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Published by: BCC Research
Published: Oct. 1, 2008 - 267 Pages
Table of Contents
- CHAPTER ONE: INTRODUCTION
- STUDY GOALS AND OBJECTIVES
- REASONS FOR DOING THIS STUDY
- INTENDED AUDIENCE
- SCOPE OF REPORT
- METHODOLOGY AND INFORMATION SOURCES
- RELATED BCC RESEARCH STUDIES
- ANALYST CREDENTIALS
- BCC ONLINE SERVICES
- DISCLAIMER
- CHAPTER TWO: EXECUTIVE SUMMARY
- EXECUTIVE SUMMARY
- SUMMARY TABLE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, THROUGH 2013 ($MILLIONS)
- SUMMARY FIGURE GLOBAL MARKET FOR CHEMICAL MECHANICAL POLISHING, 2006-2013 ($MILLIONS)
- CHAPTER THREE: OVERVIEW
- INTRODUCTION
- HISTORY OF CHEMICAL MECHANICAL POLISHING
- HISTORY OF CHEMICAL ¡-(CONTINUED)
- TABLE 1 CHEMICAL MECHANICAL POLISHING©¤TECHNOLOGICAL MILESTONES
- FIGURE 1 CHEMICAL MECHANICAL POLISHING©¤WORLDWIDE PATENT APPLICATIONS AND PATENTS ISSUED SINCE 1960
- FIGURE 1 (CONTINUED)
- CHEMICAL-MECHANICAL POLISHING: PROCESS AND EQUIPMENT
- POLISHING
- Requirements of a CMP Process
- TABLE 2 GENERAL REQUIREMENTS OF A CMP PROCESS
- Equipment and Process
- Dual Force Planarization
- Multiple Polishing Systems
- POST-CMP CLEANING
- Cleaning Steps and Chemistries
- Post-CMP Equipment Technology
- Wet Process
- Dry and Other Processes
- CURRENT AND EMERGING APPLICATIONS OF CHEMICAL MECHANICAL POLISHING
- TABLE 3 APPLICATIONS OF CHEMICAL MECHANICAL POLISHING BY INDUSTRY
- ELECTRONICS
- Microelectronics
- Semiconductor Devices
- TABLE 4 IC CONFIGURATIONS
- TABLE 5 TYPICAL APPLICATIONS OF CHEMICAL MECHANICAL POLISHING IN SEMICONDUCTOR MANUFACTURING
- Wafer Planarization
- Deep Trench Capacitor Fabrication
- Polysilicon Films
- Shallow Trench Isolation
- Pre-metal Dielectric Layers
- Inter-layer Dielectric Films
- Aluminum and Aluminum Alloys
- Metal Polishing for Vias and Contacts
- Damascene Process
- MEMS and NEMS
- Inkjet Printheads
- Data Storage Media and Recording Heads
- Magnetic Storage Media
- Recording Heads
- Advanced Displays
- OPTICS
- Lenses
- Color Filters for Image Sensors
- Sapphire Substrates
- CHAPTER FOUR: GLOBAL MARKET
- ANALYSIS OUTLINE
- GLOBAL MARKET SUMMARY
- MARKET SEGMENTATION BY PRODUCT CATEGORY
- Market Segmentation by ¡-(Continued)
- TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS)
- FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS)
- FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY PRODUCT CATEGORY, 2008 AND 2013 (%)
- FIGURE 3 (CONTINUED)
- MARKET SEGMENTATION BY APPLICATION
- TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($MILLIONS)
- FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY APPLICATION, 2008 AND 2013 (%)
- MARKET SEGMENTATION BY REGION
- TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY REGION, THROUGH 2013 ($MILLIONS)
- FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY REGION, 2008 AND 2013 (%)
- CMP EQUIPMENT
- BASIC EQUIPMENT DESIGN
- TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS
- CURRENT TECHNICAL ISSUES
- Uniform Polishing Pressure
- Carrier Head Position
- Determination of Polishing Endpoint
- Higher Production Throughput
- On-line Inspection
- Uniform Polishing Rate
- Reduction of Polishing Defects
- LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT
- Electro-chemical Mechanical Polishing
- Apparatuses and Methods for In-situ Endpoint Detection
- Laser Interferometer Detector
- Combined Eddy Current Sensing and Optical Monitoring
- System for Endpoint Detection in Copper Damascene Process
- Polishing Equipment with Pad Drum
- Chemical Mechanical Polishing Equipment with Rotating Belt
- CMP Equipment with Electromagnetic Coil
- CURRENT MARKET STATUS
- Current Market Summary
- Revenues by Equipment Type
- TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2008 ($ BILLIONS)
- FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($ BILLIONS)
- TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS)
- FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)
- FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2008 (%)
- The Post-CMP Equipment Market
- TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, 2008
- Revenues by Application
- TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS)
- FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2008 (%)
- Revenues by Region
- Revenues ¡- (Continued)
- TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)
- FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2008 (%)
- MARKET GROWTH TRENDS
- Semiconductor Industry Growth
- TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION, THROUGH 2013 ($BILLIONS)
- FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY REGION, 2008 AND 2013 ($ BILLIONS)
- Industry Growth for Other Emerging Applications
- Data Storage Media
- TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS)
- FIGURE 12 FORECAST ¨C HARD DISK DRIVES: PRODUCTION SHARE BY TYPE, 2013 (% UNITS)
- TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE, THROUGH 2013 (MILLION UNITS)
- FIGURE 13 FORECAST ¨C HARD DISKS: GLOBAL PRODUCTION BY TYPE, 2008 AND 2013 (MILLION UNITS)
- FIGURE 14 FORECAST ¨C HARD DISKS: PRODUCTION SHARE BY TYPE, 2013 (% UNITS)
- Recording Heads
- Advanced Displays
- TABLE 18 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($BILLIONS)
- FIGURE 15 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES BY TYPE, 2008 AND 2013 (MILLION UNITS)
- FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY TYPE, 2013 (%)
- Optics
- TABLE 19 FORECAST ¨C OPTICS: GLOBAL MARKET GROWTH, THROUGH 2013 ($ BILLIONS)
- Technological Trends
- Regional Trends
- PROJECTED MARKET FOR CMP AND POST-CMP EQUIPMENT
- Key Observations
- TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP EQUIPMENT, THROUGH 2013
- Market Forecast for CMP and Post-CMP Equipment
- Revenues by Application
- TABLE 21 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)
- FIGURE 17 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY APPLICATION, 2013 (%)
- Revenues by Equipment Type
- TABLE 22 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 18 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY TYPE, 2013 (%)
- Post-CMP Equipment Revenues by Process Type
- TABLE 23 FORECAST ¨C POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 19 FORECAST ¨CPOST-CMP EQUIPMENT: MARKET SHARE BY PROCESS TYPE, 2013 (%)
- Revenues by Region
- TABLE 24 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)
- FIGURE 20 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY REGION, 2013 (%)
- CMP SLURRIES
- TECHNOLOGY
- Abrasive Component
- Fumed Metal Oxides
- Precipitated Powders
- Other Slurry Components
- Slurry Compositions
- TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING
- Oxide Slurry
- TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY COMPOSITION
- Low-K Dielectric Slurry
- TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP SLURRY COMPOSITION
- Polycrystalline Silicon Slurry
- TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP SLURRY COMPOSITION
- Copper Slurry
- TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION
- TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY COMPOSITION
- TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION
- Tungsten Slurry
- TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY COMPOSITION
- CURRENT TECHNICAL ISSUES
- Minimization of Polishing Defects
- Polishing of Different Materials
- Polishing Rate
- Waste Disposal
- LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT
- CMP Slurry Containing Abrasive Particles with Photocatalytic Activity
- Additive for Improved Selectivity of CMP Slurry
- Slurry Containing Cerium Oxide for High-Speed Polishing
- Polishing Slurry Causing Reduced Dishing
- CURRENT MARKET STATUS
- Current Market Summary
- TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($ MILLIONS)
- FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)
- Revenues by Material Type
- TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, 2008 ($ MILLIONS/%)
- FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2008 (%)
- TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%)
- FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%)
- TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008 ($ MILLIONS/%)
- FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008 (%)
- Revenues by Application
- TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS/%)
- FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008 (%)
- Revenues by Region
- TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)
- FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%)
- MARKET GROWTH TRENDS
- Technological Trends
- PROJECTED MARKET FOR CMP SLURRIES
- Key Observations
- TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES, THROUGH 2013
- Market Forecast for CMP Slurries
- Revenues by Application
- TABLE 40 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)
- FIGURE 27 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY APPLICATION, 2013 (%)
- FIGURE 27 (CONTINUED)
- Revenues by Material Type
- TABLE 41 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 28 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE, 2013 (%)
- TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%)
- TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013 (%)
- Revenues by Region
- TABLE 44 FORECAST ¨C CMP SLURRIES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)
- FIGURE 31 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY REGION, 2013 (%)
- FIGURE 31 (CONTINUED)
- OTHER CMP CONSUMABLES
- TECHNOLOGY
- Pads
- Designs and Materials
- Shapes
- Pad Conditioners
- Filters
- Chemicals
- CURRENT TECHNICAL ISSUES
- High-polishing Rate and Uniform Planarization
- Reducing Downtime for Pad Conditioning
- Post-CMP Cleaning in the Copper Damascene Process
- Specialized Cleaning Methods
- LATEST TECHNOLOGICAL DEVELOPMENTS, 2005 TO PRESENT
- Enhanced Pad Conditioner
- Transparent Microporous CMP Pad
- Elastomer-modified CMP Pad
- Post-CMP Cleaning Solution for Thin Film Magnetic Heads Wafer Fabrication
- CURRENT MARKET STATUS
- Current Market Summary
- Revenues by Product Type
- TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2008 ($ MILLIONS)
- FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-2008 ($ MILLIONS)
- FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2008 (%)
- Revenues by Application
- TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, 2008 ($ MILLIONS)
- FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2008 (%)
- Revenues by Region
- TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2008 ($MILLIONS)
- FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2008 (%)
- MARKET GROWTH TRENDS
- Technological Trends
- PROJECTED MARKET FOR CMP PADS AND OTHER CONSUMABLES
- Key Observations
- TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER CONSUMABLE, THROUGH 2013
- Market Forecast for CMP Pads and Other Consumables
- Revenues by Product Type
- TABLE 49 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- FIGURE 36 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE, 2013 (%)
- Revenues by Application
- TABLE 50 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)
- FIGURE 37 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY APPLICATION, 2013 (%)
- Revenues by Region
- TABLE 51 FORECAST ¨C OTHER CMP CONSUMABLES: REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)
- FIGURE 38 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET SHARE BY REGION, 2013 (%)
- FIGURE 38 (CONTINUED)
- CHAPTER FIVE: GLOBAL INDUSTRY STRUCTURE
- GLOBAL INDUSTRY STRUCTURE
- SUPPLIERS OF CMP EQUIPMENT AND MATERIALS
- TABLE 52 MANUFACTURERS OF CMP EQUIPMENT, SLURRIES, AND CONSUMABLES
- TABLE 52 (CONTINUED)
- TABLE 52 (CONTINUED)
- TABLE 53 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS, BY PRODUCT CATEGORY
- TABLE 53 (CONTINUED)
- TABLE 53 (CONTINUED)
- FIGURE 39 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS: DISTRIBUTION BY SIZE, 2007 (NUMBER OF COMPANIES)
