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Global Photomask Inspection Market 2017-2021

Global Photomask Inspection Market 2017-2021

About Photomask Inspection

Mask inspection or photomask inspection is an operation of checking the accuracy of fabricated photomasks that are used in semiconductor device fabrication. In the semiconductor industry, photomask inspection is a series of electronic data that lays the foundation for lithography steps of the semiconductor device fabrication process. Photomask inspection is a method used before lithography to inspect photomasks for defects during the production of semiconductor wafers and is also used for R&D.

Technavio’s analysts forecast the global photomask inspection market to grow at a CAGR of 7.05% during the period 2017-2021.

Covered in this report

The report covers the present scenario and the growth prospects of the global photomask inspection market for 2017-2021. To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.

The market is divided into the following segments based on geography:

  • Americas
  • APAC
  • EMEA
Technavio's report, Global Photomask Inspection Market 2017-2021, has been prepared based on an in-depth market analysis with inputs from industry experts. The report covers the market landscape and its growth prospects over the coming years. The report also includes a discussion of the key vendors operating in this market.

Key vendors
  • KLA-Tencor
  • Applied Materials
  • Lasertec
Other prominent vendors
  • Carl Zeiss
  • FEI (a subsidiary of Thermo Fisher Scientific)
  • Hermes Microvision
  • JEOL
  • Nanometrics
  • Nikon
  • Planar
  • Rudolph Technologies
Market driver
  • Increase in number of fabs
  • For a full, detailed list, view our report
Market challenge
  • Increased inventory levels in supply chain
  • For a full, detailed list, view our report
Market trend
  • Increase in wafer size
  • For a full, detailed list, view our report
Key questions answered in this report
  • What will the market size be in 2021 and what will the growth rate be?
  • What are the key market trends?
  • What is driving this market?
  • What are the challenges to market growth?
  • Who are the key vendors in this market space?
  • What are the market opportunities and threats faced by the key vendors?
  • What are the strengths and weaknesses of the key vendors?


Press Release

Technavio Announces the Publication of its Research Report – Global Photomask Inspection Market 2017-2021

Technavio recognizes the following companies as the key players in the global photomask inspection market: KLA-Tencor, Applied Materials and Lasertec.

Other Prominent Vendors in the market are: Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.

Commenting on the report, an analyst from Technavio’s team said: “One trend in the market is increase in wafer size. A wafer is known as a slice or substrate. It is a thin substrate of semiconductor material, such as crystalline silicon and is used for the fabrication of ICs and photovoltaics for conventional, wafer-based solar cells. Silicon wafers are essential for the fabrication of ICs.”

According to the report, one driver in the market is growth of wireless computing devices. The growth of mobile computing devices has fueled the growth of the global photomask inspection market. Consumers electronics such as smartphones, laptops, and notebooks are in demand. They are becoming lighter, slimmer, and more reliable. They are the highest contributors to the revenue of the global photomask inspection market, which is expected to continue during the forecast period. The growing demand for consumer electronics is directly proportional to increase in the rate of adoption of photomask inspection.

Further, the report states that one challenge in the market is increased inventory levels in supply chain. The semiconductor equipment industry is cyclical in nature, which affects the operating results of equipment vendors due to severe downturns during this period. The equipment manufacturers are faced with risks such as overcapacity, decreased demand, and increased price competition. Changes in customer requirements due to new manufacturing capacity and advances in technology affect equipment manufacturers considerably. The capital expenditure of semiconductor device manufacturers affects semiconductor manufacturing equipment vendors.

The study was conducted using an objective combination of primary and secondary information including inputs from key participants in the industry. The report contains a comprehensive market and vendor landscape in addition to a SWOT analysis of the key vendors. For further information on this report, please visit- https://www.technavio.com/report/global-photomask-inspection-market-2017-2021

Companies Mentioned

KLA-Tencor, Applied Materials, Lasertec, Carl Zeiss, FEI (a subsidiary of Thermo Fisher Scientific), Hermes Microvision, JEOL, Nanometrics, Nikon, Planar and Rudolph Technologies.

  • Executive summary
  • Scope of the report
  • Research Methodology
  • Introduction
    • Key market highlights
  • Market landscape
    • Photomask inspection: Overview
  • Market overview
    • Table Global photomask inspection market: Overview
    • Technology type
    • End-users
    • Market size and forecast
      • Table Global photomask inspection market 2016-2021 ($ millions)
    • Five forces analysis
      • Table Five forces analysis
  • Market segmentation by technology type
    • Market overview
      • Table Global photomask inspection market by technology type 2016-2021 (% share)
    • Global photomask inspection market by optical inspection
      • Table Global photomask inspection market by optical inspection 2016-2021 ($ millions)
    • Global photomask inspection market by e-beam inspection
      • Table Global photomask inspection market by e-beam inspection 2016-2021 ($ millions)
  • Market segmentation by end-user
    • Market overview
      • Table Global photomask inspection market by end-users 2016-2021 (% revenue share)
    • Global photomask inspection market by foundries
      • Table Global photomask inspection market by foundries 2016-2021 ($ millions)
    • Global photomask inspection market by IDMs
      • Table Global photomask inspection market by IDMs 2016-2021 ($ millions)
  • Geographical segmentation
    • Market overview
      • Table Global photomask inspection market by region 2016-2021 (% revenue share)
    • Photomask inspection market in APAC
      • Table Photomask inspection market in APAC 2016-2021 ($ millions)
    • Photomask inspection market in Americas
      • Table Photomask inspection market in Americas 2016-2021 ($ millions)
    • Photomask inspection market in EMEA
      • Table Photomask inspection market in EMEA 2016-2021 ($ millions)
  • Key leading countries
    • Market overview
      • Table Global photomask inspection market: Key leading countries
    • US
    • South Korea
    • Taiwan
    • Japan
  • Market drivers
    • Increase in number of fabs
      • Table Construction plans of fabs
      • Table Market share of wafers by size: 2016-2021 (%)
    • Growth of wireless computing devices
    • Demand for SoC technology
    • Rising demand for IoT
  • Impact of drivers
    • Table Impact of drivers
  • Market challenges
    • High initial capital investments
    • Increased inventory levels in supply chain
    • High dependency on few suppliers
    • Increasing complexity of photomask manufacturing process
  • Impact of drivers and challenges
    • Table Impact of drivers and challenges
  • Market trends
    • Increase in wafer size
      • Table Evolution of wafer size
    • Constant decrease in lithography wavelength
    • Growing demand for memory devices
      • Table CAGR of 3D NAND and DRAM 2016-2021
    • Proliferation of wearable devices
    • Shorter replacement cycles of electronic gadgets
  • Vendor landscape
    • Competitive scenario
    • Other prominent vendors
      • Table Other prominent vendors
  • Key vendor analysis
    • KLA-Tencor
      • Table Recent developments
    • Applied Materials
      • Table Recent developments
    • Lasertec
      • Table Recent developments
  • Appendix
    • List of abbreviations
  • Explore Technavio

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