Global ALD Systems Market 2026 by Manufacturers, Regions, Type and Application, Forecast to 2032
Description
According to our (Global Info Research) latest study, the global ALD Systems market size was valued at US$ 4809 million in 2025 and is forecast to a readjusted size of US$ 10320 million by 2032 with a CAGR of 11.6% during review period.
In 2024, global ALD Systems production capacity is 2,800 units, with production reached approximately 2,122 units, with an average global market price of around US$ 2 million per unit. The market gross margin is mainly 35%-45%.
ALD System is a versatile deposition tool for thermal or energy enhanced ALD. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors. ALD is a key process in fabricating semiconductor devices, and part of the set of tools for synthesising nanomaterials.
The ALD System industry chain exhibits a four-segment structure: precursor chemicals, core components, system manufacturers, and downstream applications. The upstream segment primarily includes the metal-organic precursors required for ALD (TMA, TDMAT, HCDS, Ru/CO/W-based precursors, etc.), rare gases and high-purity carrier gases, as well as core equipment components, including high-precision mass flow controllers (MFC), vacuum pumps, ALD-specific valve groups, plasma sources, evaporators, heating platforms, temperature control systems, quartz/SiC reaction chambers, and high-purity piping. Suppliers include Entegris, CKD, VAT, Edwards, Pfeiffer, MKS, and Horiba.
The midstream segment comprises ALD system manufacturers, representing the technological core of the industry chain. This segment is responsible for process integration, including chamber design, precursor pulse sequence control, gas path isolation, thermal field uniformity, plasma coupling, and thin film uniformity algorithms. Leading companies include ASM, Tokyo Electron, Lam Research, Applied Materials, Jusung Engineering, NAURA, Mattson, Oxford Instruments, and Beneq. Different equipment targets different processes: Thermal ALD/PEALD is mainly used for advanced logic and memory; Batch ALD is used for high-volume DRAM/NAND and photovoltaics; and Spatial ALD is used for OLED and Micro-LED packaging.
Downstream applications are wide-ranging, including front-end (FEOL) high-k gate dielectrics and interface layers, back-end (BEOL) barrier/liner and Cu/Co/Ru metal filling, 3D NAND high aspect ratio structures, DRAM capacitor dielectric layers, and display (OLED/Micro-LED) barrier layers, photovoltaic Al₂O₃ passivation layers, battery separator coatings, and MEMS devices. With the increasing penetration of advanced processes, 3D structures, and flexible electronics, ALD has become one of the fastest-growing and most technologically advanced key equipment in the semiconductor equipment industry chain.
The Atomic Layer Deposition Equipment (ALD) market holds substantial potential across diverse applications, driven by the escalating demand for precise, ultra - thin, and high - quality thin - film coatings. In the semiconductor industry, ALD equipment is indispensable for fabricating advanced integrated circuits. As chip manufacturers strive to achieve smaller transistor sizes and higher device densities, ALD enables the deposition of extremely uniform and conformal thin films with atomic - level precision. This is crucial for gate dielectric formation, metal electrode deposition, and other critical processes in semiconductor manufacturing, ensuring enhanced device performance, reliability, and power efficiency. With the continuous evolution towards 5nm, 3nm, and even smaller technology nodes, the need for ALD equipment in semiconductor fabrication will only intensify.
In the display industry, ALD plays a vital role in improving the performance of display panels. It is used to deposit thin films for organic light - emitting diodes (OLEDs) and liquid - crystal displays (LCDs), enhancing their brightness, contrast, and lifespan. For OLEDs, ALD can precisely deposit hole - injection and electron - transport layers, optimizing the light - emitting efficiency. In LCDs, it helps in creating high - quality thin - film transistors (TFTs), enabling faster response times and better image quality. As the market for high - resolution, large - screen displays continues to grow, the demand for ALD equipment in display manufacturing will surge.
The energy sector also offers significant opportunities for the ALD equipment market. In the production of solar cells, ALD can deposit anti - reflective coatings and passivation layers, increasing the efficiency of sunlight absorption and reducing carrier recombination. This leads to higher power conversion efficiencies and lower production costs for solar panels. Additionally, in the development of advanced batteries, ALD is used to coat electrode materials, improving their electrochemical performance, stability, and cycle life. As the world transitions towards renewable energy sources and the demand for energy storage solutions rises, the application of ALD equipment in the energy industry will expand rapidly.
