Global Thin Film Metrology Systems Market 2015-2019
About Thin-film Metrology Systems
Thin film metrology systems are used to measure the film thickness accurately. A series of film layers that act as a conductors, semiconductors, or bare wafers are deposited on an IC during IC fabrication. Thin film metrology systems are required during thin film deposition process to monitor and measure thin film parameters such as thickness, resistivity, and stress. There are various technologies used to measure the film thickness which include profilometry, ellipsometry, spectroscopic reflectrometry, and X-ray analysis.
TechNavio's analysts forecast the Global Thin-film Metrology Systems market will grow at a CAGR of 3.4 percent over the period 2014-2019.
Covered in this Report
This report covers the present scenario and growth prospects of the Global Thin Film Metrology Systems market for the period 2015-2019. It considers 2014 as the base year and provides data for the trailing 12 months. To calculate the market size, the report considers revenue generated from the sales of thin film metrology systems to various end-users including:
TechNavio Announces the Publication of its Research Report – Global Thin Film Metrology Systems Market 2015-2019
TechNavio recognizes the following companies as the key players in the Global Thin Film Metrology Systems Market: KLA-Tencor Corp., Nanometrics Inc., Nova Measuring Instruments Ltd. and Rudolph Technologies Inc
Other Prominent Vendors in the market are: Hitachi High-Technologies, SCREEN Holdings and Semilab.
Commenting on the report, an analyst from TechNavio’s team said: “One of the major trends in the market is the increase in demand for integration and miniaturization of semiconductor devices. High level of integration to add functionalities on a single device is leading to the miniaturization of ICs which is accelerating the demand for thin film metrology systems to effectively enable a semiconductor manufacturing process.”
According to the report, one of the main drivers of the market is the increased level of complexity in ICs. Over the years, the number of functions an IC has been able to do has increased considerably, resulting in the introduction of complex architectures such as 3D and FinFET. This is expected to foster the demand for thin film metrology systems as they are used in the manufacturing of complex semiconductor ICs.
Further, the report states that the cyclical nature of the semiconductor industry is one of the main challenges in the market. The revenue generated in the Semiconductor industry is cyclical in nature which acts as a major challenge for thin film metrology systems as they are dependent on the economic condition and the capital expenditure cycle of semiconductor manufacturers. Often production tends to exceed the demand during economic downturn, resulting in inventory pileup and, thus, low demand for semiconductor devices.
KLA-Tencor , Nanometrics , Nova Measuring Instruments , Rudolph Technologies , Hitachi High-Technologies, SCREEN Holdings, Semilab
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