- FIGURE 40 HISTORICAL GROWTH OF PRODUCERS OF CMP EQUIPMENT AND MATERIALS, 1995-2000+ (NUMBER OF COMPANIES)
- TABLE 54 NOTABLE INDUSTRY CHANGES SINCE 2000
- CMP EQUIPMENT AND MATERIALS: PRODUCTION BY REGION
- TABLE 55 CMP EQUIPMENT AND MATERIALS: MANUFACTURING BY REGION, 2006-2013 (PERCENT OF SALES)
- CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY REGION
- TABLE 56 CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY REGION, 2006-2013 (PERCENT OF SALES)
- COMPANY PROFILES
- 3M
- APPLIED MATERIALS
- Applied Materials (Continued)
- CABOT MICROELECTRONICS
- TABLE 57 CABOT MICROELECTRONICS - CMP SLURRIES
- TABLE 57 (CONTINUED)
- DUPONT AIR PRODUCTS NANOMATERIALS
- TABLE 58 DA NANOMATERIALS - CMP SLURRIES
- EBARA CORP.
- FERRO CORPORATION
- Ferro Corporation (Continued)
- FUJIMI
- Fujimi (Continued)
- HITACHI CHEMICAL
- JSR CORPORATION
- LAM RESEARCH
- NIHON MICRO COATING
- NOVELLUS SYSTEMS
- Novellus Systems (Continued)
- PRAXAIR
- ROHM AND HAAS
- TABLE 59 ROHM AND HAAS - CMP SLURRIES AND CLEANING SOLUTIONS
- Rohm and Haas (Continued)
- TOKYO ELECTRON
- TOP PLAYERS MARKET SHARE
- CMP AND POST-CMP EQUIPMENT
- TABLE 60 CMP AND POST-CMP EQUIPMENT: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008
- FIGURE 41 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY COMPANY, 2007 (%)
- CMP SLURRIES
- TABLE 61 CMP SLURRIES: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008
- FIGURE 42 CMP SLURRIES: MARKET SHARE BY COMPANY, 2007 (%)
- PADS AND OTHER CMP CONSUMABLES
- TABLE 62 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE OF TOP 5 MANUFACTURERS, 2007 AND 2008
- FIGURE 43 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE BY COMPANY, 2007 (%)
- CHAPTER SIX: INDUSTRY COMPETITIVENESS
- CHEMICAL MECHANICAL POLISHING DEVELOPMENT ACTIVITIES
- TABLE 63 RESEARCH ORGANIZATIONS INVOLVED IN CHEMICAL MECHANICAL POLISHING, WORLDWIDE
- TABLE 63 (CONTINUED)
- TABLE 63 (CONTINUED)
- TABLE 63 (CONTINUED)
- TABLE 63 (CONTINUED)
- TABLE 63 (CONTINUED)
- UNITED STATES
- Clarkson University
- TABLE 64 CLARKSON UNIVERSITY RESEARCH
- Massachusetts Institute of Technology
- TABLE 65 MIT RESEARCH
- National Institute of Standards and Technologies
- TABLE 66 NIST RESEARCH
- Rensselaer Polytechnic Institute
- TABLE 67 RENSSELAER POLYTECHNIC INSTITUTE RESEARCH
- University of Florida at Gainesville
- TABLE 68 UNIVERSITY OF FLORIDA RESEARCH
- EUROPE
- Interuniversitair Microelektronica Centrum, Belgium
- TABLE 69 IMEC CMP RESEARCH
- University of Twente, The Netherlands
- TABLE 70 UNIVERSITY OF TWENTE RESEARCH
- ASIA PACIFIC
- Hanyang University, South Korea
- TABLE 71 HANYANG UNIVERSITY RESEARCH
- Kyushu University, Japan
- TABLE 72 KYUSHU UNIVERSITY RESEARCH
- Nanyang Technological University, Singapore
- TABLE 73 NTU RESEARCH
- SUMMARY OF GLOBAL R&D ACTIVITIES IN CMP TECHNOLOGY
- FIGURE 44 CURRENT GLOBAL RESEARCH AND DEVELOPMENT BY SUBJECT (%)
- FIGURE 44 (CONTINUED)
- Industry Initiatives
- TABLE 74 PRIVATE ORGANIZATIONS INVOLVED IN CMP RESEARCH
- TABLE 74 (CONTINUED)
- OTHER CONSIDERATIONS
- COST FACTOR
- Equipment Cost
- Materials Cost
- QUALITY FACTOR
- TECHNOLOGY FACTOR
- MANUFACTURING CAPABILITY
- KEY GROWTH MARKETS
- TABLE 75 GLOBAL GROWTH FORECAST FOR CURRENT AND POTENTIAL CMP APPLICATIONS, 2008-2013
- MARKET GROWTH FACTORS
- DRIVING FORCES
- IMPACT OF MARKET GROWTH FACTORS
- TABLE 76 PERCENTAGE IMPACT OF MAJOR COMPETITIVE FACTORS ON THE GROWTH OF THE CMP MARKET, 2008-2013
- CHAPTER SEVEN: U.S. PATENT ANALYSIS
- INTRODUCTION
- SUMMARY OF PATENTS AWARDED DURING THE PERIOD 2006 THROUGH 2008
- TABLE 77 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2008
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 77 (CONTINUED)
- TABLE 78 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2007
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 78 (CONTINUED)
- TABLE 79 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS, 2006
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- TABLE 79 (CONTINUED)