In the field of nanotechnology and research, ALD equipment is a key tool for fabricating nanostructured materials with precise control over their composition and structure. Scientists use ALD to create novel materials for various applications, such as catalysis, sensors, and drug delivery systems. By enabling the deposition of thin films layer - by - layer, ALD allows researchers to tailor the properties of materials at the nanoscale, opening up new possibilities for scientific discovery and technological innovation.
Furthermore, in the microelectromechanical systems (MEMS) industry, ALD is used to deposit protective and functional thin films on MEMS devices. This improves their reliability, performance, and functionality, making them suitable for applications in automotive sensors, consumer electronics, and medical devices. As the MEMS market continues to grow, driven by the increasing demand for miniaturized and intelligent devices, the adoption of ALD equipment will also increase. Overall, with its wide - ranging applications across multiple high - tech industries and the continuous pursuit of technological advancements, the Atomic Layer Deposition Equipment market is poised for remarkable growth, offering abundant opportunities for innovation and market expansion.
This report is a detailed and comprehensive analysis for global ALD Systems market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global ALD Systems market size and forecasts, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market shares of main players, shipments in revenue ($ Million), sales quantity (Units), and ASP (K US$/Unit), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for ALD Systems
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global ALD Systems market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include ASM International, Tokyo Electron, Lam Research, Jiangsu Leadmicro Nano Technology Co., Ltd., Applied Materials, NAURA, Ideal Deposition Equipment and Applications (Shanghai) Co., Ltd., Jusung Engineering, Qingdao Sifang Sri Intellectual Technology Co., Ltd.能, Eugenus, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
ALD Systems market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Thermal ALD
PE-ALD
Spatial ALD
Others
Market segment by Process
R&D Machine
Mass Production Machine
Market segment by Chamber
Single-chamber ALD
Multi-chamber ALD
Market segment by Application
Scientific Research
Power/Compound Semiconductors
Integrated Circuits
Display Industry
Photovoltaics
Others
Major players covered
ASM International
Tokyo Electron
Lam Research
Jiangsu Leadmicro Nano Technology Co., Ltd.
Applied Materials
NAURA
Ideal Deposition Equipment and Applications (Shanghai) Co., Ltd.
Jusung Engineering
Qingdao Sifang Sri Intellectual Technology Co., Ltd.能
Eugenus
Wuxi Songyu Technology Company Limited
Piotech, Inc
Oxford Instruments
Skytech
CN1
Veeco
Forge Nano
Samco
Wonik IPS
XIAMEN YUNMAO TECHNOLOGY CO.,LTD.
Optorun
Atomic Nano Materials and Equipment Co., Ltd
NCD
Nexusbe
Shenzhen Yuanshi Technology Co., Ltd
Arradiance
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe ALD Systems product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of ALD Systems, with price, sales quantity, revenue, and global market share of ALD Systems from 2021 to 2026.
Chapter 3, the ALD Systems competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the ALD Systems breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and ALD Systems market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of ALD Systems.
Chapter 14 and 15, to describe ALD Systems sales channel, distributors, customers, research findings and conclusion.
In 2024, global ALD Systems production capacity is 2,800 units, with production reached approximately 2,122 units, with an average global market price of around US$ 2 million per unit. The market gross margin is mainly 35%-45%.
ALD System is a versatile deposition tool for thermal or energy enhanced ALD. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors. ALD is a key process in fabricating semiconductor devices, and part of the set of tools for synthesising nanomaterials.
The ALD System industry chain exhibits a four-segment structure: precursor chemicals, core components, system manufacturers, and downstream applications. The upstream segment primarily includes the metal-organic precursors required for ALD (TMA, TDMAT, HCDS, Ru/CO/W-based precursors, etc.), rare gases and high-purity carrier gases, as well as core equipment components, including high-precision mass flow controllers (MFC), vacuum pumps, ALD-specific valve groups, plasma sources, evaporators, heating platforms, temperature control systems, quartz/SiC reaction chambers, and high-purity piping. Suppliers include Entegris, CKD, VAT, Edwards, Pfeiffer, MKS, and Horiba.
The midstream segment comprises ALD system manufacturers, representing the technological core of the industry chain. This segment is responsible for process integration, including chamber design, precursor pulse sequence control, gas path isolation, thermal field uniformity, plasma coupling, and thin film uniformity algorithms. Leading companies include ASM, Tokyo Electron, Lam Research, Applied Materials, Jusung Engineering, NAURA, Mattson, Oxford Instruments, and Beneq. Different equipment targets different processes: Thermal ALD/PEALD is mainly used for advanced logic and memory; Batch ALD is used for high-volume DRAM/NAND and photovoltaics; and Spatial ALD is used for OLED and Micro-LED packaging.
