Nanopatterning : Market Research Report

Nanopatterning

Published by: Global Industry Analysts

Published: Jul. 1, 2009 - 215 Pages

I.INTRODUCTION, METHODOLOGY & PRODUCT DEFINITIONS: Study Reliability and Reporting Limitations; Disclaimers; Data Interpretation & Reporting Level; Hot Embossing
II. EXECUTIVE SUMMARY: 1.INTRODUCTION; Polymer Electronics to Propel Demand for Nanopatterning; 2.NANOPATTERNING TECHNOLOGIES; What is Nanotechnology?; Leaving Conventional Size Behind; Nanopatterning Technologies; Processes; Step-and-Repeat Nanoimprint Lithography; Others; Advantages; Dip-Pen Nanolithography; Scanning Tunneling Microscopy; Scanning Probe Contact Printing; Second Method: Nanopen Reader and Writer; Nanostencil Lithography; Potential Applications; Laser-based Particle Deposition; 3.APPLICATION AREAS; Electronic Devices; Nano-optics; Nanosensors; Potential Industry Requirements for UV-NIL; 4.RECENT INDUSTRY ACTIVITY; Carl Zeiss Acquires Stake in Nanoscribe; Obducat Secures NIL Systems Orders; Heptagon Purchases IQ Aligner from EV Group; Western Digital Acquires Komag; HP Licenses NIL Technology to Nanolithosolutions; STMicroelectronics Orders Obducat’s NIL R&D System; Ambios Technology Completes Quesant Instrument Acquisition; NanoInk Signs Exclusive License Deal with Georgia Tech; Obducat Wins US Patent for E-beam Lithography; Leica Microsystems SED Changes Name to Vistec Semiconductor Systems; Toppan Printing Acquires DuPont Photomasks; EV Group Joins Hands with Komag to Develop NIL Data Storage Application; 5.PRODUCT LAUNCHES \ UPGRADES; SUSS MicroTec Upgrades Manual Mask Aligners with Nanoimprint Toolkit; Veeco Instruments Launches Innova SPM; Vistec Unveils New SB3050 for 32nm Technology Node; SUSS MicroTec Launches Nanopatterning Stepper; 6.TECHNOLOGY DEVELOPMENTS; S.E.T. and CEA Leti Develop FC300 High-Force Device Bonder; US Scientists Use DNA Molecules as Nanolithography Template; Northwestern University Scientists Develops Advanced Nanopatterning Technique; 7.RESEARCH & DEVELOPMENT INITIATIVES; NILCom; THE ITRS Lithography Roadmap; 8.FOCUS ON SELECT PLAYERS; IMS Chips (USA); Micro Resist Technology GmbH (Germany); Nanonex Corp. (USA); NIL Technology (Denmark); Sigma-Aldrich Corp. (USA); SUSS MicroTec AG (Germany); Transfer Devices, Inc. (USA); 9.GLOBAL MARKET PERSPECTIVE; Table 2: World 10-Year Perspective for Nanopatterning by Technology Type - Percentage Share Breakdown of Dollar Sales for Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, and Others), Scanning Probe Lithography, and Other Markets for Years 2005, 2010, and 2015 (includes corresponding Graph/Chart); Table 3: World Recent Past, Current & Future Analysis for Nanopatterning Application in Semiconductor and Other Microelectronic Devices with Annual Sales in US$ Million for Years 2005 through 2015 (includes corresponding Graph/Chart)
III. COMPETITIVE LANDSCAPE: Total Companies Profiled:; Region/Country Players; The United States; Canada; Japan; Europe; Asia-Pacific (Excluding Japan)

Abstract

This report analyzes the Global Market for Nanopatterning in Millions of US$. The market for “Nanopatterning” in this report is analyzed by the following technology types - Nanoimprint Lithography (Hot Embossing Lithography, UV Nanoimprint Lithography, Soft Lithography, & Others), Scanning Probe Lithography, and Other. Annual forecasts are provided for the period of 2005 through 2015. The report profiles 28 companies including many key and niche players worldwide such as Ambios Technology, Inc., AMO GmbH. EV Group, Hewlett-Packard Development Company, L.P., IMS Chips, International Business Machines Corp., Micro Resist Technology GmbH, Molecular Imprints, Inc., NanoInk, Inc., Nanonex Corp., NanoOpto Corp., NIL Technology, Obducat AB, Optomec, Inc., Sigma-Aldrich Corp., STMicroelectronics N.V., SUSS MicroTec AG, Toppan Photomasks, Inc., Transfer Devices, Inc., Veeco Instruments, Inc., and Vistec Semiconductor Systems GmbH. Market data and analytics are derived from primary and secondary research. Company profiles are mostly extracted from URL research and reported select online sources.

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Nanopatterning

Table of Contents

Abstract