- GENERAL TRENDS
- TABLE 80 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008
- FIGURE 45 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT TRENDS, 2006-2008 (NUMBER OF PATENTS)
- TRENDS BY COUNTRY AND REGION
- FIGURE 46 SHARES OF GLOBAL PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING BY REGION, 2006-2008 (%) .... 233
- FIGURE 47 CHEMICAL MECHANICAL POLISHING: PATENTS BY COUNTRY, 2006-2008 (%)
- FIGURE 47 (CONTINUED)
- TRENDS BY ASSIGNEE
- TABLE 81 ASSIGNEES OF U.S. PATENTS RELATED TO CHEMICAL MECHANICAL POLISHING, 2006-2008
- TABLE 81 (CONTINUED)
- TABLE 81 (CONTINUED)
- TABLE 81 (CONTINUED)
- TABLE 81 (CONTINUED)
- TRENDS BY PATENT CATEGORY
- FIGURE 48 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY CATEGORY, 2006-2008 (%)
- TRENDS BY APPLICATION
- FIGURE 49 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY APPLICATION, 2006-2008 (%)
- TRENDS BY MATERIAL TYPE
- FIGURE 50 CHEMICAL MECHANICAL POLISHING: SHARES OF GLOBAL PATENTS BY MATERIAL TYPE, 2006- 2008 (%)
- FIGURE 50 (CONTINUED)
- LIST OF TABLES
- SUMMARY TABLE GLOBAL MARKET FOR CHEMICAL MECHANICAL
- POLISHING, THROUGH 2013 ($MILLIONS)
- TABLE 1 CHEMICAL MECHANICAL POLISHING©¤TECHNOLOGICAL
- MILESTONES
- TABLE 2 GENERAL REQUIREMENTS OF A CMP PROCESS
- TABLE 3 APPLICATIONS OF CHEMICAL MECHANICAL POLISHING
- BY INDUSTRY
- TABLE 4 IC CONFIGURATIONS
- TABLE 5 TYPICAL APPLICATIONS OF CHEMICAL MECHANICAL
- POLISHING IN SEMICONDUCTOR MANUFACTURING
- TABLE 6 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES
- BY PRODUCT CATEGORY, THROUGH 2013 ($MILLIONS)
- TABLE 7 CHEMICAL MECHANICAL POLISHING: GLOBAL REVENUES
- BY APPLICATION, THROUGH 2013 ($MILLIONS)
- TABLE 8 CHEMICAL MECHANICAL POLISHING: REVENUES BY
- REGION, THROUGH 2013 ($MILLIONS)
- TABLE 9 BASIC CHEMICAL MECHANICAL POLISHING PROCESS
- TABLE 10 SEMICONDUCTORS: REVENUES BY REGION, THROUGH
- 2008 ($ BILLIONS)
- TABLE 11 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY
- TYPE, THROUGH 2008 ($ MILLIONS)
- TABLE 12 POST-CMP EQUIPMENT: GLOBAL REVENUES BY PROCESS
- TYPE, 2008
- TABLE 13 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES BY
- APPLICATION, 2008 ($ MILLIONS)
- TABLE 14 CMP AND POST-CMP EQUIPMENT: REVENUES BY REGION,
- THROUGH 2008 ($MILLIONS)
- TABLE 15 FORECAST - SEMICONDUCTORS: REVENUES BY REGION,
- THROUGH 2013 ($BILLIONS)
- TABLE 16 FORECAST - HARD DISK DRIVES: GLOBAL PRODUCTION
- BY TYPE, THROUGH 2013 (MILLION UNITS)
- TABLE 17 FORECAST - HARD DISKS: GLOBAL PRODUCTION BY TYPE,
- THROUGH 2013 (MILLION UNITS)
- TABLE 18 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES
- BY TYPE, THROUGH 2013 ($BILLIONS)
- TABLE 19 FORECAST ¨C OPTICS: GLOBAL MARKET GROWTH,
- THROUGH 2013 ($ BILLIONS)
- TABLE 20 FACTORS AFFECTING SALES OF CMP AND POST-CMP
- EQUIPMENT, THROUGH 2013
- TABLE 21 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL
- REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)
- TABLE 22 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: GLOBAL
- REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 23 FORECAST ¨C POST-CMP EQUIPMENT: GLOBAL REVENUES
- BY PROCESS TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 24 FORECAST ¨C CMP AND POST-CMP EQUIPMENT:
- REVENUES BY REGION, THROUGH 2013 ($ MILLIONS)
- TABLE 25 SLURRIES FOR CHEMICAL-MECHANICAL POLISHING
- TABLE 26 SAMSUNG ELECTRONICS - OXIDE CMP SLURRY
- COMPOSITION
- TABLE 27 CABOT MICROELECTRONICS - LOW-K DIELECTRIC CMP
- SLURRY COMPOSITION
- TABLE 28 CHEIL INDUSTRIES - POLYCRYSTALLINE SILICON CMP
- SLURRY COMPOSITION
- TABLE 29 MOTOROLA - COPPER CMP SLURRY COMPOSITION
- TABLE 30 CABOT MICROELECTRONICS - COPPER CMP SLURRY
- COMPOSITION
- TABLE 31 ROHM AND HAAS - COPPER CMP SLURRY COMPOSITION
- TABLE 32 DUPONT AIR PRODUCTS - TUNGSTEN CMP SLURRY
- COMPOSITION
- TABLE 33 CMP SLURRIES: GLOBAL REVENUES, THROUGH 2008 ($
- MILLIONS)
- TABLE 34 CMP SLURRIES: GLOBAL REVENUES BY MATERIAL TYPE,
- 2008 ($ MILLIONS/%)
- TABLE 35 DIELECTRIC CMP SLURRIES: GLOBAL REVENUES BY
- TYPE, 2008 ($ MILLIONS/%)