Downstream applications are wide-ranging, including front-end (FEOL) high-k gate dielectrics and interface layers, back-end (BEOL) barrier/liner and Cu/Co/Ru metal filling, 3D NAND high aspect ratio structures, DRAM capacitor dielectric layers, and display (OLED/Micro-LED) barrier layers, photovoltaic Al₂O₃ passivation layers, battery separator coatings, and MEMS devices. With the increasing penetration of advanced processes, 3D structures, and flexible electronics, ALD has become one of the fastest-growing and most technologically advanced key equipment in the semiconductor equipment industry chain.
The Atomic Layer Deposition Equipment (ALD) market holds substantial potential across diverse applications, driven by the escalating demand for precise, ultra - thin, and high - quality thin - film coatings. In the semiconductor industry, ALD equipment is indispensable for fabricating advanced integrated circuits. As chip manufacturers strive to achieve smaller transistor sizes and higher device densities, ALD enables the deposition of extremely uniform and conformal thin films with atomic - level precision. This is crucial for gate dielectric formation, metal electrode deposition, and other critical processes in semiconductor manufacturing, ensuring enhanced device performance, reliability, and power efficiency. With the continuous evolution towards 5nm, 3nm, and even smaller technology nodes, the need for ALD equipment in semiconductor fabrication will only intensify.
In the display industry, ALD plays a vital role in improving the performance of display panels. It is used to deposit thin films for organic light - emitting diodes (OLEDs) and liquid - crystal displays (LCDs), enhancing their brightness, contrast, and lifespan. For OLEDs, ALD can precisely deposit hole - injection and electron - transport layers, optimizing the light - emitting efficiency. In LCDs, it helps in creating high - quality thin - film transistors (TFTs), enabling faster response times and better image quality. As the market for high - resolution, large - screen displays continues to grow, the demand for ALD equipment in display manufacturing will surge.
The energy sector also offers significant opportunities for the ALD equipment market. In the production of solar cells, ALD can deposit anti - reflective coatings and passivation layers, increasing the efficiency of sunlight absorption and reducing carrier recombination. This leads to higher power conversion efficiencies and lower production costs for solar panels. Additionally, in the development of advanced batteries, ALD is used to coat electrode materials, improving their electrochemical performance, stability, and cycle life. As the world transitions towards renewable energy sources and the demand for energy storage solutions rises, the application of ALD equipment in the energy industry will expand rapidly.
In the field of nanotechnology and research, ALD equipment is a key tool for fabricating nanostructured materials with precise control over their composition and structure. Scientists use ALD to create novel materials for various applications, such as catalysis, sensors, and drug delivery systems. By enabling the deposition of thin films layer - by - layer, ALD allows researchers to tailor the properties of materials at the nanoscale, opening up new possibilities for scientific discovery and technological innovation.
Furthermore, in the microelectromechanical systems (MEMS) industry, ALD is used to deposit protective and functional thin films on MEMS devices. This improves their reliability, performance, and functionality, making them suitable for applications in automotive sensors, consumer electronics, and medical devices. As the MEMS market continues to grow, driven by the increasing demand for miniaturized and intelligent devices, the adoption of ALD equipment will also increase. Overall, with its wide - ranging applications across multiple high - tech industries and the continuous pursuit of technological advancements, the Atomic Layer Deposition Equipment market is poised for remarkable growth, offering abundant opportunities for innovation and market expansion.
This report is a detailed and comprehensive analysis for global ALD Systems market. Both quantitative and qualitative analyses are presented by manufacturers, by region & country, by Type and by Application. As the market is constantly changing, this report explores the competition, supply and demand trends, as well as key factors that contribute to its changing demands across many markets. Company profiles and product examples of selected competitors, along with market share estimates of some of the selected leaders for the year 2025, are provided.
