Market Overview
According to DIResearch's in-depth investigation and research, the global EUV Mask Blanks market size will reach 316.78 Million USD in 2025 and is projected to reach 669.39 Million USD by 2032, with a CAGR of 11.28% (2025-2032). Notably, the China EUV Mask Blanks market has changed rapidly in the past few years. By 2025, China's market size is expected to be Million USD, representing approximately % of the global market share.
Research Summary
EUV (Extreme Ultraviolet) mask blanks are a critical component in the semiconductor manufacturing process, specifically for photolithography using EUV technology. These mask blanks are essentially high-precision, ultra-flat substrates made of materials like silicon or molybdenum, coated with multiple layers of reflective and absorptive films. EUV mask blanks play a fundamental role in the production of advanced semiconductor devices by acting as templates for patterning intricate circuitry onto silicon wafers. In EUV lithography, short-wavelength EUV light is used to etch nanoscale features onto the mask blanks, which are then projected onto silicon wafers. The reflective multilayer coating on the mask blank is designed to efficiently reflect and focus EUV light, enabling the production of smaller and more densely packed semiconductor components. These mask blanks are exceptionally precise and must meet stringent quality standards to ensure the production of high-performance microchips used in various electronic devices, from smartphones to high-performance computing systems.
The major global manufacturers of EUV Mask Blanks include AGC Inc, Hoya, S&S Tech, Applied Materials, Photronics Inc, etc. The global players competition landscape in this report is divided into three tiers. The first tier comprises global leading enterprises that command a substantial market share, hold a dominant industry position, possess strong competitiveness and influence, and generate significant revenue. The second tier includes companies with a notable market presence and reputation; these firms actively follow industry leaders in product, service, or technological innovation and maintain a moderate revenue scale. The third tier consists of smaller companies with limited market share and lower brand recognition, primarily focused on local markets and generating comparatively lower revenue.
This report studies the market size, price trends and future development prospects of EUV Mask Blanks. Focus on analysing the market share, product portfolio, prices, sales, revenue and gross profit margin of global major manufacturers, as well as the market status and trends of different product types and applications in the global EUV Mask Blanks market. The report data covers historical data from 2020 to 2024, based year in 2025 and forecast data from 2026 to 2032.
The regions and countries in the report include US, Germany, Japan, China, France, UK, South Korea, Canada, Italy, Russia, Mexico, Brazil, India, Vietnam, Thailand, South Africa and other regions, covering the EUV Mask Blanks market conditions and future development trends of key regions and countries, combined with industry-related policies and the latest technological developments, analyze the development characteristics of EUV Mask Blanks industries in various regions and countries, help companies understand the development characteristics of each region, help companies formulate business strategies, and achieve the ultimate goal of the company's global development strategy.
The data sources of this report mainly include the National Bureau of Statistics, customs databases, industry associations, corporate financial reports, third-party databases, etc. Among them, macroeconomic data mainly comes from the National Bureau of Statistics, International Economic Research Organization; industry statistical data mainly come from industry associations; company data mainly comes from interviews, public information collection, third-party reliable databases, and price data mainly comes from various markets monitoring database.
Global Key Manufacturers of EUV Mask Blanks Include:
AGC Inc
Hoya
S&S Tech
Applied Materials
Photronics Inc
EUV Mask Blanks Product Segment Include:
Si-based EUV Mask Blanks
Mo-based EUV Mask Blanks
Others
EUV Mask Blanks Product Application Include:
Semiconductor
IC (integrated circuit)
Others
Chapter Scope
Chapter 1: Product Research Range, Product Types and Applications, Market Overview, Market Situation and Trend
Chapter 2: Global EUV Mask Blanks Industry PESTEL Analysis
Chapter 3: Global EUV Mask Blanks Industry Porter's Five Forces Analysis
Chapter 4: Global EUV Mask Blanks Major Regional Market Size (Sales, Revenue, Price) and Forecast Analysis
Chapter 5: Global EUV Mask Blanks Competitive Analysis of Key Manufacturers (Sales, Revenue, Market Share, Price, Regional Distribution and Industry Concentration)
Chapter 6: Global EUV Mask Blanks Sales, Revenue, Price and Forecast by Product Type
Chapter 7: Key Company Profiles (Product Portfolio, Sales, Revenue, Price and Gross Margin)
Chapter 8: Industrial Chain Analysis, EUV Mask Blanks Different Application Market Analysis (Sales and Revenue), Sales Channel Analysis
Chapter 9: Research Findings and Conclusion
Chapter 10: Methodology and Data Sources
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