- TABLE 36 METAL CMP SLURRIES: GLOBAL REVENUES BY TYPE, 2008
- ($ MILLIONS/%)
- TABLE 37 CMP SLURRIES: GLOBAL REVENUES BY APPLICATION,
- 2008 ($ MILLIONS/%)
- TABLE 38 CMP SLURRIES: REVENUES BY REGION, THROUGH 2008
- ($MILLIONS)
- TABLE 39 FACTORS AFFECTING SALES OF CMP SLURRIES,
- THROUGH 2013
- TABLE 40 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY
- APPLICATION, THROUGH 2013 ($ MILLION)
- TABLE 41 FORECAST ¨C CMP SLURRIES: GLOBAL REVENUES BY
- MATERIAL TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 42 FORECAST - DIELECTRIC CMP SLURRIES: GLOBAL
- REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 43 FORECAST - METAL CMP SLURRIES: GLOBAL REVENUES
- BY TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 44 FORECAST ¨C CMP SLURRIES: REVENUES BY REGION,
- THROUGH 2013 ($ MILLIONS)
- TABLE 45 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY
- TYPE, THROUGH 2008 ($ MILLIONS)
- TABLE 46 OTHER CMP CONSUMABLES: GLOBAL REVENUES BY
- APPLICATION, 2008 ($ MILLIONS)
- TABLE 47 OTHER CMP CONSUMABLES: REVENUES BY REGION,
- THROUGH 2008 ($MILLIONS)
- TABLE 48 FACTORS AFFECTING SALES OF CMP PADS AND OTHER
- CONSUMABLE, THROUGH 2013
- TABLE 49 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL
- REVENUES BY TYPE, THROUGH 2013 ($ MILLIONS)
- TABLE 50 FORECAST ¨C OTHER CMP CONSUMABLES: GLOBAL
- REVENUES BY APPLICATION, THROUGH 2013 ($ MILLION)
- TABLE 51 FORECAST ¨C OTHER CMP CONSUMABLES: REVENUES BY
- REGION, THROUGH 2013 ($ MILLIONS)
- TABLE 52 MANUFACTURERS OF CMP EQUIPMENT, SLURRIES, AND
- CONSUMABLES
- TABLE 53 MANUFACTURERS OF CMP EQUIPMENT AND MATERIALS,
- BY PRODUCT CATEGORY
- TABLE 54 NOTABLE INDUSTRY CHANGES SINCE 2000
- TABLE 55 CMP EQUIPMENT AND MATERIALS: MANUFACTURING BY
- REGION, 2006-2013 (PERCENT OF SALES)
- TABLE 56 CMP EQUIPMENT AND MATERIALS: CONSUMPTION BY
- REGION, 2006-2013 (PERCENT OF SALES)
- TABLE 57 CABOT MICROELECTRONICS - CMP SLURRIES
- TABLE 58 DA NANOMATERIALS - CMP SLURRIES
- TABLE 59 ROHM AND HAAS - CMP SLURRIES AND CLEANING
- SOLUTIONS
- TABLE 60 CMP AND POST-CMP EQUIPMENT: MARKET SHARE OF
- TOP 5 MANUFACTURERS, 2007 AND 2008
- TABLE 61 CMP SLURRIES: MARKET SHARE OF TOP 5
- MANUFACTURERS, 2007 AND 2008
- TABLE 62 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE
- OF TOP 5 MANUFACTURERS, 2007 AND 2008
- TABLE 63 RESEARCH ORGANIZATIONS INVOLVED IN CHEMICAL
- MECHANICAL POLISHING, WORLDWIDE
- TABLE 64 CLARKSON UNIVERSITY RESEARCH
- TABLE 65 MIT RESEARCH
- TABLE 66 NIST RESEARCH
- TABLE 67 RENSSELAER POLYTECHNIC INSTITUTE RESEARCH
- TABLE 68 UNIVERSITY OF FLORIDA RESEARCH
- TABLE 69 IMEC CMP RESEARCH
- TABLE 70 UNIVERSITY OF TWENTE RESEARCH
- TABLE 71 HANYANG UNIVERSITY RESEARCH
- TABLE 72 KYUSHU UNIVERSITY RESEARCH
- TABLE 73 NTU RESEARCH
- TABLE 74 PRIVATE ORGANIZATIONS INVOLVED IN CMP RESEARCH
- TABLE 75 GLOBAL GROWTH FORECAST FOR CURRENT AND
- POTENTIAL CMP APPLICATIONS, 2008-2013
- TABLE 76 PERCENTAGE IMPACT OF MAJOR COMPETITIVE FACTORS
- ON THE GROWTH OF THE CMP MARKET, 2008-2013
- TABLE 77 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,
- 2008
- TABLE 78 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,
- 2007
- TABLE 79 CHEMICAL MECHANICAL POLISHING ¨C U.S. PATENTS,
- 2006
- TABLE 80 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT
- TRENDS, 2006-2008
- TABLE 81 ASSIGNEES OF U.S. PATENTS RELATED TO CHEMICAL
- MECHANICAL POLISHING, 2006-2008
- LIST OF FIGURES
- SUMMARY FIGURE GLOBAL MARKET FOR CHEMICAL MECHANICAL
- POLISHING, 2006-2013 ($MILLIONS)
- FIGURE 1 CHEMICAL MECHANICAL POLISHING©¤WORLDWIDE
- PATENT APPLICATIONS AND PATENTS ISSUED SINCE 1960
- FIGURE 2 CHEMICAL MECHANICAL POLISHING: GLOBAL MARKET
- BY PRODUCT CATEGORY, 2006-2013 ($MILLIONS)
- FIGURE 3 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY
- PRODUCT CATEGORY, 2008 AND 2013 (%)
- FIGURE 4 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY
- APPLICATION, 2008 AND 2013 (%)
- FIGURE 5 CHEMICAL MECHANICAL POLISHING: MARKET SHARE BY
- REGION, 2008 AND 2013 (%)