Key Features:
Global ALD Systems market size and forecasts, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market size and forecasts by region and country, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market size and forecasts, by Type and by Application, in consumption value ($ Million), sales quantity (Units), and average selling prices (K US$/Unit), 2021-2032
Global ALD Systems market shares of main players, shipments in revenue ($ Million), sales quantity (Units), and ASP (K US$/Unit), 2021-2026
The Primary Objectives in This Report Are:
To determine the size of the total market opportunity of global and key countries
To assess the growth potential for ALD Systems
To forecast future growth in each product and end-use market
To assess competitive factors affecting the marketplace
This report profiles key players in the global ALD Systems market based on the following parameters - company overview, sales quantity, revenue, price, gross margin, product portfolio, geographical presence, and key developments. Key companies covered as a part of this study include ASM International, Tokyo Electron, Lam Research, Jiangsu Leadmicro Nano Technology Co., Ltd., Applied Materials, NAURA, Ideal Deposition Equipment and Applications (Shanghai) Co., Ltd., Jusung Engineering, Qingdao Sifang Sri Intellectual Technology Co., Ltd.能, Eugenus, etc.
This report also provides key insights about market drivers, restraints, opportunities, new product launches or approvals.
Market Segmentation
ALD Systems market is split by Type and by Application. For the period 2021-2032, the growth among segments provides accurate calculations and forecasts for consumption value by Type, and by Application in terms of volume and value. This analysis can help you expand your business by targeting qualified niche markets.
Market segment by Type
Thermal ALD
PE-ALD
Spatial ALD
Others
Market segment by Process
R&D Machine
Mass Production Machine
Market segment by Chamber
Single-chamber ALD
Multi-chamber ALD
Market segment by Application
Scientific Research
Power/Compound Semiconductors
Integrated Circuits
Display Industry
Photovoltaics
Others
Major players covered
ASM International
Tokyo Electron
Lam Research
Jiangsu Leadmicro Nano Technology Co., Ltd.
Applied Materials
NAURA
Ideal Deposition Equipment and Applications (Shanghai) Co., Ltd.
Jusung Engineering
Qingdao Sifang Sri Intellectual Technology Co., Ltd.能
Eugenus
Wuxi Songyu Technology Company Limited
Piotech, Inc
Oxford Instruments
Skytech
CN1
Veeco
Forge Nano
Samco
Wonik IPS
XIAMEN YUNMAO TECHNOLOGY CO.,LTD.
Optorun
Atomic Nano Materials and Equipment Co., Ltd
NCD
Nexusbe
Shenzhen Yuanshi Technology Co., Ltd
Arradiance
Market segment by region, regional analysis covers
North America (United States, Canada, and Mexico)
Europe (Germany, France, United Kingdom, Russia, Italy, and Rest of Europe)
Asia-Pacific (China, Japan, Korea, India, Southeast Asia, and Australia)
South America (Brazil, Argentina, Colombia, and Rest of South America)
Middle East & Africa (Saudi Arabia, UAE, Egypt, South Africa, and Rest of Middle East & Africa)
The content of the study subjects, includes a total of 15 chapters:
Chapter 1, to describe ALD Systems product scope, market overview, market estimation caveats and base year.
Chapter 2, to profile the top manufacturers of ALD Systems, with price, sales quantity, revenue, and global market share of ALD Systems from 2021 to 2026.
Chapter 3, the ALD Systems competitive situation, sales quantity, revenue, and global market share of top manufacturers are analyzed emphatically by landscape contrast.
Chapter 4, the ALD Systems breakdown data are shown at the regional level, to show the sales quantity, consumption value, and growth by regions, from 2021 to 2032.
Chapter 5 and 6, to segment the sales by Type and by Application, with sales market share and growth rate by Type, by Application, from 2021 to 2032.
Chapter 7, 8, 9, 10 and 11, to break the sales data at the country level, with sales quantity, consumption value, and market share for key countries in the world, from 2021 to 2026.and ALD Systems market forecast, by regions, by Type, and by Application, with sales and revenue, from 2027 to 2032.
Chapter 12, market dynamics, drivers, restraints, trends, and Porters Five Forces analysis.
Chapter 13, the key raw materials and key suppliers, and industry chain of ALD Systems.
Chapter 14 and 15, to describe ALD Systems sales channel, distributors, customers, research findings and conclusion.
Table of Contents
178 Pages
- 1 Market Overview
- 2 Manufacturers Profiles
- 3 Competitive Environment: ALD Systems by Manufacturer
- 4 Consumption Analysis by Region
- 5 Market Segment by Type
- 6 Market Segment by Application
- 7 North America
- 8 Europe
- 9 Asia-Pacific
- 10 South America
- 11 Middle East & Africa
- 12 Market Dynamics
- 13 Raw Material and Industry Chain
- 14 Shipments by Distribution Channel
- 15 Research Findings and Conclusion
- 16 Appendix
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