Global Rapid Thermal Processing Equipment Market 2015-2019
About Rapid Thermal Processing Equipment
Manufacture of semiconductors involves semiconductor silicon wafer production, wafer processing, assembly, and testing. Rapid thermal processing refers to the heating of silicon wafers to temperatures above 2,192 degree Fahrenheit within seconds to attain nitridation, dopant activation, metal reflow, thermal oxidation, and chemical vapor deposition within the silicon wafers of a semiconductor. Silicon wafers are heated using either lamps or lasers. Rapid thermal processing equipment offers advantages such as lower power consumption and cost savings. Rapid thermal annealing equipment is used to activate dopants in the wafer and for interfacial reaction of metal contacts. Rapid thermal processing has been gaining popularity among semiconductor manufacturers because of its use in circuit processing, CMOS production, and in the Microelectronics industry.
TechNavio's analysts forecast the Global Rapid Thermal Processing Equipment market to grow at a CAGR of 3.56 percent over the period 2014-2019.
Covered in this Report
The Global Rapid Thermal Processing Equipment market can be segmented into three based on type: Lamp-based, Laser-based, and Susceptor-based rapid thermal processing equipment. The major end-users of rapid thermal processing equipment are specialist semiconductor manufacturers.
TechNavio's report, the Global Rapid Thermal Processing Equipment Market 2015-2019, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the Americas, and the APAC and EMEA regions; it also covers the Global Rapid Thermal Processing Equipment market landscape and its growth prospects in the coming years. The report includes a discussion of the key vendors operating in this market.Key Regions
TechNavio Announces the Publication of its Research Report – Global Rapid Thermal Processing Equipment Market 2015-2019
TechNavio recognizes the following companies as the key players in the Global Rapid Thermal Processing Equipment Market: Applied Materials Inc., Hitachi Kokusai Electric Inc., Mattson Technology Inc., SCREEN Manufacturing Co. Ltd. and Ultratech Inc.
Other Prominent Vendors in the market are: AG Associates, AnnealSys, Jilepec, Modular Process Technology and SemiTEq.
Commenting on the report, an analyst from TechNavio’s team said: “One of the key trends emerging in the market is the growing popularity of flash-assist rapid thermal processing, which is used for ultra-shallow junctions. These systems give accurate, emissivity-independent temperature measurement that can be used for feedback control.”
According to the report, one of the key factors driving the market is the surge in sales of semiconductors for use in smartphones and other smart devices. The growth of the Global Mobile Computing Devices market is also expected to increase demand for semiconductors and contribute to the growth of the market for rapid thermal processing equipment.
Further, the report states that one of the key challenges in the market is the unreliable nature of radiometric temperature measurement and control in wafers in these systems. Radiometric methods of temperature control require knowledge of the radiative and optical properties of the wafer, effects of surface roughness, and reflected irradiation from lamp banks. Methods for reducing emissivity and stray radiation are employed to ascertain accuracy in measurement.
Applied Materials, Hitachi Kokusai Electric, Mattson Technology, Screen Holdings, Ultratech Other Prominent Vendors, AG Associates, AnnealSys, Jilepec, Modular ProcessTechnology, SemiTEq