- FIGURE 6 SEMICONDUCTORS: REVENUES BY REGION, 2003-2008 ($
- BILLIONS)
- FIGURE 7 CMP AND POST-CMP EQUIPMENT: GLOBAL REVENUES,
- 2003-2008 ($ MILLIONS)
- FIGURE 8 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY
- TYPE, 2008 (%)
- FIGURE 9 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY
- APPLICATION, 2008 (%)
- FIGURE 10 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY
- REGION, 2008 (%)
- FIGURE 11 FORECAST - SEMICONDUCTORS: MARKET GROWTH BY
- REGION, 2008 AND 2013 ($ BILLIONS)
- FIGURE 12 FORECAST ¨C HARD DISK DRIVES: PRODUCTION SHARE
- BY TYPE, 2013 (% UNITS)
- FIGURE 13 FORECAST ¨C HARD DISKS: GLOBAL PRODUCTION BY
- TYPE, 2008 AND 2013 (MILLION UNITS)
- FIGURE 14 FORECAST ¨C HARD DISKS: PRODUCTION SHARE BY TYPE,
- 2013 (% UNITS)
- FIGURE 15 FORECAST ¨C FLAT PANEL DISPLAYS: GLOBAL REVENUES
- BY TYPE, 2008 AND 2013 (MILLION UNITS)
- FIGURE 16 FORECAST - FLAT PANEL DISPLAYS: MARKET SHARE BY
- TYPE, 2013 (%)
- FIGURE 17 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET
- SHARE BY APPLICATION, 2013 (%)
- FIGURE 18 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET
- SHARE BY TYPE, 2013 (%)
- FIGURE 19 FORECAST ¨CPOST-CMP EQUIPMENT: MARKET SHARE BY
- PROCESS TYPE, 2013 (%)
- FIGURE 20 FORECAST ¨C CMP AND POST-CMP EQUIPMENT: MARKET
- SHARE BY REGION, 2013 (%)
- FIGURE 21 CMP SLURRIES: GLOBAL REVENUES, 2003-2008 ($
- MILLIONS)
- FIGURE 22 CMP SLURRIES: MARKET SHARE BY MATERIAL TYPE,
- 2008 (%)
- FIGURE 23 DIELECTRIC CMP SLURRIES: MARKET SHARE BY TYPE,
- 2008 (%)
- FIGURE 24 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2008
- (%)
- FIGURE 25 CMP SLURRIES: MARKET SHARE BY APPLICATION, 2008
- (%)
- FIGURE 26 CMP SLURRIES: MARKET SHARE BY REGION, 2008 (%)
- FIGURE 27 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY
- APPLICATION, 2013 (%)
- FIGURE 28 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY
- MATERIAL TYPE, 2013 (%)
- FIGURE 29 FORECAST - DIELECTRIC CMP SLURRIES: MARKET
- SHARE BY TYPE, 2013 (%)
- FIGURE 30 METAL CMP SLURRIES: MARKET SHARE BY TYPE, 2013
- (%)
- FIGURE 31 FORECAST ¨C CMP SLURRIES: MARKET SHARE BY
- REGION, 2013 (%)
- FIGURE 32 OTHER CMP CONSUMABLES: GLOBAL REVENUES, 2003-
- 2008 ($ MILLIONS)
- FIGURE 33 OTHER CMP CONSUMABLES: MARKET SHARE BY TYPE,
- 2008 (%)
- FIGURE 34 OTHER CMP CONSUMABLES: MARKET SHARE BY
- APPLICATION, 2008 (%)
- FIGURE 35 OTHER CMP CONSUMABLES: MARKET SHARE BY
- REGION, 2008 (%)
- FIGURE 36 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET
- SHARE BY TYPE, 2013 (%)
- FIGURE 37 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET
- SHARE BY APPLICATION, 2013 (%)
- FIGURE 38 FORECAST ¨C OTHER CMP CONSUMABLES: MARKET
- SHARE BY REGION, 2013 (%)
- FIGURE 39 MANUFACTURERS OF CMP EQUIPMENT AND
- MATERIALS: DISTRIBUTION BY SIZE, 2007 (NUMBER OF
- COMPANIES)
- FIGURE 40 HISTORICAL GROWTH OF PRODUCERS OF CMP
- EQUIPMENT AND MATERIALS, 1995-2000+ (NUMBER OF
- COMPANIES)
- FIGURE 41 CMP AND POST-CMP EQUIPMENT: MARKET SHARE BY
- COMPANY, 2007 (%)
- FIGURE 42 CMP SLURRIES: MARKET SHARE BY COMPANY, 2007 (%)
- FIGURE 43 PADS AND OTHER CMP CONSUMABLES: MARKET SHARE
- BY COMPANY, 2007 (%)
- FIGURE 44 CURRENT GLOBAL RESEARCH AND DEVELOPMENT BY
- SUBJECT (%)
- FIGURE 45 CHEMICAL MECHANICAL POLISHING: GLOBAL PATENT
- TRENDS, 2006-2008 (NUMBER OF PATENTS)
- FIGURE 46 SHARES OF GLOBAL PATENTS RELATED TO CHEMICAL
- MECHANICAL POLISHING BY REGION, 2006-2008 (%)
- FIGURE 47 CHEMICAL MECHANICAL POLISHING: PATENTS BY
- COUNTRY, 2006-2008 (%)
- FIGURE 48 CHEMICAL MECHANICAL POLISHING: SHARES OF
- GLOBAL PATENTS BY CATEGORY, 2006-2008 (%)
- FIGURE 49 CHEMICAL MECHANICAL POLISHING: SHARES OF
- GLOBAL PATENTS BY APPLICATION, 2006-2008 (%)
- FIGURE 50 CHEMICAL MECHANICAL POLISHING: SHARES OF
- GLOBAL PATENTS BY MATERIAL TYPE, 2006- 2008 (%)
AbstractSTUDY GOALS AND OBJECTIVES
Chemical mechanical polishing (CMP) is a process that, during the past 20 years, has achieved a high level of importance in various industrial sectors, particularly in microelectronics.
