Global Photomask Inspection Market 2017-2021
About Photomask Inspection
Mask inspection or photomask inspection is an operation of checking the accuracy of fabricated photomasks that are used in semiconductor device fabrication. In the semiconductor industry, photomask inspection is a series of electronic data that lays the foundation for lithography steps of the semiconductor device fabrication process. Photomask inspection is a method used before lithography to inspect photomasks for defects during the production of semiconductor wafers and is also used for R&D.
Technavio’s analysts forecast the global photomask inspection market to grow at a CAGR of 7.05% during the period 2017-2021.
Covered in this report
The report covers the present scenario and the growth prospects of the global photomask inspection market for 2017-2021. To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.
The market is divided into the following segments based on geography:
Technavio Announces the Publication of its Research Report – Global Photomask Inspection Market 2017-2021
Technavio recognizes the following companies as the key players in the global photomask inspection market: KLA-Tencor, Applied Materials and Lasertec.
Other Prominent Vendors in the market are: Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.
Commenting on the report, an analyst from Technavio’s team said: “One trend in the market is increase in wafer size. A wafer is known as a slice or substrate. It is a thin substrate of semiconductor material, such as crystalline silicon and is used for the fabrication of ICs and photovoltaics for conventional, wafer-based solar cells. Silicon wafers are essential for the fabrication of ICs.”
According to the report, one driver in the market is growth of wireless computing devices. The growth of mobile computing devices has fueled the growth of the global photomask inspection market. Consumers electronics such as smartphones, laptops, and notebooks are in demand. They are becoming lighter, slimmer, and more reliable. They are the highest contributors to the revenue of the global photomask inspection market, which is expected to continue during the forecast period. The growing demand for consumer electronics is directly proportional to increase in the rate of adoption of photomask inspection.
Further, the report states that one challenge in the market is increased inventory levels in supply chain. The semiconductor equipment industry is cyclical in nature, which affects the operating results of equipment vendors due to severe downturns during this period. The equipment manufacturers are faced with risks such as overcapacity, decreased demand, and increased price competition. Changes in customer requirements due to new manufacturing capacity and advances in technology affect equipment manufacturers considerably. The capital expenditure of semiconductor device manufacturers affects semiconductor manufacturing equipment vendors.
The study was conducted using an objective combination of primary and secondary information including inputs from key participants in the industry. The report contains a comprehensive market and vendor landscape in addition to a SWOT analysis of the key vendors. For further information on this report, please visit- https://www.technavio.com/report/global-photomask-inspection-market-2017-2021
KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.
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