friendly slurries with reduced chemical content and lower waste generation. The increasing use of advanced metrology techniques for real-time monitoring of the polishing process is driving the development of more stable and predictable slurries. Furthermore, the rise of new semiconductor materials beyond silicon, such as silicon carbide (SiC) and gallium nitride (GaN), is creating demand for specialized CMP slurries tailored to their unique properties. The development of integrated CMP solutions, including equipment and process control, is also a key trend, aiming for higher throughput and lower cost of ownership.
This report is a detailed and comprehensive analysis for global Active Oxide Polishing Suspensions market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Active Oxide Polishing Suspensions market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Active Oxide Polishing Suspensions
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Active Oxide Polishing Suspensions market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Ted Pella, Struers, Kemet, Allied High Tech Products, Buehler, Akasel, Veiyee, Anamet, Salem Fabrication Technologies, OnPoint, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Active Oxide Polishing Suspensions market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
0.04 µm
0.02 µm
Others
Market segment by Application
Photosolder
Wafer
Others
Major players covered
Ted Pella
Struers
Kemet
Allied High Tech Products
Buehler
Akasel
Veiyee
Anamet
Salem Fabrication Technologies
OnPoint
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Active Oxide Polishing Suspensions product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Active Oxide Polishing Suspensions, with price, sales quantity, revenue, and global market share of Active Oxide Polishing Suspensions from 2020 to 2025.
Chapter 3, the Active Oxide Polishing Suspensions competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Active Oxide Polishing Suspensions breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Active Oxide Polishing Suspensions market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Active Oxide Polishing Suspensions.
Chapter 14 and 15, to describe Active Oxide Polishing Suspensions sales channel, distributors, customers, research findings and conclusion.
Active oxide polishing suspensions, also known as Chemical Mechanical Polishing (CMP) slurries, are crucial in semiconductor manufacturing. They are complex mixtures containing abrasive nanoparticles (like silica, alumina, or ceria), oxidizing agents, and other chemical additives in a liquid medium. These suspensions are used to planarize and polish semiconductor wafers, removing unwanted material and creating a smooth, defect-free surface for subsequent processing steps. The "active" component refers to the chemical reactions that occur between the slurry and the wafer surface, enhancing the polishing process.
The active oxide polishing suspensions (CMP slurries) industry is driven by the relentless miniaturization of semiconductor devices and the increasing complexity of integrated circuits. Key trends include the development of new abrasive materials with smaller particle sizes and narrower size distributions to achieve higher precision and lower defect rates. There's a strong focus on formulating slurries with improved selectivity, meaning they remove specific materials at a controlled rate while minimizing removal of other materials. This is crucial for advanced manufacturing processes like shallow trench isolation (STI) and copper interconnect fabrication. The industry is also moving towards more environmentally friendly slurries with reduced chemical content and lower waste generation. The increasing use of advanced metrology techniques for real-time monitoring of the polishing process is driving the development of more stable and predictable slurries. Furthermore, the rise of new semiconductor materials beyond silicon, such as silicon carbide (SiC) and gallium nitride (GaN), is creating demand for specialized CMP slurries tailored to their unique properties. The development of integrated CMP solutions, including equipment and process control, is also a key trend, aiming for higher throughput and lower cost of ownership.
This report is a detailed and comprehensive analysis for global Active Oxide Polishing Suspensions market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global Active Oxide Polishing Suspensions market size and forecasts, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Tons), and average selling prices (US$/kg), 2020-2031
Global Active Oxide Polishing Suspensions market shares of main players, shipments in revenue ($ Million), sales quantity (Tons), and ASP (US$/kg), 2020-2025
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for Active Oxide Polishing Suspensions
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global Active Oxide Polishing Suspensions market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include Ted Pella, Struers, Kemet, Allied High Tech Products, Buehler, Akasel, Veiyee, Anamet, Salem Fabrication Technologies, OnPoint, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
Active Oxide Polishing Suspensions market is split by Type and by Application. For the period 2020-2031, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
0.04 µm
0.02 µm
Others
Market segment by Application
Photosolder
Wafer
Others
Major players covered
Ted Pella
Struers
Kemet
Allied High Tech Products
Buehler
Akasel
Veiyee
Anamet
Salem Fabrication Technologies
OnPoint
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe Active Oxide Polishing Suspensions product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of Active Oxide Polishing Suspensions, with price, sales quantity, revenue, and global market share of Active Oxide Polishing Suspensions from 2020 to 2025.
Chapter 3, the Active Oxide Polishing Suspensions competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the Active Oxide Polishing Suspensions breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2020 to 2031.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2020 to 2031.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2020 to 2025.and Active Oxide Polishing Suspensions market forecast, by regions, by Type, and by Application, with sales and revenue, from 2026 to 2031.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of Active Oxide Polishing Suspensions.
Chapter 14 and 15, to describe Active Oxide Polishing Suspensions sales channel, distributors, customers, research findings and conclusion.
Table of Contents
99 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: Active Oxide Polishing Suspensions by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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