BCC published its first report on Equipment and Materials for Semiconductor Cleaning and Planarization in 2001, followed by a more detailed study related to chemical mechanical polishing in 2003. During the last 5 years, various technological advances have occurred in this field, leading to increased market demand for CMP equipment and materials.
The main goal of this report is to provide new insights into current CMP technology, outlining technological trends, and supplying an updated market analysis of equipment and materials utilized for chemical mechanical polishing.
Specifically, the major objectives of this study are to:
- Provide an updated review of the chemical mechanical polishing process and related equipment, focusing on the most advanced equipment upgrades and variants.
- Provide an overview of materials commonly used in chemical mechanical polishing and identify new materials.
- Highlight new technological developments in chemical mechanical polishing, while outlining technical issues.
- Review the fields of application for CMP and investigate emerging applications.
- Estimate current global markets for CMP equipment and materials (including CMP and post-CMP equipment, CMP slurries, CMP pads and pad conditioners) with growth forecasts through 2013 for each market segment.
- Identify important technology and market trends within each market segment.
- Supply an updated review of current producers of equipment and materials for chemical mechanical polishing.
- Identify major users of CMP equipment, slurries, pads and pad conditioners.
- Provide a description of current worldwide research activities and evaluate their impact on industry growth.
- Determine trends in U.S. patents issued during the most recent years
REASONS FOR DOING THIS STUDY
Chemical mechanical polishing (CMP) is used to create very smooth (i.e., polished) surfaces. During manufacturing of advanced devices used in microelectronics and other fields of application, chemical mechanical polishing serves the critical function of producing near perfectly flat (or planar) films and preparing the film surface for the deposition of successive layers. For this reason, the CMP process is also known as chemical mechanical planarization.
Although the origins of the CMP process can be traced back to the 1960s, it was not until the 1980s that this technology entered the main stream, when IBM introduced CMP for the planarization of inter-layer dielectrics and multilayered metal structures in semiconductor devices.
Since then the market for CMP equipment and materials has grown steadily, accompanied by a rapid increase in R&D activities aimed at developing slurry formulations and equipment designs to meet more stringent requirements associated with the increasing miniaturization of microelectronic devices.
Today, the CMP market is worth $2.8 billion and still growing at a fairly healthy pace.
The principal reason for doing this study is to present a current assessment of the CMP industry from both a technological and market point of view and to outline future trends and key developments.
There is also a need to evaluate the current status and future trends of the CMP industry from a global standpoint. With the ongoing globalization of markets and the relocation of many manufacturing facilities to lower cost countries, it is also necessary to provide a geographical mapping of points of production of CMP equipment and materials, relative to global sales and distribution. Such an evaluation will contribute to a broader understanding of growth opportunities for CMP equipment and materials, and their applications within the U.S. and abroad.
An equally important reason for performing this study is to provide an overview of global R&D activities related to the CMP industry, both within public and private organizations, and to illustrate the latest technological developments that can assist companies in finding opportunities for process and productivity improvements and, consequently, positively impact their future market growth.
INTENDED AUDIENCE
This study will be of primary interest to all companies that:
- Manufacture, sell, and distribute materials and equipment for chemical mechanical polishing.
- Fabricate semiconductors and other devices requiring planarization in their manufacturing process.
- Offer coating services to the thin film industry.
- Supply abrasive powders and nanomaterials.
- Produce cleaning solutions for the post-CMP process.
- Manufacture analytical instruments for thickness, flatness, and/or surface roughness characterization.
- Provide technical and/or marketing services for the microelectronics industry.
- Are planning to enter the semiconductor industry as manufacturers of polishing equipment or suppliers of chemicals, abrasives, and etching solutions.
- Overall, this study applies to industry segments such as microelectronics, data storage media, flat panel displays, optical coatings, and the general coating sector.
The study is mainly directed towards executives, directors, operations managers, sales and marketing managers, and strategic planners working within the above industries. Universities and research facilities may also find this study to be a good source of technical information regarding CMP technology, materials, and equipment, which can be used as a baseline for new or expanded R&D activities.
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