Global Lithography Metrology Equipment Market 2018-2022
About Lithography Metrology Equipment
The lithography metrology equipment measures dimensions of circuit patterns on wafers. They are used for process control in wafer patterning, and reticles in mask shops and semiconductor fobs, particularly after the etch and mask processes of the process flow. Lithography metrology equipment primarily consists of three types of equipment: Critical dimension scanning electron microscope (CD-SEM), ellipsometer, and overlay tool.
Technavio’s analysts forecast the global lithography metrology equipment market to grow at a CAGR of 7.51% during the period 2018-2022.
Covered in this report
The report covers the present scenario and the growth prospects of the global lithography metrology equipment market for 2018-2022. To calculate the market size, the report presents a detailed picture of the market by way of study, synthesis, and summation of data from multiple sources.
The market is divided into the following segments based on geography:
Technavio Announces the Publication of its Research Report – Global Lithography Metrology Equipment Market 2018-2022
Technavio recognizes the following companies as the key players in the global lithography metrology equipment market: ADVANTEST, ASML, Hitachi High-Technologies, KLA-Tencor, and Nanometrics.
Commenting on the report, an analyst from Technavio’s team said: “One trend in the market is increase in wafer size. Over the last four decades, the semiconductor industry has witnessed an increase in the size of silicon wafers from 100 mm to 300 mm. The shift to wafers with a larger diameter reduces the cost of manufacturing semiconductor ICs by 20%-25%.”
According to the report, one driver in the market is increasing demand for miniaturized electronic devices. The advent of miniaturized semiconductor components such as ICs is one of the major transformations in the semiconductor industry across the world. The vendors are primarily focusing on developing miniaturized personal electronics that has low power consumption rate.
Further, the report states that one challenge in the market is rapid technological changes. Changes in technology in wafer processing have been always a major challenge faced by vendors in the global lithography metrology equipment market. The semiconductor industry is continuously witnessing certain transitions such as the miniaturization of nodes and increase in wafer sizes in the ultra-large-scale integration (ULSI) fabrication technology.
ADVANTEST, ASML, Hitachi High-Technologies, KLA-Tencor, and Nanometrics.
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